Hwang; Chul Ju

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hwang; Chul Ju.The latest application filed is for "thin film type solar cell and method for manufacturing the same".

Company Profile

0.15.12

Hwang; Chul Ju - Gwangju-si N/A KR
Hwang; Chul Ju - Gyeonggi-Do KR
Hwang; Chul-Ju - Sungnam-shi KR
Hwang; Chul Ju - Kwangju-shi KR
Hwang; Chul Ju - Songnam-shi KR
Hwang; Chul Ju - Seongnam KR
Hwang, Chul Ju - Kyonggi-do KR
Hwang, Chul Ju - Kyunggi-Do KR
Hwang; Chul-Ju - Kyungki-Do KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Thin film type solar cell and method for manufacturing the same Grant 8,889,470 - Kim , et al. November 18, 2	2014-11-18
Thin film type solar cell and method for manufacturing the same App 20090308436 - Kim; Jae Ho ; et al.	2009-12-17
Semiconductor substrate, semiconductor device and method of manufacturing the same Grant 7,391,098 - Hwang June 24, 2	2008-06-24
Semiconductor substrate, semiconductor device and method of manufacturing the same App 20060118915 - Hwang; Chul Ju	2006-06-08
Atomic layer deposition method Grant 6,872,421 - Hwang , et al. March 29, 2	2005-03-29
Apparatus for semiconductor device and method using the same App 20050000453 - Hwang, Chul-Ju ; et al.	2005-01-06
Gas injector adapted for ALD process Grant 6,769,629 - Hwang , et al. August 3, 2	2004-08-03
Atomic layer deposition method and semiconductor device fabricating apparatus having rotatable gas injectors App 20040035362 - Hwang, Chul-Ju ; et al.	2004-02-26
Semiconductor device manufacturing apparatus having rotatable gas injector and thin film deposition method using the same Grant 6,656,284 - Hwang , et al. December 2, 2	2003-12-02
Atomic layer deposition method and semiconductor device fabricating apparatus having rotatable gas injectors Grant 6,634,314 - Hwang , et al. October 21, 2	2003-10-21
Gas injector adapted for ALD process App 20030116652 - Hwang, Chul Ju ; et al.	2003-06-26
Cluster tool for fabricating semiconductor device Grant 6,530,993 - Hwang , et al. March 11, 2	2003-03-11
Apparatus for fabricating a semiconductor device App 20030015292 - Hwang, Chul Ju ; et al.	2003-01-23
Apparatus for fabricating a semiconductor device App 20030015142 - Hwang, Chul Ju ; et al.	2003-01-23
Apparatus for fabricating semiconductor device and method for fabricating semiconductor using the same Grant 6,383,953 - Hwang May 7, 2	2002-05-07
Atomic layer deposition method and semiconductor device fabricating apparatus having rotatable gas injectors App 20020043216 - Hwang, Chul-Ju ; et al.	2002-04-18
High vacuum apparatus for fabricating semiconductor device and method for forming epitaxial layer using the same App 20010051429 - Hwang, Chul-Ju ; et al.	2001-12-13
Apparatus for fabricating semiconductor device and method for fabricating semiconductor using the same App 20010022295 - Hwang, Chul Ju	2001-09-20
Method for fabricating gate oxide film of semiconductor device App 20010023136 - Yang, Doo Young ; et al.	2001-09-20
High density plasma chemical vapor deposition apparatus and gap filling method using the same App 20010021592 - Lee, Young Suk ; et al.	2001-09-13
Apparatus for low pressure chemical vapor depostion Grant 6,190,460 - Hwang February 20, 2	2001-02-20
Method for forming a high-permittivity dielectric film use in a semiconductor device Grant 6,180,542 - Hwang January 30, 2	2001-01-30
Apparatus for low pressure chemical vapor deposition Grant 6,026,764 - Hwang February 22, 2	2000-02-22
Apparatus for low pressure chemical vapor deposition Grant 6,009,831 - Hwang January 4, 2	2000-01-04
Apparatus for low pressure chemical vapor deposition Grant 5,928,427 - Hwang July 27, 1	1999-07-27
Apparatus for low pressure chemical vapor deposition Grant 5,441,570 - Hwang August 15, 1	1995-08-15

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