HSUEH; Wen-Chang

Patent Applications and Registrations

Patent applications and USPTO patent grants for HSUEH; Wen-Chang.The latest application filed is for "mask for extreme ultraviolet photolithography".

Company Profile

4.6.9

HSUEH; Wen-Chang - Hsinchu TW
Hsueh; Wen-Chang - Taoyuan County TW
HSUEH; Wen-Chang - Taoyuan City TW
HSUEH; Wen-Chang - Longtan Township TW
Hsueh; Wen-Chang - Taoyuan TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Mask For Extreme Ultraviolet Photolithography App 20220221785 - HSUEH; Wen-Chang ; et al.	2022-07-14
Mask for extreme ultraviolet photolithography Grant 11,294,271 - Hsueh , et al. April 5, 2	2022-04-05
Mask For Extreme Ultraviolet Photolithography App 20210341829 - HSUEH; Wen-Chang ; et al.	2021-11-04
Mask patterns and method of manufacture Grant 11,143,954 - Hsueh , et al. October 12, 2	2021-10-12
Method Of Manufacturing Extreme Ultraviolet Mask With Reduced Wafer Neighboring Effect App 20210247687 - HSUEH; Wen-Chang ; et al.	2021-08-12
Mask Blanks And Methods For Depositing Layers On Mask Blank App 20210200078 - LEE; Hsin-Chang ; et al.	2021-07-01
Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the same Grant 10,996,553 - Hsueh , et al. May 4, 2	2021-05-04
Mask Patterns and Method of Manufacture App 20190391480 - Hsueh; Wen-Chang ; et al.	2019-12-26
Extreme Ultraviolet Mask With Reduced Wafer Neighboring Effect And Method Of Manufacturing The Same App 20190146325 - HSUEH; Wen-Chang ; et al.	2019-05-16
Method and system for inspection of a patterned structure Grant 9,530,200 - Hsueh , et al. December 27, 2	2016-12-27
Structure and method of photomask with reduction of electron-beam scatterring Grant 9,429,835 - Hsueh , et al. August 30, 2	2016-08-30
Reticle and method of fabricating the same Grant 9,341,940 - Hsueh , et al. May 17, 2	2016-05-17
Method And System For Inspection Of A Patterned Structure App 20150371377 - HSUEH; Wen-Chang ; et al.	2015-12-24
Reticle And Method Of Fabricating The Same App 20150331309 - HSUEH; Wen-Chang ; et al.	2015-11-19
Structure and Method of Photomask with Reduction of Electron-Beam Scatterring App 20150227037 - Hsueh; Wen-Chang ; et al.	2015-08-13

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