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Patent applications and USPTO patent grants for Hueselitz; Rico.The latest application filed is for "planarization of a material system in a semiconductor device by using a non-selective in situ prepared slurry".
Patent | Date |
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Semiconductor device comprising trench isolation Grant 10,103,067 - Baars , et al. October 16, 2 | 2018-10-16 |
Planarization of a material system in a semiconductor device by using a non-selective in situ prepared slurry Grant 8,585,465 - Groschopf , et al. November 19, 2 | 2013-11-19 |
Planarization of a Material System in a Semiconductor Device by Using a Non-Selective In Situ Prepared Slurry App 20110269381 - Groschopf; Johannes ;   et al. | 2011-11-03 |
Method for forming a defined recess in a damascene structure using a CMP process and a damascene structure App 20060172527 - Marxsen; Gerd ;   et al. | 2006-08-03 |
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