HWANG; Bernard L.

Patent Applications and Registrations

Patent applications and USPTO patent grants for HWANG; Bernard L..The latest application filed is for "film thickness uniformity improvement using edge ring and bias electrode geometry".

Company Profile

5.13.17

HWANG; Bernard L. - Santa Clara CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Film Thickness Uniformity Improvement Using Edge Ring And Bias Electrode Geometry App 20220301920 - LO; Kin Pong ; et al.	2022-09-22
Film thickness uniformity improvement using edge ring and bias electrode geometry Grant 11,380,575 - Lo , et al. July 5, 2	2022-07-05
Methods For Calibrating An Optical Emission Spectrometer App 20220178747 - LO; Kin Pong ; et al.	2022-06-09
Film Thickness Uniformity Improvement Using Edge Ring And Bias Electrode Geometry App 20220028656 - LO; Kin Pong ; et al.	2022-01-27
Process Kit With Protective Ceramic Coatings For Hydrogen And Nh3 Plasma Application App 20220013336 - WU; Jian ; et al.	2022-01-13
Ceramic Coated Quartz Lid For Processing Chamber App 20210272774 - HWANG; Bernard L.	2021-09-02
Method And Apparatus For Selective Nitridation Process App 20210202702 - ROGERS; Matthew Scott ; et al.	2021-07-01
Ceramic coated quartz lid for processing chamber Grant 11,017,984 - Hwang May 25, 2	2021-05-25
Thin film treatment process Grant 10,971,357 - Liu , et al. April 6, 2	2021-04-06
Method and apparatus for selective nitridation process Grant 10,950,698 - Rogers , et al. March 16, 2	2021-03-16
Thin Film Treatment Process App 20200111659 - LIU; Wei ; et al.	2020-04-09
Plasma treating a process chamber Grant 10,290,504 - Liu , et al.	2019-05-14
Method And Apparatus For Selective Nitridation Process App 20190088485 - ROGERS; Matthew Scott ; et al.	2019-03-21
Method and apparatus for selective nitridation process Grant 10,049,881 - Rogers , et al. August 14, 2	2018-08-14
Plasma Treating A Process Chamber App 20180082847 - LIU; Wei ; et al.	2018-03-22
Plasma treating a process chamber Grant 9,831,091 - Liu , et al. November 28, 2	2017-11-28
Ceramic Coated Quartz Lid For Processing Chamber App 20170314124 - HWANG; Bernard L.	2017-11-02
Process Chamber App 20160358781 - LIU; Wei ; et al.	2016-12-08
CVD apparatus for improved film thickness non-uniformity and particle performance Grant 9,312,154 - Tran , et al. April 12, 2	2016-04-12
Methods And Apparatus For Processing Substrates Using An Ion Shield App 20150332941 - TOBIN; JEFFREY ; et al.	2015-11-19
Electrostatic chuck assembly Grant 9,117,867 - Hwang , et al. August 25, 2	2015-08-25
Methods and apparatus for processing substrates using an ion shield Grant 9,048,190 - Tobin , et al. June 2, 2	2015-06-02
Methods And Apparatus For Processing Substrates Using An Ion Shield App 20140099795 - TOBIN; JEFFREY ; et al.	2014-04-10
Method And Apparatus For Selective Nitridation Process App 20130040444 - ROGERS; MATTHEW S. ; et al.	2013-02-14
Electrostatic Chuck Assembly App 20130001899 - HWANG; BERNARD L. ; et al.	2013-01-03
Cvd Apparatus For Improved Film Thickness Non-uniformity And Particle Performance App 20100294199 - TRAN; BINH ; et al.	2010-11-25

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