Huang; Wu-Song

Patent Applications and Registrations

Patent applications and USPTO patent grants for Huang; Wu-Song.The latest application filed is for "dielectric tone inversion materials".

Company Profile

1.102.85

Huang; Wu-Song - Brewster NY
Huang; Wu-Song - Hopewell Junction NY US
Huang; Wu-Song - Poughkeepsie NY
Huang; Wu-Song - Armonk NY
Huang; Wu-Song - Poughkeepsi NY
Huang; Wu-Song - Dobbs Ferry NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Wet strip process for an antireflective coating layer Grant 9,460,934 - Glodde , et al. October 4, 2	2016-10-04
Method of forming semiconductor structures with contact holes Grant 9,449,822 - Li , et al. September 20, 2	2016-09-20
Acid-strippable silicon-containing antireflective coating Grant 9,348,228 - Glodde , et al. May 24, 2	2016-05-24
Dielectric tone inversion materials Grant 9,337,033 - Glodde , et al. May 10, 2	2016-05-10
Dielectric Tone Inversion Materials App 20160126097 - Glodde; Martin ; et al.	2016-05-05
Method to mitigate resist pattern critical dimension variation in a double-exposure process Grant 9,316,916 - Chen , et al. April 19, 2	2016-04-19
Dielectric tone inversion materials Grant 9,281,212 - Glodde , et al. March 8, 2	2016-03-08
Exposure photolithography methods Grant 9,235,119 - Chen , et al. January 12, 2	2016-01-12
Developable bottom antireflective coating composition and pattern forming method using thereof Grant 9,040,225 - Chen , et al. May 26, 2	2015-05-26
Developable bottom antireflective coating composition and pattern forming method using thereof Grant 8,999,624 - Chen , et al. April 7, 2	2015-04-07
Silicon-containing antireflective coatings including non-polymeric silsesquioxanes Grant 8,999,625 - Glodde , et al. April 7, 2	2015-04-07
Hybrid photoresist composition and pattern forming method using thereof Grant 8,986,918 - Breyta , et al. March 24, 2	2015-03-24
Developable Bottom Antireflective Coating Composition And Pattern Forming Method Using Thereof App 20150050601 - Chen; Kuang-Jung ; et al.	2015-02-19
Exposure Photolithography Methods App 20140349237 - Chen; Kuang-Jung ; et al.	2014-11-27
Photoresist compositions Grant 8,846,296 - Chen , et al. September 30, 2	2014-09-30
Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof Grant 8,846,295 - Chen , et al. September 30, 2	2014-09-30
Wet Strip Process For An Antireflective Coating Layer App 20140273501 - Glodde; Martin ; et al.	2014-09-18
Silicon-containing Antireflective Coatings Including Non-polymeric Silsesquioxanes App 20140227641 - Glodde; Martin ; et al.	2014-08-14
Silicon containing coating compositions and methods of use Grant 8,802,347 - Allen , et al. August 12, 2	2014-08-12
Near-infrared Absorbing Film Compositions App 20140210034 - Huang; Wu-Song ; et al.	2014-07-31
Near-infrared absorbing film compositions Grant 8,772,376 - Huang , et al. July 8, 2	2014-07-08
Acid-strippable Silicon-containing Antireflective Coating App 20140186774 - Glodde; Martin ; et al.	2014-07-03
Patterning process Grant 8,759,220 - Ogihara , et al. June 24, 2	2014-06-24
Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer Grant 8,722,307 - Tachibana , et al. May 13, 2	2014-05-13
Developable bottom antireflective coating compositions for negative resists Grant 8,715,907 - Chen , et al. May 6, 2	2014-05-06
Hybrid Photoresist Composition And Pattern Forming Method Using Thereof App 20140072916 - Breyta; Gregory ; et al.	2014-03-13
Photoresist Composition Containing A Protected Hydroxyl Group For Negative Development And Pattern Forming Method Using Thereof App 20140072915 - Chen; Kuang-Jung ; et al.	2014-03-13
