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Patent applications and USPTO patent grants for HUNG LOW; Fernando.The latest application filed is for "silica-based slurry for selective polishing of carbon-based films".
Patent | Date |
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Silica-based Slurry For Selective Polishing Of Carbon-based Films App 20220089908 - REISS; Brian ;   et al. | 2022-03-24 |
Composition and method for copper barrier CMP Grant 10,988,635 - Kraft , et al. April 27, 2 | 2021-04-27 |
Composition And Method For Dielectric Cmp App 20210115298 - BROSNAN; Sarah ;   et al. | 2021-04-22 |
Composition And Method For Silicon Oxide And Carbon Doped Silicon Oxide Cmp App 20210115300 - KRAFT; Steven ;   et al. | 2021-04-22 |
Composition And Method For Dielectric Cmp App 20210115299 - BROSNAN; Sarah ;   et al. | 2021-04-22 |
Composition and method for metal CMP Grant 10,968,366 - Kraft , et al. April 6, 2 | 2021-04-06 |
Composition And Method For Cobalt Cmp App 20200172759 - HUNG LOW; Fernando ;   et al. | 2020-06-04 |
Composition And Method For Silicon Nitride Cmp App 20200172761 - HUNG LOW; Fernando ;   et al. | 2020-06-04 |
Composition And Method For Copper Barrier Cmp App 20200172762 - KRAFT; Steven ;   et al. | 2020-06-04 |
Composition And Method For Metal Cmp App 20200172760 - KRAFT; Steven ;   et al. | 2020-06-04 |
Composition And Method For Polishing Silicon Carbide App 20190241783 - IVANOV; Roman ;   et al. | 2019-08-08 |
Composition and method for polishing silicon carbide Grant 10,294,399 - Ivanov , et al. | 2019-05-21 |
Composition And Method For Polishing Silicon Carbide App 20180190506 - IVANOV; Roman ;   et al. | 2018-07-05 |
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