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Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability
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Methods For Depositing Dielectric Material
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Methods for depositing dielectric material
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Biased cover ring for a substrate processing system
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Physical Vapor Deposition (pvd) Chamber With In Situ Chamber Cleaning Capability
App 20200395198 - ALLEN; ADOLPH M. ; et al. | 2020-12-17 |
Alignment systems employing actuators providing relative displacement between lid assemblies of process chambers and substrates, and related methods
Grant 10,858,735 - Wang , et al. December 8, 2 | 2020-12-08 |
High density, low stress amorphous carbon film, and process and equipment for its deposition
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Techniques for forming low stress etch-resistant mask using implantation
Grant 10,811,257 - Prasad , et al. October 20, 2 | 2020-10-20 |
Methods For Depositing Dielectric Material
App 20200090946 - CITLA; Bhargav S. ; et al. | 2020-03-19 |
Method to improve film quality for PVD carbon with reactive gas and bias power
Grant 10,570,506 - Citla , et al. Feb | 2020-02-25 |
Pulse shape controller for sputter sources
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Alignment Systems Employing Actuators Providing Relative Displacement Between Lid Assemblies Of Process Chambers And Substrates,
App 20190390334 - WANG; Danny D. ; et al. | 2019-12-26 |
Alignment systems employing actuators providing relative displacement between lid assemblies of process chambers and substrates, and related methods
Grant 10,435,786 - Wang , et al. O | 2019-10-08 |
Techniques For Forming Low Stress Etch-resistant Mask Using Implantation
App 20190304783 - Prasad; Rajesh ; et al. | 2019-10-03 |
Pulsed Dc Source For High Power Impulse Magnetron Sputtering Physical Vapor Deposition Of Dielectric Films And Methods Of Application
App 20190127842 - BABAYAN; Viachslav ; et al. | 2019-05-02 |
Sync Controller For High Impulse Magnetron Sputtering
App 20190088457 - BABAYAN; Viachslav ; et al. | 2019-03-21 |
Methods for forming fin structures with desired profile for 3D structure semiconductor applications
Grant 10,128,337 - Zhou , et al. November 13, 2 | 2018-11-13 |
Method To Improve Film Quality For Pvd Carbon With Reactive Gas And Bias Power
App 20180209037 - CITLA; Bhargav ; et al. | 2018-07-26 |
Biased Cover Ring For A Substrate Processing System
App 20180151325 - ALLEN; ADOLPH MILLER ; et al. | 2018-05-31 |
Stress Balanced Electrostatic Substrate Carrier With Contacts
App 20180122679 - Roy; Shambhu N. ; et al. | 2018-05-03 |
POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS)
App 20180108519 - BABAYAN; VIACHSLAV ; et al. | 2018-04-19 |
High Density, Low Stress Amorphous Carbon Film, And Process And Equipment For Its Deposition
App 20180051368 - Liu; Jingjing ; et al. | 2018-02-22 |
Pulse Shape Controller For Sputter Sources
App 20180044781 - STOWELL; Michael ; et al. | 2018-02-15 |
Processed Wafer As Top Plate Of A Workpiece Carrier In Semiconductor And Mechanical Processing
App 20180025931 - Nemani; Srinivas D. ; et al. | 2018-01-25 |
Methods For Forming Fin Structures With Desired Profile For 3d Structure Semiconductor Applications
App 20170352726 - ZHOU; Jie ; et al. | 2017-12-07 |
Method and apparatus for multizone plasma generation
Grant 9,809,881 - Rogers , et al. November 7, 2 | 2017-11-07 |
Alignment Systems Employing Actuators Providing Relative Displacement Between Lid Assemblies Of Process Chambers And Substrates, And Related Methods
App 20160068951 - WANG; Danny D. ; et al. | 2016-03-10 |
Silicon Nitride Gapfill Implementing High Density Plasma
App 20140187045 - Hua; Zhong Qiang ; et al. | 2014-07-03 |
Metal Processing Using High Density Plasma
App 20140186544 - Hua; Zhong Qiang | 2014-07-03 |