Developable Bottom Antireflective Coating Composition And Pattern Forming Method Using Thereof App 20140004712 - Chen; Kuang-Jung ; et al.	2014-01-02
Forming sub-lithographic patterns using double exposure Grant 8,609,327 - Chen , et al. December 17, 2	2013-12-17
Method For Enhancing Lithographic Imaging Of Isolated And Semi-isolated Features App 20130330672 - Huang; Wu-Song ; et al.	2013-12-12
Near-infrared absorbing film compositions Grant 8,586,283 - Glodde , et al. November 19, 2	2013-11-19
Photoresist Composition Containing A Protected Hydroxyl Group For Negative Development And Pattern Forming Method Using Thereof App 20130288178 - Chen; Kuang-Jung ; et al.	2013-10-31
Multiple exposure photolithography methods Grant 8,568,960 - Chen , et al. October 29, 2	2013-10-29
Developable bottom antireflective coating compositions especially suitable for ion implant applications Grant 8,557,501 - Huang , et al. October 15, 2	2013-10-15
Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same Grant 8,546,062 - Huang , et al. October 1, 2	2013-10-01
Method for enhancing lithographic imaging of isolated and semi-isolated features Grant 8,546,069 - Huang , et al. October 1, 2	2013-10-01
Method of forming a pattern of an array of shapes including a blocked region Grant 8,492,079 - Chen , et al. July 23, 2	2013-07-23
Photoresist Composition For Negative Development And Pattern Forming Method Using Thereof App 20130164680 - Chen; Kuang-Jung ; et al.	2013-06-27
Near-infrared Absorbing Film Composition For Lithographic Application App 20130157463 - Goldfarb; Dario L. ; et al.	2013-06-20
Photoresist compositions and methods for shrinking a photoresist critical dimension Grant 8,394,573 - Huang , et al. March 12, 2	2013-03-12
Integration process to improve focus leveling within a lot process variation Grant 8,395,228 - Li , et al. March 12, 2	2013-03-12
Developable Bottom Antireflective Coating Compositions For Negative Resists App 20130040238 - CHEN; KUANG-JUNG ; et al.	2013-02-14
Near-Infrared Absorbing Film Compositions App 20130001484 - Glodde; Martin ; et al.	2013-01-03
Near-infrared Absorptive Layer-forming Composition And Multilayer Film Comprising Near-infrared Absorptive Layer App 20120301828 - TACHIBANA; Seiichiro ; et al.	2012-11-29
Top antireflective coating composition containing hydrophobic and acidic groups Grant 8,304,178 - Khojasteh , et al. November 6, 2	2012-11-06
Near-infrared absorbing film compositions Grant 8,293,451 - Glodde , et al. October 23, 2	2012-10-23
Method for reducing side lobe printing using a barrier layer Grant 8,268,542 - Chen , et al. September 18, 2	2012-09-18
Photoresist Compositions App 20120214099 - Chen; Kuang-Jung ; et al.	2012-08-23
Multiple exposure photolithography methods and photoresist compositions Grant 8,236,476 - Chen , et al. August 7, 2	2012-08-07
Photolithography focus improvement by reduction of autofocus radiation transmission into substrate Grant 8,227,180 - Brunner , et al. July 24, 2	2012-07-24
Method for removing threshold voltage adjusting layer with external acid diffusion process Grant 8,227,307 - Chen , et al. July 24, 2	2012-07-24
Developable Bottom Antireflective Coating Compositions Especially Suitable For Ion Implant Applications App 20120178029 - Huang; Wu-Song ; et al.	2012-07-12
Multiple Exposure Photolithography Methods App 20120178027 - Chen; Kuang-Jung ; et al.	2012-07-12
Multi-exposure Lithography Employing Differentially Sensitive Photoresist Layers App 20120156450 - Huang; Wu-Song ; et al.	2012-06-21
