loadpatents
name:-0.034020185470581
name:-0.023888826370239
name:-0.00052189826965332
Hunks; William Patent Filings

Hunks; William

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hunks; William.The latest application filed is for "precursors for silicon dioxide gap fill".

Company Profile
0.25.32
  • Hunks; William - Danbury CT
  • Hunks; William - Waterbury CT
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Cyclopentadienyl titanium alkoxides with ozone activated ligands for ALD of TiO2
Grant 10,870,921 - Cameron , et al. December 22, 2
2020-12-22
Precursors for silicon dioxide gap fill
Grant 10,043,658 - Hunks , et al. August 7, 2
2018-08-07
Precursors For Silicon Dioxide Gap Fill
App 20180130654 - Hunks; William ;   et al.
2018-05-10
Cobalt Deposition Selectivity On Copper And Dielectrics
App 20180130706 - Chen; Philip S.H. ;   et al.
2018-05-10
Fluorine free tungsten ALD/CVD process
Grant 9,637,395 - Li , et al. May 2, 2
2017-05-02
AMINE CATALYSTS FOR LOW TEMPERATURE ALD/CVD SiO2 DEPOSITION USING HEXACHLORODISILANE/H2O
App 20170103888 - Guo; Dingkai ;   et al.
2017-04-13
Tellurium compounds useful for deposition of tellurium containing materials
Grant 9,537,095 - Stender , et al. January 3, 2
2017-01-03
CYCLOPENTADIENYL TITANIUM ALKOXIDES WITH OZONE ACTIVATED LIGANDS FOR ALD OF TiO2
App 20160362790 - Cameron; Thomas M. ;   et al.
2016-12-15
DOPING OF ZrO2 FOR DRAM APPLICATIONS
App 20160343795 - Cissell; Julie ;   et al.
2016-11-24
Precursors For Silicon Dioxide Gap Fill
App 20160225615 - Hunks; William ;   et al.
2016-08-04
Doping of ZrO.sub.2 for DRAM applications
Grant 9,373,677 - Cissell , et al. June 21, 2
2016-06-21
Precursors for silicon dioxide gap fill
Grant 9,337,054 - Hunks , et al. May 10, 2
2016-05-10
Cluster ion implantation of arsenic and phosphorus
Grant 9,269,582 - Byl , et al. February 23, 2
2016-02-23
Antimony and germanium complexes useful for CVD/ALD of metal thin films
Grant 9,219,232 - Hunks , et al. December 22, 2
2015-12-22
Fluorine Free Tungsten Ald/cvd Process
App 20150251920 - Li; Weimin ;   et al.
2015-09-10
Antimony compounds useful for deposition of antimony-containing materials
Grant 9,034,688 - Chen , et al. May 19, 2
2015-05-19
Tellurium Compounds Useful For Deposition Of Tellurium Containing Materials
App 20140329357 - Stender; Matthias ;   et al.
2014-11-06
Low temperature deposition of phase change memory materials
Grant 8,877,549 - Roeder , et al. November 4, 2
2014-11-04
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films
App 20140220733 - Hunks; William ;   et al.
2014-08-07
Tellurium compounds useful for deposition of tellurium containing materials
Grant 8,796,068 - Stender , et al. August 5, 2
2014-08-05
Antimony Compounds Useful For Deposition Of Antimony-containing Materials
App 20140206136 - Chen; Tianniu ;   et al.
2014-07-24
Low Temperature Deposition Of Phase Change Memory Materials
App 20140206134 - Roeder; Jeffrey F. ;   et al.
2014-07-24
Antimony and germanium complexes useful for CVD/ALD of metal thin films
Grant 8,709,863 - Hunks , et al. April 29, 2
2014-04-29
Low temperature deposition of phase change memory materials
Grant 8,679,894 - Roeder , et al. March 25, 2
2014-03-25
Antimony compounds useful for deposition of antimony-containing materials
Grant 8,674,127 - Chen , et al. March 18, 2
2014-03-18
Cluster Ion Implantation Of Arsenic And Phosphorus
App 20140011346 - Byl; Oleg ;   et al.
2014-01-09
Tellurium Compounds Useful For Deposition Of Tellurium Containing Materials
App 20130288462 - Stender; Matthias ;   et al.
2013-10-31
DOPING OF ZrO2 FOR DRAM APPLICATIONS
App 20130122722 - Cissell; Julie ;   et al.
2013-05-16
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films
App 20130029456 - Hunks; William ;   et al.
2013-01-31
Low Temperature Deposition Of Phase Change Memory Materials
App 20130005078 - Roeder; Jeffrey F. ;   et al.
2013-01-03
Low temperature deposition of phase change memory materials
Grant 8,288,198 - Roeder , et al. October 16, 2
2012-10-16
Antimony and germanium complexes useful for CVD/ALD of metal thin films
Grant 8,268,665 - Hunks , et al. September 18, 2
2012-09-18
Zirconium, Hafnium And Titanium Precursors For Atomic Layer Deposition Of Corresponding Metal-containing Films
App 20120196449 - Xu; Chongying ;   et al.
2012-08-02
Amorphous Ge/te Deposition Process
App 20120108038 - Chen; Philip S.H. ;   et al.
2012-05-03
Amorphous Ge/Te deposition process
Grant 8,093,140 - Chen , et al. January 10, 2
2012-01-10
Super-dry reagent compositions for formation of ultra low k films
Grant 8,053,375 - Xu , et al. November 8, 2
2011-11-08
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films
App 20110263100 - Hunks; William ;   et al.
2011-10-27
Antimony and germanium complexes useful for CVD/ALD of metal thin films
Grant 8,008,117 - Hunks , et al. August 30, 2
2011-08-30
Antimony Compounds Useful For Deposition Of Antimony-containing Materials
App 20110111556 - Chen; Tianniu ;   et al.
2011-05-12
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films
App 20100317150 - Hunks; William ;   et al.
2010-12-16
Antimony and germanium complexes useful for CVD/ALD of metal thin films
Grant 7,838,329 - Hunks , et al. November 23, 2
2010-11-23
Novel Bismuth Precursors For Cvd/ald Of Thin Films
App 20100279011 - Chen; Tianniu ;   et al.
2010-11-04
Precursors For Silicon Dioxide Gap Fill
App 20100164057 - Hunks; William ;   et al.
2010-07-01
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films
App 20090305458 - Hunks; William ;   et al.
2009-12-10
Bicyclic Guanidinates And Bridging Diamides As Cvd/ald Precursors
App 20090275164 - Chen; Tianniu ;   et al.
2009-11-05
Tellurium Compounds Useful For Deposition Of Tellurium Containing Materials
App 20090215225 - Stender; Matthias ;   et al.
2009-08-27
Low Temperature Deposition Of Phase Change Memory Materials
App 20090124039 - Roeder; Jeffrey F. ;   et al.
2009-05-14
Amorphous Ge/te Deposition Process
App 20090112009 - Chen; Philip S.H. ;   et al.
2009-04-30
Metal And Metalloid Silylamides, Ketimates, Tetraalkylguanidinates And Dianionic Guanidinates Useful For Cvd/ald Of Thin Films
App 20090087561 - CHEN; Tianniu ;   et al.
2009-04-02

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