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name:-0.061208963394165
name:-0.017287015914917
name:-0.00050091743469238
Hung; Tzung-Yu Patent Filings

Hung; Tzung-Yu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hung; Tzung-Yu.The latest application filed is for "method of removing material layer and remnant metal".

Company Profile
0.13.19
  • Hung; Tzung-Yu - Tainan Hsien TW
  • Hung; Tzung-Yu - Tainan County TW
  • Hung; Tzung-Yu - Sinshih Township Tainan County TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method of removing material layer and remnant metal
Grant 7,884,028 - Chen , et al. February 8, 2
2011-02-08
Method for fabricating semiconductor MOS device
Grant 7,785,972 - Chang , et al. August 31, 2
2010-08-31
Semiconductor device
Grant 7,649,263 - Chang , et al. January 19, 2
2010-01-19
Fabrication method of semiconductor device
Grant 7,595,264 - Chang , et al. September 29, 2
2009-09-29
Method of fabricating nickel silicide
Grant 7,572,722 - Chen , et al. August 11, 2
2009-08-11
Method for forming metal silicide layer
Grant 7,553,762 - Hung , et al. June 30, 2
2009-06-30
Semiconductor device
Grant 7,482,668 - Hsieh , et al. January 27, 2
2009-01-27
Method Of Removing Material Layer And Remnant Metal
App 20080254640 - Chen; Yi-Wei ;   et al.
2008-10-16
Silicidation Process For Mos Transistor And Transistor Structure
App 20080224232 - Hsieh; Chao-Ching ;   et al.
2008-09-18
Method For Forming Metal Silicide Layer
App 20080194100 - Hung; Tzung-Yu ;   et al.
2008-08-14
Method For Cleaning Salicide
App 20080171449 - Hsieh; Chao-Ching ;   et al.
2008-07-17
Method of fabricating a semiconductor device
Grant 7,390,729 - Hsieh , et al. June 24, 2
2008-06-24
Method of forming a silicide
Grant 7,390,754 - Chang , et al. June 24, 2
2008-06-24
Semiconductor device having nickel silicide and method of fabricating nickel silicide
Grant 7,385,294 - Chen , et al. June 10, 2
2008-06-10
Fabrication Method Of Semiconductor Device
App 20080132063 - Chang; Yu-Lan ;   et al.
2008-06-05
Semiconductor Device
App 20080073727 - Hsieh; Chao-Ching ;   et al.
2008-03-27
Method Of Fabricating A Semiconductor Device
App 20080076213 - Hsieh; Chao-Ching ;   et al.
2008-03-27
Semiconductor Device
App 20080067684 - Chang; Yu-Lan ;   et al.
2008-03-20
Fabrication method of semiconductor device
Grant 7,344,978 - Chang , et al. March 18, 2
2008-03-18
Method For Fabricating Semiconductor Mos Device
App 20080038887 - Chang; Yu-Lan ;   et al.
2008-02-14
Method Of Stripping Remnant Metal
App 20080020587 - Chang; Chun-Chieh ;   et al.
2008-01-24
Method Of Fabricating Nickel Silicide
App 20070167009 - Chen; Yi-Wei ;   et al.
2007-07-19
Method of fabricating metal silicide layer
Grant 7,229,920 - Chen , et al. June 12, 2
2007-06-12
Pre-treatment method for physical vapor deposition of metal layer and method of forming metal silicide layer
App 20070087573 - Chiang; Yi-Yiing ;   et al.
2007-04-19
Method For Forming Silicide Layer
App 20070082494 - Chen; Yi-Wei ;   et al.
2007-04-12
Salicide process
App 20070059878 - Chang; Yu-Lan ;   et al.
2007-03-15
Semiconductor Device Having Nickel Silicide And Method Of Fabricating Nickel Silicide
App 20070054481 - Chen; Yi-Wei ;   et al.
2007-03-08
Method Of Manufacturing Metal Plug And Contact
App 20070032077 - Hung; Tzung-Yu ;   et al.
2007-02-08
Method Of Forming A Nickel Platinum Silicide
App 20070020925 - Hsieh; Chao-Ching ;   et al.
2007-01-25
Semiconductor Device And Fabrication Method Thereof
App 20060284263 - Chang; Yu-Lan ;   et al.
2006-12-21
Method of fabricating metal silicide layer
App 20060154474 - Chen; Yi-Wei ;   et al.
2006-07-13
Method of fabricating a dual damascene copper wire
Grant 6,849,541 - Hu , et al. February 1, 2
2005-02-01

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