Developable bottom antireflective coating compositions especially suitable for ion implant applications Grant 8,182,978 - Huang , et al. May 22, 2	2012-05-22
Photoresist Composition For Negative Development And Pattern Forming Method Using Thereof App 20120122031 - Chen; Kuang-Jung ; et al.	2012-05-17
Novel Integration Process to Improve Focus Leveling Within a Lot Process Variation App 20120112302 - Li; Wai-Kin ; et al.	2012-05-10
Multi-exposure lithography employing differentially sensitive photoresist layers Grant 8,158,014 - Huang , et al. April 17, 2	2012-04-17
Photoresist Compositions And Methods For Shrinking A Photoresist Critical Dimension App 20120070787 - Huang; Wu-Song ; et al.	2012-03-22
Self-forming Top Anti-reflective Coating Compositions And, Photoresist Mixtures And Method Of Imaging Using Same App 20120070782 - Huang; Wu-Song ; et al.	2012-03-22
Chemical trim of photoresist lines by means of a tuned overcoat Grant 8,137,893 - Burns , et al. March 20, 2	2012-03-20
Method Of Forming Semiconductor Structures With Contact Holes App 20120028476 - Li; Wai-Kin ; et al.	2012-02-02
Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same Grant 8,097,401 - Huang , et al. January 17, 2	2012-01-17
Photoresists and methods for optical proximity correction Grant 8,053,172 - Halle , et al. November 8, 2	2011-11-08
Near-infrared Absorptive Layer-forming Composition And Multilayer Film App 20110262862 - OHASHI; Masaki ; et al.	2011-10-27
Near-infrared Absorptive Layer-forming Composition And Multilayer Film App 20110262863 - TACHIBANA; Seiichiro ; et al.	2011-10-27
Photolithography Focus Improvement By Reduction Of Autofocus Radiation Transmission Into Substrate App 20110256486 - Brunner; Timothy A. ; et al.	2011-10-20
Fused aromatic structures and methods for photolithographic applications Grant 8,029,975 - Bucchignano , et al. October 4, 2	2011-10-04
Photoresist compositions and methods related to near field masks Grant 8,021,828 - Huang , et al. September 20, 2	2011-09-20
Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates Grant 7,960,095 - Moreau , et al. June 14, 2	2011-06-14
Chemical Trim of Photoresist Lines by Means of A Tuned Overcoat App 20110129652 - Burns; Sean David ; et al.	2011-06-02
Silicon Containing Coating Compositions And Methods Of Use App 20110111345 - Allen; Robert D. ; et al.	2011-05-12
Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition Grant 7,901,864 - Huang , et al. March 8, 2	2011-03-08
Near-Infrared Absorbing Film Compositions App 20110042771 - Huang; Wu-Song ; et al.	2011-02-24
Near-Infrared Absorbing Film Compositions App 20110042653 - Glodde; Martin ; et al.	2011-02-24
Chemical trim of photoresist lines by means of a tuned overcoat material Grant 7,862,982 - Burns , et al. January 4, 2	2011-01-04
Method For Removing Threshold Voltage Adjusting Layer With External Acid Diffusion Process App 20100330810 - Chen; Kuang-Jung ; et al.	2010-12-30
Photoresist compositions and method for multiple exposures with multiple layer resist systems Grant 7,838,200 - Chen , et al. November 23, 2	2010-11-23
Photoresist compositions and method for multiple exposures with multiple layer resist systems Grant 7,838,198 - Chen , et al. November 23, 2	2010-11-23
Method Of Forming A Pattern Of An Array Of Shapes Including A Blocked Region App 20100272967 - Chen; Chia-Chen ; et al.	2010-10-28
Method To Mitigate Resist Pattern Critical Dimension Variation In A Double-exposure Process App 20100255428 - CHEN; KUANG-JUNG ; et al.	2010-10-07
