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Patent applications and USPTO patent grants for Hummler; Klaus Martin.The latest application filed is for "prolonging optical element lifetime in an euv lithography system".
Patent | Date |
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Prolonging Optical Element Lifetime In An Euv Lithography System App 20220291591 - Ma; Yue ;   et al. | 2022-09-15 |
Oxygen-loss Resistant Top Coating For Optical Elements App 20220260756 - Ma; Yue ;   et al. | 2022-08-18 |
Prolonging optical element lifetime in an EUV lithography system Grant 11,340,532 - Ma , et al. May 24, 2 | 2022-05-24 |
System For Monitoring A Plasma App 20220151052 - Purvis; Michael Anthony ;   et al. | 2022-05-12 |
System for monitoring a plasma Grant 11,266,002 - Purvis , et al. March 1, 2 | 2022-03-01 |
Guiding Device And Associated System App 20210141311 - LABETSKI; Dzmitry ;   et al. | 2021-05-13 |
Prolonging Optical Element Lifetime In An Euv Lithography System App 20210109452 - Ma; Yue ;   et al. | 2021-04-15 |
Guiding device and associated system Grant 10,955,749 - Labetski , et al. March 23, 2 | 2021-03-23 |
System For Monitoring A Plasma App 20200344868 - Purvis; Michael Anthony ;   et al. | 2020-10-29 |
Guiding Device And Associated System App 20200089124 - LABETSKI; Dzmitry ;   et al. | 2020-03-19 |
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