Pretreatment And Improved Dielectric Coverage
App 20130252440 - Luo; Lei ; et al. | 2013-09-26 |
Conformality of oxide layers along sidewalls of deep vias
Grant 8,404,583 - Hua , et al. March 26, 2 | 2013-03-26 |
Method And Apparatus For Multizone Plasma Generation
App 20120208371 - ROGERS; MATTHEW SCOTT ; et al. | 2012-08-16 |
Methods For Forming Low Moisture Dielectric Films
App 20120058281 - Hua; Zhong Qiang ; et al. | 2012-03-08 |
Method for doping non-planar transistors
Grant 8,114,761 - Mandrekar , et al. February 14, 2 | 2012-02-14 |
Methods For Forming Low Stress Dielectric Films
App 20120015113 - Hua; Zhong Qiang ; et al. | 2012-01-19 |
Conformality Of Oxide Layers Along Sidewalls Of Deep Vias
App 20110223760 - Hua; Zhong Qiang ; et al. | 2011-09-15 |
Remote plasma clean process with cycled high and low pressure clean steps
Grant 7,967,913 - Hua , et al. June 28, 2 | 2011-06-28 |
Method For Doping Non-planar Transistors
App 20110129990 - Mandrekar; Tushar V. ; et al. | 2011-06-02 |
Internal balanced coil for inductively coupled high density plasma processing chamber
Grant 7,789,993 - Chen , et al. September 7, 2 | 2010-09-07 |
HDP-CVD SiON films for gap-fill
Grant 7,704,897 - Mungekar , et al. April 27, 2 | 2010-04-27 |
Remote Plasma Clean Process With Cycled High And Low Pressure Clean Steps
App 20100095979 - Hua; Zhong Qiang ; et al. | 2010-04-22 |
Hdp-cvd Sion Films For Gap-fill
App 20090215281 - MUNGEKAR; HEMANT P. ; et al. | 2009-08-27 |
Internal balanced coil for inductively coupled high density plasma processing chamber
Grant 7,572,647 - Chen , et al. August 11, 2 | 2009-08-11 |
Gas delivery system for semiconductor processing
Grant 7,498,268 - Gondhalekar , et al. March 3, 2 | 2009-03-03 |
Internal Balanced Coil For Inductively Coupled High Density Plasma Processing Chamber
App 20080185284 - Chen; Robert ; et al. | 2008-08-07 |
Internal Balanced Coil For Inductively Coupled High Density Plasma Processing Chamber
App 20080188090 - Chen; Robert ; et al. | 2008-08-07 |
Internal Balanced Coil For Inductively Coupled High Density Plasma Processing Chamber
App 20080188087 - CHEN; ROBERT ; et al. | 2008-08-07 |
Multi-step Dep-etch-dep High Density Plasma Chemical Vapor Deposition Processes For Dielectric Gapfills
App 20080142483 - Hua; Zhong Qiang ; et al. | 2008-06-19 |
Gas Delivery System For Semiconductor Processing
App 20070048446 - Gondhalekar; Sudhir ; et al. | 2007-03-01 |
Multistep remote plasma clean process
Grant 7,159,597 - Hua , et al. January 9, 2 | 2007-01-09 |
Gas delivery system for semiconductor processing
Grant 7,141,138 - Gondhalekar , et al. November 28, 2 | 2006-11-28 |
Method for high aspect ratio HDP CVD gapfill
Grant 7,064,077 - Hua , et al. June 20, 2 | 2006-06-20 |
Method for high aspect ratio HDP CVD gapfill
App 20050079715 - Hua, Zhong Qiang ; et al. | 2005-04-14 |
Gas delivery system for semiconductor processing
App 20040231798 - Gondhalekar, Sudhir ; et al. | 2004-11-25 |
Temperature controlled dome-coil system for high power inductively coupled plasma systems
Grant 6,822,185 - Welch , et al. November 23, 2 | 2004-11-23 |
Method for high aspect ratio HDP CVD gapfill
Grant 6,812,153 - Hua , et al. November 2, 2 | 2004-11-02 |
Gas delivery system for semiconductor processing
App 20040126952 - Gondhalekar, Sudhir ; et al. | 2004-07-01 |
Temperature controlled dome-coil system for high power inductively coupled plasma systems
App 20040065645 - Welch, Michael ; et al. | 2004-04-08 |
Method for high aspect ratio HDP CVD gapfill
App 20030203637 - Hua, Zhong Qiang ; et al. | 2003-10-30 |
Multistep remote plasma clean process
App 20030029475 - Hua, Zhong Qiang ; et al. | 2003-02-13 |
In situ deposition and integration of silicon nitride in a high density plasma reactor
Grant 6,372,291 - Hua , et al. April 16, 2 | 2002-04-16 |
Fiber-reinforced cementitious composites
Grant 5,705,233 - Denes , et al. January 6, 1 | 1998-01-06 |
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