Photoresist Compositions And Process For Multiple Exposures With Multiple Layer Photoresist Systems App 20100248147 - Chen; Kuang-Jung ; et al.	2010-09-30
Self-forming Top Anti-reflective Coating Compositions And, Photoresist Mixtures And Method Of Imaging Using Same App 20100248145 - Huang; Wu-Song ; et al.	2010-09-30
Photoresist compositions and process for multiple exposures with multiple layer photoresist systems Grant 7,803,521 - Chen , et al. September 28, 2	2010-09-28
Developable Bottom Antireflective Coating Compositions Especially Suitable For Ion Implant Applications App 20100196825 - Huang; Wu-Song ; et al.	2010-08-05
Method For Enhancing Lithographic Imaging Of Isolated And Semi-isolated Features App 20100178619 - Huang; Wu-Song ; et al.	2010-07-15
High resolution imaging process using an in-situ image modifying layer Grant 7,709,187 - Patel , et al. May 4, 2	2010-05-04
Top Antireflective Coating Composition Containing Hydrophobic And Acidic Groups App 20100047712 - Khojasteh; Mahmoud ; et al.	2010-02-25
Forming Sub-lithographic Patterns Using Double Exposure App 20100009298 - Chen; Kuang-Jung ; et al.	2010-01-14
Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer Grant 7,638,266 - Angelopoulos , et al. December 29, 2	2009-12-29
Multi-exposure Lithography Employing Differentially Sensitive Photoresist Layers App 20090311491 - Huang; Wu-Song ; et al.	2009-12-17
Chemical Trim Of Photoresist Lines By Means Of A Tuned Overcoat Material App 20090311490 - Burns; Sean David ; et al.	2009-12-17
Fused Aromatic Structures And Methods For Photolithographic Applications App 20090286180 - Bucchignano; James J. ; et al.	2009-11-19
Top antireflective coating composition containing hydrophobic and acidic groups Grant 7,608,390 - Khojasteh , et al. October 27, 2	2009-10-27
Photoresist Compositions And Methods Related To Near Field Masks App 20090214959 - Huang; Wu-Song ; et al.	2009-08-27
Photoresists And Methods For Optical Proximity Correction App 20090214981 - Halle; Scott David ; et al.	2009-08-27
Photolithography Focus Improvement By Reduction Of Autofocus Radiation Transmission Into Substrate App 20090208865 - Brunner; Timothy A. ; et al.	2009-08-20
Fused aromatic structures and methods for photolithographic applications Grant 7,566,527 - Bucchignano , et al. July 28, 2	2009-07-28
Aromatic Fluorine-free Photoacid Generators And Photoresist Compositions Containing The Same App 20090181319 - Li; Wenjie ; et al.	2009-07-16
Si-containing polymers for nano-pattern device fabrication Grant 7,560,222 - Chen , et al. July 14, 2	2009-07-14
Multiple Exposure Photolithography Methods And Photoresist Compostions App 20090176174 - Chen; Kuang-Jung ; et al.	2009-07-09
Photoresist Compositions And Method For Multiple Exposures With Multiple Layer Resist Systems App 20090155718 - Chen; Kuang-Jung ; et al.	2009-06-18
Photoresist Compositions And Method For Multiple Exposures With Multiple Layer Resist Systems App 20090155715 - Chen; Kuang-Jung ; et al.	2009-06-18
Method For Reducing Side Lobe Printing Using A Barrier Layer App 20090142704 - Chen; Kuang-Jung ; et al.	2009-06-04
Photoresist Compositions And Process For Multiple Exposures With Multiple Layer Photoresist Systems App 20090130590 - Chen; Kuang-Jung ; et al.	2009-05-21
Method of formation of a damascene structure utilizing a protective film Grant 7,501,353 - Li , et al. March 10, 2	2009-03-10
Fused Aromatic Structures And Methods For Photolithographic Applications App 20090004596 - Bucchignano; James J. ; et al.	2009-01-01
