Huynh; Cuc K
Patent Applications and Registrations
Patent applications and USPTO patent grants for Huynh; Cuc K.The latest application filed is for "method to etch chrome for photomask fabrication".
- Huynh; Cuc K - Jericho VT
- Huynh; Cuc K. - Jericho VT
- Huynh; Cuc K. - Stowe VT
| Patent | Date |
|---|---|
| Optimized scheduling based on sensitivity data Grant 8,301,288 - Denton , et al. October 30, 2 | 2012-10-30 |
| Photoresist trimming process Grant 7,960,288 - Crawford , et al. June 14, 2 | 2011-06-14 |
| Photoresist trimming process Grant 7,955,988 - Crawford , et al. June 7, 2 | 2011-06-07 |
| Method to etch chrome for photomask fabrication Grant 7,754,394 - Crawford , et al. July 13, 2 | 2010-07-13 |
| Method to etch chrome for photomask fabrication App 20080113275 - Crawford; Shaun B. ; et al. | 2008-05-15 |
| Photoresist Trimming Process App 20080032214 - Crawford; Shaun ; et al. | 2008-02-07 |
| Photoresist Trimming Process App 20080020586 - CRAWFORD; Shaun ; et al. | 2008-01-24 |
| Photoresist trimming process Grant 7,304,000 - Crawford , et al. December 4, 2 | 2007-12-04 |
| CD uniformity of chrome etch to photomask process Grant 7,014,959 - Crawford , et al. March 21, 2 | 2006-03-21 |
| Photoresist Trimming Process App 20060040504 - Crawford; Shaun ; et al. | 2006-02-23 |
| Optimized Scheduling Based On Sensitivity Data App 20050283265 - Denton, Brian T. ; et al. | 2005-12-22 |
| Improved Cd Uniformity Of Chrome Etch To Photomask Process App 20040262264 - Crawford, Shaun B. ; et al. | 2004-12-30 |
| Method to prevent leaving residual metal in CMP process of metal interconnect Grant 6,599,173 - Cruz , et al. July 29, 2 | 2003-07-29 |
| Off-concentric polishing system design App 20020182866 - Huynh, Cuc K. ; et al. | 2002-12-05 |
| Method and apparatus for multiphase chemical mechanical polishing Grant 6,468,135 - Cruz , et al. October 22, 2 | 2002-10-22 |
| Off-concentric polishing system design Grant 6,432,823 - Huynh , et al. August 13, 2 | 2002-08-13 |
| Method for homogenizing device parameters through photoresist planarization Grant 6,387,810 - Beardsley , et al. May 14, 2 | 2002-05-14 |
| Method for chemical mechanical polishing of semiconductor wafer Grant 6,300,246 - Huynh , et al. October 9, 2 | 2001-10-09 |
| Method For Homogenizing Device Parameters Through Photoresist Planarization App 20010002328 - BEARDSLEY, GARY J. ; et al. | 2001-05-31 |
| Apparatus for removing slurry particles Grant 6,171,436 - Huynh , et al. January 9, 2 | 2001-01-09 |
| Method for forming sidewall spacers using frequency doubling hybrid resist and device formed thereby Grant 5,981,148 - Brown , et al. November 9, 1 | 1999-11-09 |
| Method for forming sidewall spacers using frequency doubling hybrid resist and device formed thereby Grant 5,976,768 - Brown , et al. November 2, 1 | 1999-11-02 |
| Method of removing slurry particles Grant 5,896,870 - Huynh , et al. April 27, 1 | 1999-04-27 |
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