Hung; Jung-Lung
Patent Applications and Registrations
Patent applications and USPTO patent grants for Hung; Jung-Lung.The latest application filed is for "temperature modification for chemical mechanical polishing".
- Hung; Jung-Lung - Hsinchu TW
- Hung; Jung-Lung - Hsinchu City TW
| Patent | Date |
|---|---|
| Temperature modification for chemical mechanical polishing Grant 9,550,270 - Hung , et al. January 24, 2 | 2017-01-24 |
| Sapphire pad conditioner Grant 9,452,509 - Hung , et al. September 27, 2 | 2016-09-27 |
| Temperature Modification For Chemical Mechanical Polishing App 20150038056 - Hung; Jung-Lung ; et al. | 2015-02-05 |
| Sapphire Pad Conditioner App 20150004787 - Hung; Jung-Lung ; et al. | 2015-01-01 |
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