Huang; Jensheng

Patent Applications and Registrations

Patent applications and USPTO patent grants for Huang; Jensheng.The latest application filed is for "compact modeling for the negative tone development processes".

Company Profile

2.16.13

Huang; Jensheng - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Compact modeling for the negative tone development processes Grant 10,852,635 - Kuo , et al. December 1, 2	2020-12-01
Compact Modeling For The Negative Tone Development Processes App 20190072847 - Kuo; Chun-Chieh ; et al.	2019-03-07
Modeling mask errors using aerial image sensitivity Grant 8,812,145 - Fan , et al. August 19, 2	2014-08-19
System and technique for modeling resist profile change sensitivity at different heights Grant 8,631,359 - Huang , et al. January 14, 2	2014-01-14
Modeling Mask Errors Using Aerial Image Sensitivity App 20130131857 - Fan; Yongfa ; et al.	2013-05-23
Method and apparatus for using aerial image sensitivity to model mask errors Grant 8,355,807 - Fan , et al. January 15, 2	2013-01-15
Etch-aware OPC model calibration by using an etch bias filter Grant 8,255,838 - Xue , et al. August 28, 2	2012-08-28
Method and apparatus for calibrating a photolithography process model by using a process window parameter Grant 8,250,498 - Huang , et al. August 21, 2	2012-08-21
Method and apparatus for determining a photolithography process model which models the influence of topography variations Grant 8,181,128 - Huang , et al. May 15, 2	2012-05-15
Method And Apparatus For Calibrating A Photolithography Process Model By Using A Process Window Parameter App 20110185324 - Huang; JenSheng ; et al.	2011-07-28
Method And Apparatus For Using Aerial Image Sensitivity To Model Mask Errors App 20110184546 - Fan; Yongfa ; et al.	2011-07-28
Etch-aware Opc Model Calibration By Using An Etch Bias Filter App 20110179393 - Xue; Jing ; et al.	2011-07-21
Method and apparatus for determining a process model that models the impact of a CAR/PEB on the resist profile Grant 7,934,176 - Huang , et al. April 26, 2	2011-04-26
Modeling mask corner rounding effects using multiple mask layers Grant 7,853,919 - Huang , et al. December 14, 2	2010-12-14
Method And Apparatus For Determining A Process Model That Models The Impact Of A Car/peb On The Resist Profile App 20100218160 - Huang; Jensheng ; et al.	2010-08-26
Method and apparatus for determining a process model that models the impact of CAR/PEB on the resist profile Grant 7,743,357 - Huang , et al. June 22, 2	2010-06-22
Modeling Mask Corner Rounding Effects Using Multiple Mask Layers App 20100146476 - Huang; Jensheng ; et al.	2010-06-10
Method and apparatus for determining whether a sub-resolution assist feature will print Grant 7,727,687 - Melvin, III , et al. June 1, 2	2010-06-01
Facilitating process model accuracy by modeling mask corner rounding effects Grant 7,707,539 - Huang , et al. April 27, 2	2010-04-27
Method And Apparatus For Determining A Photolithography Process Model Which Models The Influence Of Topography Variations App 20100095264 - Huang; Jensheng ; et al.	2010-04-15
Facilitating Process Model Accuracy By Modeling Mask Corner Rounding Effects App 20090089736 - Huang; Jensheng ; et al.	2009-04-02
Compensating for effects of topography variation by using a variable intensity-threshold Grant 7,491,479 - Melvin, III , et al. February 17, 2	2009-02-17
Method and apparatus for determining an accurate photolithography process model Grant 7,454,739 - Huang , et al. November 18, 2	2008-11-18
Method and apparatus for determining whether a sub-resolution assist feature will print App 20070292777 - Melvin; Lawrence S. ; et al.	2007-12-20
Method and apparatus for determining a process model that models the impact of CAR/PEB on the resist profile App 20070282574 - Huang; Jensheng ; et al.	2007-12-06
Method and apparatus for determining an accurate photolithography process model App 20070283312 - Huang; Jensheng ; et al.	2007-12-06
Compensating for effects of topography variation by using a variable intensity-threshold App 20070082281 - Melvin; Lawrence S. III ; et al.	2007-04-12

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