Hukushima; Atsushi
Patent Applications and Registrations
Patent applications and USPTO patent grants for Hukushima; Atsushi.The latest application filed is for "sputtering target and manufacturing method thereof".
- Hukushima; Atsushi - Ibaraki JP
| Patent | Date |
|---|---|
| Tantalum sputtering target and method of manufacturing same Grant 8,172,960 - Oda , et al. May 8, 2 | 2012-05-08 |
| Sputtering target and manufacturing method thereof Grant 8,029,629 - Hukushima October 4, 2 | 2011-10-04 |
| Sputtering Target and Manufacturing Method Thereof App 20100058827 - Hukushima; Atsushi | 2010-03-11 |
| Tantalum sputtering target and method of manufacturing same App 20070102288 - Oda; Kunihiro ; et al. | 2007-05-10 |
| Sputtering target and production method therefor App 20040245099 - Hukushima, Atsushi | 2004-12-09 |
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