Huang; Yahui

Patent Applications and Registrations

Patent applications and USPTO patent grants for Huang; Yahui.The latest application filed is for "control method of radiofrequency source".

Company Profile

1.6.7

Huang; Yahui - Beijing CN
Huang; Yahui - Hsinchu TW
HUANG; Yahui - Hsinchu City TW
Huang; Yahui - Nirasaki JP
Huang, Yahui - Yamanashi JP
Huang, Yahui - Nirasaki-Shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Lower electrode mechanism and reaction chamber Grant 11,410,833 - Huang , et al. August 9, 2	2022-08-09
Control Method Of Radiofrequency Source App 20210398776 - HUANG; Yahui ; et al.	2021-12-23
Lower Electrode Mechanism And Reaction Chamber App 20200321198 - HUANG; Yahui ; et al.	2020-10-08
Modified nucleotide molecules of xylanase and application thereof Grant 8,809,018 - Huang , et al. August 19, 2	2014-08-19
Xylanase Composition With Increased Stability App 20140212948 - HUANG; Yahui ; et al.	2014-07-31
Xylanase composition with increased stability Grant 8,735,118 - Huang , et al. May 27, 2	2014-05-27
Modified Nucleotide Molecules Of Xylanase And Application Thereof App 20120288915 - Huang; Yahui ; et al.	2012-11-15
Xylanase Composition And Method For Manufacturing The Same App 20120214220 - Huang; Yahui ; et al.	2012-08-23
Silicon etching method Grant 7,109,123 - Mimura , et al. September 19, 2	2006-09-19
Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted thereon App 20040200804 - Sugiyama, Norikazu ; et al.	2004-10-14
Silicon etching method App 20040097090 - Mimura, Takanori ; et al.	2004-05-20

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