Hung; Raymond Hoiman

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hung; Raymond Hoiman.The latest application filed is for "metal cap for contact resistance reduction".

Company Profile

2.7.7

Hung; Raymond Hoiman - Palo Alto CA
Hung; Raymond Hoiman - Cupertino CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Metal Cap For Contact Resistance Reduction App 20220231137 - Mebarki; Bencherki ; et al.	2022-07-21
Method for forming a metal gapfill Grant 11,355,391 - Cen , et al. June 7, 2	2022-06-07
In-situ integrated chambers Grant 11,037,838 - Li , et al. June 15, 2	2021-06-15
Method For Forming A Metal Gapfill App 20200303250 - CEN; Xi ; et al.	2020-09-24
Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high K at channel Grant 10,615,034 - Zheng , et al.	2020-04-07
Pre-clean Of Silicon Germanium For Pre-metal Contact At Source And Drain And Pre-high K At Channel App 20190326115 - Zheng; Bo ; et al.	2019-10-24
Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high k at channel Grant 10,163,630 - Zheng , et al. Dec	2018-12-25
Method Of Fabricating Air-gap Spacer For N7/n5 Finfet And Beyond App 20180122945 - CHANG; Chih-Yang ; et al.	2018-05-03
Method of fabricating air-gap spacer for N7/N5 finFET and beyond Grant 9,960,275 - Chang , et al. May 1, 2	2018-05-01
Pre-clean Of Silicon Germanium For Pre-metal Contact At Source And Drain And Pre-high K At Channel App 20170365468 - ZHENG; Bo ; et al.	2017-12-21
Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high K at channel Grant 9,735,009 - Zheng , et al. August 15, 2	2017-08-15
Pre-clean Of Silicon Germanium For Pre-metal Contact At Source And Drain And Pre-high K At Channel App 20160079062 - ZHENG; Bo ; et al.	2016-03-17
Double exposure patterning with carbonaceous hardmask Grant 8,293,460 - Chen , et al. October 23, 2	2012-10-23
Double Exposure Patterning With Carbonaceous Hardmask App 20090311635 - CHEN; HUI W. ; et al.	2009-12-17

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