Low refractive index polymers as underlayers for silicon-containing photoresists Grant 7,439,302 - Huang , et al. October 21, 2	2008-10-21
Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome or Sensitive Substrates App 20080227030 - Moreau; Wayne M. ; et al.	2008-09-18
Method Of Formation Of A Damascene Structure Utilizing A Protective Film App 20080153296 - Li; Wai-Kin ; et al.	2008-06-26
High Resolution Imaging Process Using an In-Situ Image Modifying Layer App 20080145793 - Patel; Kaushal ; et al.	2008-06-19
Si-CONTAINING POLYMERS FOR NANO-PATTERN DEVICE FABRICATION App 20080102401 - Chen; Kuang-Jung ; et al.	2008-05-01
Method Of Patterning Contact Holes App 20080085598 - Li; Wai-Kin ; et al.	2008-04-10
Top Antireflective Coating Composition Containing Hydrophobic And Acidic Groups App 20080032228 - Khojasteh; Mahmoud ; et al.	2008-02-07
Low refractive index polymers as underlayers for silicon-containing photoresists Grant 7,326,523 - Huang , et al. February 5, 2	2008-02-05
High sensitivity resist compositions for electron-based lithography Grant 7,314,700 - Huang , et al. January 1, 2	2008-01-01
Silicon-containing compositions for spin-on arc/hardmask materials Grant 7,276,327 - Angelopoulos , et al. October 2, 2	2007-10-02
Silicon-containing compositions for spin-on ARC/hardmask materials Grant 7,270,931 - Angelopoulos , et al. September 18, 2	2007-09-18
Method of making a packaged radiation sensitive resist film-coated workpiece Grant 7,168,224 - Angelopoulos , et al. January 30, 2	2007-01-30
Molecular photoresists containing nonpolymeric silsesquioxanes Grant 7,141,692 - Allen , et al. November 28, 2	2006-11-28
Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging Grant 7,090,963 - Medeiros , et al. August 15, 2	2006-08-15
Low refractive index polymers as underlayers for silicon-containing photoresists App 20060134546 - Huang; Wu-Song ; et al.	2006-06-22
Low refractive index polymers as underlayers for silicon-containing photoresists App 20060134547 - Huang; Wu-Song ; et al.	2006-06-22
High sensitivity resist compositions for electron-based lithography App 20060127800 - Huang; Wu-Song ; et al.	2006-06-15
Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition App 20060063103 - Huang; Wu-Song ; et al.	2006-03-23
Silicon-containing compositions for spin-on arc/hardmask materials App 20060058489 - Angelopoulos; Marie ; et al.	2006-03-16
Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer App 20060035167 - Angelopoulos; Marie ; et al.	2006-02-16
Low-activation energy silicon-containing resist system Grant 6,939,664 - Huang , et al. September 6, 2	2005-09-06
Molecular photoresists containing nonpolymeric silsesquioxanes App 20050112382 - Allen, Robert David ; et al.	2005-05-26
Silicon-containing resist systems with cyclic ketal protecting groups App 20050106494 - Huang, Wu-Song ; et al.	2005-05-19
Low-activation Energy Silicon-containing Resist System App 20050089792 - Huang, Wu-Song ; et al.	2005-04-28
Silicon-containing compositions for spin-on arc/hardmask materials App 20050074689 - Angelopoulos, Marie ; et al.	2005-04-07
Process For Forming Features Of 50 Nm Or Less Half-pitch With Chemically Amplified Resist Imaging App 20040265747 - Medeiros, David R. ; et al.	2004-12-30
Radiation sensitive silicon-containing negative resists and use thereof Grant 6,821,718 - Angelopoulos , et al. November 23, 2	2004-11-23
Antireflective SiO-containing compositions for hardmask layer Grant 6,730,454 - Pfeiffer , et al. May 4, 2	2004-05-04
