loadpatents
name:-0.10188412666321
name:-0.028499126434326
name:-0.038100004196167
Hsu; Tzu-Hsiang Patent Filings

Hsu; Tzu-Hsiang

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hsu; Tzu-Hsiang.The latest application filed is for "image sensor chip and sensing method thereof".

Company Profile
15.17.24
  • Hsu; Tzu-Hsiang - Hsinchu City TW
  • Hsu; Tzu-Hsiang - Hsinchu County TW
  • Hsu; Tzu-Hsiang - Xinfeng Township TW
  • Hsu; Tzu-Hsiang - Hsinchu TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Image Sensor Chip And Sensing Method Thereof
App 20220247953 - Hsieh; Chih-Cheng ;   et al.
2022-08-04
Methods Of Forming Epitaxial Source/Drain Features In Semiconductor Devices
App 20220223689 - Hsu; Tzu-Hsiang ;   et al.
2022-07-14
Method For Epitaxial Growth And Device
App 20220181469 - Hsu; Tzu-Hsiang ;   et al.
2022-06-09
Methods of forming epitaxial source/drain features in semiconductor devices
Grant 11,289,574 - Hsu , et al. March 29, 2
2022-03-29
Method of epitaxy and semiconductor device
Grant 11,264,237 - Chin , et al. March 1, 2
2022-03-01
Method for epitaxial growth and device
Grant 11,257,928 - Hsu , et al. February 22, 2
2022-02-22
Semiconductor Device and Method
App 20210336048 - Lee; Chien-Wei ;   et al.
2021-10-28
Semiconductor Structure and Method for Semiconductor Device Fabrication with Improved Source Drain Epitaxy
App 20210296498 - Lee; Wei-Yang ;   et al.
2021-09-23
Semiconductor device and method
Grant 11,063,152 - Lee , et al. July 13, 2
2021-07-13
Methods of Forming Epitaxial Source/Drain Feautures in Semiconductor Devices
App 20210202699 - Hsu; Tzu-Hsiang ;   et al.
2021-07-01
Interfacial Layer Between Fin and Source/Drain Region
App 20210193831 - Chin; Chih-Yun ;   et al.
2021-06-24
Semiconductor structure with improved source drain epitaxy
Grant 11,031,498 - Lee , et al. June 8, 2
2021-06-08
Semiconductor Device With Tunable Epitaxy Structures And Method Of Forming The Same
App 20210098311 - Lin; Shih-Hao ;   et al.
2021-04-01
Finfet Having Non-merging Epitaxially Grown Source/drains
App 20210082925 - Chang; Chun Po ;   et al.
2021-03-18
Interfacial layer between fin and source/drain region
Grant 10,944,005 - Chin , et al. March 9, 2
2021-03-09
Semiconductor Device and Method
App 20210057567 - Lee; Chien-Wei ;   et al.
2021-02-25
FinFET having non-merging epitaxially grown source/drains
Grant 10,854,615 - Chang , et al. December 1, 2
2020-12-01
Semiconductor Structure and Method for Semiconductor Device Fabrication with Improved Source Drain Epitaxy
App 20200251594 - Kind Code
2020-08-06
Method for Epitaxial Growth and Device
App 20200168723 - Hsu; Tzu-Hsiang ;   et al.
2020-05-28
Semiconductor structure and method for semiconductor device fabrication with improved source drain epitaxy
Grant 10,629,736 - Lee , et al.
2020-04-21
Method of Epitaxy and Semiconductor Device
App 20200105526 - Chin; Chih-Yun ;   et al.
2020-04-02
Interfacial Layer Between Fin and Source/Drain Region
App 20200006548 - Chin; Chih-Yun ;   et al.
2020-01-02
Interfacial Layer Between Fin and Source/Drain Region
App 20190378920 - Chin; Chih-Yun ;   et al.
2019-12-12
Interfacial layer between fin and source/drain region
Grant 10,483,396 - Chin , et al. Nov
2019-11-19
Finfet Having Non-merging Epitaxially Grown Source/drains
App 20190304984 - Chang; Chun Po ;   et al.
2019-10-03
Method for Semiconductor Device Fabrication with Improved Source Drain Epitaxy
App 20190123200 - Lee; Wei-Yang ;   et al.
2019-04-25
Semiconductor device including Fin-PET and manufacturing method thereof
Grant 10,269,935 - Huang , et al.
2019-04-23
Semiconductor device and manufacturing method thereof
Grant 10,164,097 - Lee , et al. Dec
2018-12-25
Semiconductor structure and method for semiconductor device fabrication with improved source drain epitaxy
Grant 10,158,017 - Lee , et al. Dec
2018-12-18
Semiconductor device including fin FET and manufacturing method thereof
Grant 10,068,992 - Lo , et al. September 4, 2
2018-09-04
Semiconductor device including Fin-FET and manufacturing method thereof
Grant 9,882,029 - Huang , et al. January 30, 2
2018-01-30
Method for Semiconductor Device Fabrication with Improved Source Drain Epitaxy
App 20170373189 - Lee; Wei-Yang ;   et al.
2017-12-28
Semiconductor Device Including Fin-fet And Manufacturing Method Thereof
App 20170365707 - HUANG; Gin-Chen ;   et al.
2017-12-21
Semiconductor device including Fin- FET and manufacturing method thereof
Grant 9,780,214 - Huang , et al. October 3, 2
2017-10-03
Method for semiconductor device fabrication with improved source drain epitaxy
Grant 9,748,389 - Lee , et al. August 29, 2
2017-08-29
Semiconductor Device Including Fin Fet And Manufacturing Method Thereof
App 20170243957 - LO; Hung ;   et al.
2017-08-24
Semiconductor device including Fin FET and manufacturing method thereof
Grant 9,680,017 - Lo , et al. June 13, 2
2017-06-13
Semiconductor Device Including Fin Fet And Manufacturing Method Thereof
App 20170077286 - LO; Hung ;   et al.
2017-03-16
Semiconductor Device And Manufacturing Method Thereof
App 20170077300 - LEE; Yen-Ru ;   et al.
2017-03-16
Semiconductor Device Including Fin-fet And Manufacturing Method Thereof
App 20160322477 - HUANG; Gin-Chen ;   et al.
2016-11-03
Semiconductor Device Including Fin- Fet And Manufacturing Method Thereof
App 20160181414 - HUANG; Gin-Chen ;   et al.
2016-06-23

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