Hung; Hoiman Raymond

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hung; Hoiman Raymond.The latest application filed is for "integration sequences with top surface profile modification".

Company Profile

0.4.4

Hung; Hoiman Raymond - Cupertino CA
Hung; Hoiman (Raymond) - Raymond
Hung, Hoiman Raymond - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Integration sequences with top surface profile modification Grant 8,043,933 - Kao , et al. October 25, 2	2011-10-25
Integration Sequences With Top Surface Profile Modification App 20100129982 - Kao; Chien-Teh ; et al.	2010-05-27
Integrated equipment set for forming a low K dielectric interconnect on a substrate App 20060246683 - Pan; Judon Tony ; et al.	2006-11-02
Precision dielectric etch using hexafluorobutadiene Grant 6,800,213 - Ding , et al. October 5, 2	2004-10-05
Enhancement of silicon oxide etch rate and nitride selectivity using hexafluorobutadiene or other heavy perfluorocarbon Grant 6,797,189 - Hung , et al. September 28, 2	2004-09-28
Process for etching oxide using hexafluorobutadiene or related fluorocarbons and manifesting a wide process window Grant 6,602,434 - Hung , et al. August 5, 2	2003-08-05
Precision dielectric etch using hexafluorobutadiene App 20030036287 - Ding, Ji ; et al.	2003-02-20
Enhancement Of Silicon Oxide Etch Rate And Nitride Selectivity Using Hexafluorobutadiene Or Other Heavy Perfluorocarbon App 20020175144 - HUNG, HOIMAN(RAYMOND) ; et al.	2002-11-28

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