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Microelectronic device with a redistribution layer having a step shaped portion and method of making the same App 20040004284 - Lee, Chu-Sheng ;   et al. | 2004-01-08 |
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Photoresist mask-free oxide define region (ODR) App 20030214013 - Lee, Chu-Sheng ;   et al. | 2003-11-20 |
Novel self aligned channel implant, elevated S/D process by gate electrode damascene App 20030170957 - Hu, Chu-Wei ;   et al. | 2003-09-11 |
Novel self aligned channel implant, elevated S/D process by gate electrode damascene App 20020182815 - Hu, Chu-Wei ;   et al. | 2002-12-05 |
Novel self aligned channel implant, elevated S/D process by gate electrode damascene App 20020182814 - Hu, Chu-Wei ;   et al. | 2002-12-05 |
Method of forming an aluminum protection guard structure for a copper metal structure Grant 6,444,544 - Hu , et al. September 3, 2 | 2002-09-03 |
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