Patent | Date |
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Method for processing semiconductor wafer Grant 9,852,932 - Kao , et al. December 26, 2 | 2017-12-26 |
Method For Processing Semiconductor Wafer App 20170148651 - KAO; Mao-Lin ;   et al. | 2017-05-25 |
Semiconductor processing station and method for processing semiconductor wafer Grant 9,558,974 - Kao , et al. January 31, 2 | 2017-01-31 |
Ultra-high vacuum (UHV) wafer processing Grant 9,281,221 - Kao , et al. March 8, 2 | 2016-03-08 |
Ultra-high Vacuum (uhv) Wafer Processing App 20140140792 - Kao; Chung-En ;   et al. | 2014-05-22 |
Semiconductor Processing Station And Method For Processing Semiconductor Wafer App 20140086720 - KAO; Mao-Lin ;   et al. | 2014-03-27 |
Chemical mechanical planarization apparatus Grant 8,057,280 - Hu , et al. November 15, 2 | 2011-11-15 |
Chemical Mechanical Planarization Methods And Apparatus App 20100323587 - HU; Tien-Chen ;   et al. | 2010-12-23 |
System for cleaning a wafer Grant 7,823,241 - Hu , et al. November 2, 2 | 2010-11-02 |
Chemical mechanical planarization methods Grant 7,824,243 - Hu , et al. November 2, 2 | 2010-11-02 |
Chemical Mechanical Planarization Methods And Apparatus App 20080318494 - Hu; Tien-Chen ;   et al. | 2008-12-25 |
System for cleaning a wafer App 20080229526 - Hu; Tien-Chen ;   et al. | 2008-09-25 |
Convex profile anode for electroplating system Grant 7,014,739 - Lin , et al. March 21, 2 | 2006-03-21 |
Calibration wafer and kit Grant 6,914,337 - Chuang , et al. July 5, 2 | 2005-07-05 |
Calibration Wafer And Kit App 20050091863 - Chuang, Chih-Nan ;   et al. | 2005-05-05 |
Apparatus and method for dry-loading of substrates in scrubber cleaner App 20050069399 - Hsieh, Chih-Ming ;   et al. | 2005-03-31 |
Linear chemical mechanical polishing apparatus equipped with programmable pneumatic support platen and method of using Grant 6,837,774 - Hu , et al. January 4, 2 | 2005-01-04 |
Belt tensioning assembly for CMP apparatus Grant 6,726,532 - Lin , et al. April 27, 2 | 2004-04-27 |
Ventilated platen/polishing pad assembly for chemcial mechanical polishing and method of using Grant 6,722,949 - Hu , et al. April 20, 2 | 2004-04-20 |
Belt tensioning assembly for CMP apparatus App 20040018808 - Lin, Hung ;   et al. | 2004-01-29 |
Convex profile anode for electroplating system App 20030221958 - Lin, Tro-Hsu ;   et al. | 2003-12-04 |
Method and apparatus for removing coating layers from alignment marks on a wafer Grant 6,649,077 - Tsai , et al. November 18, 2 | 2003-11-18 |
Method and apparatus for removing coating layers from alignment marks on a wafer App 20030116535 - Tsai, Pang-Yen ;   et al. | 2003-06-26 |
Method for a copper CMP endpoint detection system Grant 6,517,413 - Hu , et al. February 11, 2 | 2003-02-11 |
Linear chemical mechanical polishing apparatus equipped with programmable pneumatic support platen and method of using App 20020142704 - Hu, Tien-Chen ;   et al. | 2002-10-03 |
Ventilated platen/polishing pad assembly for chemical mechanical polishing and method of using App 20020137435 - Hu, Tien-Chen ;   et al. | 2002-09-26 |
Wafer mounting plate for a polishing apparatus and method of using Grant 6,315,649 - Hu , et al. November 13, 2 | 2001-11-13 |
Apparatus and method for chemical mechanical polishing metal on a semiconductor wafer Grant 6,227,947 - Hu , et al. May 8, 2 | 2001-05-08 |