loadpatents
name:-0.007220983505249
name:-0.0038549900054932
name:-0.0084941387176514
HUNG LOW; Fernando Patent Filings

HUNG LOW; Fernando

Patent Applications and Registrations

Patent applications and USPTO patent grants for HUNG LOW; Fernando.The latest application filed is for "silica-based slurry for selective polishing of carbon-based films".

Company Profile
11.3.10
  • HUNG LOW; Fernando - Naperville IL
  • Hung Low; Fernando - Aurora IL
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Silica-based Slurry For Selective Polishing Of Carbon-based Films
App 20220089908 - REISS; Brian ;   et al.
2022-03-24
Composition and method for copper barrier CMP
Grant 10,988,635 - Kraft , et al. April 27, 2
2021-04-27
Composition And Method For Dielectric Cmp
App 20210115298 - BROSNAN; Sarah ;   et al.
2021-04-22
Composition And Method For Silicon Oxide And Carbon Doped Silicon Oxide Cmp
App 20210115300 - KRAFT; Steven ;   et al.
2021-04-22
Composition And Method For Dielectric Cmp
App 20210115299 - BROSNAN; Sarah ;   et al.
2021-04-22
Composition and method for metal CMP
Grant 10,968,366 - Kraft , et al. April 6, 2
2021-04-06
Composition And Method For Cobalt Cmp
App 20200172759 - HUNG LOW; Fernando ;   et al.
2020-06-04
Composition And Method For Silicon Nitride Cmp
App 20200172761 - HUNG LOW; Fernando ;   et al.
2020-06-04
Composition And Method For Copper Barrier Cmp
App 20200172762 - KRAFT; Steven ;   et al.
2020-06-04
Composition And Method For Metal Cmp
App 20200172760 - KRAFT; Steven ;   et al.
2020-06-04
Composition And Method For Polishing Silicon Carbide
App 20190241783 - IVANOV; Roman ;   et al.
2019-08-08
Composition and method for polishing silicon carbide
Grant 10,294,399 - Ivanov , et al.
2019-05-21
Composition And Method For Polishing Silicon Carbide
App 20180190506 - IVANOV; Roman ;   et al.
2018-07-05

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