loadpatents
name:-0.022366046905518
name:-0.019784927368164
name:-0.00052595138549805
Hwang; Jeng H. Patent Filings

Hwang; Jeng H.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hwang; Jeng H..The latest application filed is for "method of preventing short circuits in magnetic film stacks".

Company Profile
0.18.14
  • Hwang; Jeng H. - Cupertino CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Masking methods and etching sequences for patterning electrodes of high density RAM capacitors
Grant 6,919,168 - Hwang , et al. July 19, 2
2005-07-19
Method of preventing short circuits in magnetic film stacks
Grant 6,893,893 - Nallan , et al. May 17, 2
2005-05-17
Etching methods for a magnetic memory cell stack
Grant 6,821,907 - Hwang , et al. November 23, 2
2004-11-23
Method of plasma etching platinum
Grant 6,777,342 - Hwang August 17, 2
2004-08-17
Method of reducing particulates in a plasma etch chamber during a metal etch process
Grant 6,770,567 - Ko , et al. August 3, 2
2004-08-03
Method of etching an anisotropic profile in platinum
Grant 6,749,770 - Hwang , et al. June 15, 2
2004-06-15
Method of forming a cup capacitor
Grant 6,730,561 - Hwang , et al. May 4, 2
2004-05-04
Plasma heating of a substrate with subsequent high temperature etching
Grant 6,709,609 - Hwang , et al. March 23, 2
2004-03-23
Method of plasma heating and etching a substrate
Grant 6,692,648 - Hwang , et al. February 17, 2
2004-02-17
Substrate cleaning apparatus and method
Grant 6,692,903 - Chen , et al. February 17, 2
2004-02-17
Method of preventing short circuits in magnetic film stacks
App 20030180968 - Nallan, Padmapani C. ;   et al.
2003-09-25
Etching methods for a magnetic memory cell stack
App 20030170985 - Hwang, Jeng H. ;   et al.
2003-09-11
Method of plasma etching platinum
App 20030064590 - Hwang, Jeng H.
2003-04-03
Plasma etching process for metals and metal oxides, including metals and metal oxides inert to oxidation
Grant 6,541,380 - Ying , et al. April 1, 2
2003-04-01
Masking methods and etching sequences for patterning electrodes of high density RAM capacitors
App 20030059720 - Hwang, Jeng H. ;   et al.
2003-03-27
Method of etching platinum using a silicon carbide mask
App 20030036264 - Ying, Chentsau ;   et al.
2003-02-20
Plasma Etching Process For Metals And Metal Oxides Relates Inert To Oxidation
App 20030022494 - Ying, Chentsau ;   et al.
2003-01-30
Method of reducing particulates in a plasma etch chamber during a metal etch process
App 20030013314 - Ying, Chentsau ;   et al.
2003-01-16
Method of forming a cup capacitor
App 20030013252 - Hwang, Jeng H. ;   et al.
2003-01-16
Method of reducing particulates in a plasma etch chamber during a metal etch process
App 20030008517 - Ko, Yong Deuk ;   et al.
2003-01-09
Etching methods for anisotropic platinum profile
Grant 6,482,745 - Hwang November 19, 2
2002-11-19
Plasma heating of a substrate with subsequent high temperature etching
App 20020139774 - Hwang, Jeng H. ;   et al.
2002-10-03
Method of plasma heating and etching a substrate
App 20020117471 - Hwang, Jeng H. ;   et al.
2002-08-29
Substrate cleaning apparatus and method
App 20020072016 - Chen, Haojiang ;   et al.
2002-06-13
Method of etching an anisotropic profile in platinum
App 20020037647 - Hwang, Jeng H. ;   et al.
2002-03-28
Method for allowing a stable power transmission into a plasma processing chamber
App 20010050267 - Hwang, Jeng H. ;   et al.
2001-12-13
Etching methods for anisotropic platinum profile
Grant 6,323,132 - Hwang , et al. November 27, 2
2001-11-27
Method for removing redeposited veils from etched platinum
Grant 6,277,762 - Hwang August 21, 2
2001-08-21
Apparatus and method for shielding a dielectric member to allow for stable power transmission into a plasma processing chamber
Grant 6,277,251 - Hwang , et al. August 21, 2
2001-08-21
Iridium etchant methods for anisotropic profile
Grant 6,265,318 - Hwang , et al. July 24, 2
2001-07-24
RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls
Grant 6,071,372 - Ye , et al. June 6, 2
2000-06-06
Method for removal of photoresist over metal which also removes or inactivates corrosion-forming materials remaining from previous metal etch
Grant 5,174,856 - Hwang , et al. December 29, 1
1992-12-29

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