Packaged radiation sensitive coated workpiece process for making and method of storing same App 20040045866 - Angelopoulos, Marie ; et al.	2004-03-11
Radiation sensitive silicon-containing negative resists and use thereof App 20040048204 - Angelopoulos, Marie ; et al.	2004-03-11
Polymers and use thereof Grant 6,689,540 - Aviram , et al. February 10, 2	2004-02-10
Radiation sensitive silicon-containing negative resists and use thereof Grant 6,653,045 - Angelopoulos , et al. November 25, 2	2003-11-25
Resist compositions comprising silyl ketals and methods of use thereof Grant 6,641,971 - Huang , et al. November 4, 2	2003-11-04
Antireflective SiO-containing compositions for hardmask layer App 20030198877 - Pfeiffer, Dirk ; et al.	2003-10-23
Etch improved resist systems containing acrylate (or methacrylate) silane monomers App 20030049561 - Angelopoulos, Marie ; et al.	2003-03-13
Packaged radiation sensitive coated workpiece process for making and method of storing same App 20030019782 - Angelopoulos, Marie ; et al.	2003-01-30
Antireflective silicon-containing compositions as hardmask layer Grant 6,503,692 - Angelopoulos , et al. January 7, 2	2003-01-07
Resist compositions comprising silyl ketals and methods of use thereof App 20020197556 - Huang, Wu-Song ; et al.	2002-12-26
Antireflective silicon-containing compositions as hardmask layer App 20020187422 - Angelopoulos, Marie ; et al.	2002-12-12
Radiation sensitive silicon-containing negative resists and use thereof App 20020115017 - Angelopoulos, Marie ; et al.	2002-08-22
Antireflective silicon-containing compositions as hardmask layer Grant 6,420,088 - Angelopoulos , et al. July 16, 2	2002-07-16
Mask-making using resist having SIO bond-containing polymer Grant 6,420,084 - Angelopoulos , et al. July 16, 2	2002-07-16
Polymers and use thereof App 20020090574 - Aviram, Ari ; et al.	2002-07-11
Hybrid resist based on photo acid/photo base blending Grant 6,338,934 - Chen , et al. January 15, 2	2002-01-15
Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups Grant 6,303,263 - Chen , et al. October 16, 2	2001-10-16
Photoresist system and process for aerial image enhancement Grant 6,245,492 - Huang , et al. June 12, 2	2001-06-12
Optimization of space width for hybrid photoresist Grant 6,200,726 - Chen , et al. March 13, 2	2001-03-13
Approach to formulating irradiation sensitive positive resists Grant 6,103,447 - Chen , et al. August 15, 2	2000-08-15
E-beam application to mask making using new improved KRS resist system Grant 6,043,003 - Bucchignano , et al. March 28, 2	2000-03-28
E-beam application to mask making using new improved KRS resist system Grant 6,037,097 - Bucchignano , et al. March 14, 2	2000-03-14
Methods for preparing photoresist compositions Grant 5,919,597 - Sinta , et al. July 6, 1	1999-07-06
High contrast photoresists comprising acid sensitive crosslinked polymeric resins Grant 5,712,078 - Huang , et al. January 27, 1	1998-01-27
Acid scavengers for use in chemically amplified photoresists Grant 5,609,989 - Bantu , et al. March 11, 1	1997-03-11
Fabrication of printed circuit boards using conducting polymer Grant 5,300,208 - Angelopoulos , et al. April 5, 1	1994-04-05
Electrically conductive polymeric materials and uses thereof Grant 5,202,061 - Angelopoulos , et al. April 13, 1	1993-04-13
Electrically conductive polymeric materials and uses thereof Grant 5,200,112 - Angelopoulos , et al. April 6, 1	1993-04-06
Electrically conductive polymeric Grant 5,198,153 - Angelopoulos , et al. March 30, 1	1993-03-30
Solder/polymer composite paste and method Grant 5,062,896 - Huang , et al. November 5, 1	1991-11-05