HSU; Gishun
Patent Applications and Registrations
Patent applications and USPTO patent grants for HSU; Gishun.The latest application filed is for "cleaning system for removing deposits from pump in an exhaust of a substrate processing system".
- HSU; Gishun - Fremont CA
- Hsu; Gishun - Santa Clara CA
| Patent | Date |
|---|---|
| Cleaning System For Removing Deposits From Pump In An Exhaust Of A Substrate Processing System App 20210257194 - BIRRU; Krishna ; et al. | 2021-08-19 |
| Method for purifying acetylene gas for use in semiconductor processes Grant 8,309,473 - Hsu , et al. November 13, 2 | 2012-11-13 |
| Method for improved thickness repeatability of PECVD deposited carbon films Grant 7,955,990 - Henri , et al. June 7, 2 | 2011-06-07 |
| Method For Purifying Acetylene Gas For Use In Semiconductor Processes App 20100297853 - Hsu; Gishun ; et al. | 2010-11-25 |
| Method for purifying acetylene gas for use in semiconductor processes Grant 7,820,556 - Hsu , et al. October 26, 2 | 2010-10-26 |
| Method For Improved Thickness Repeatability Of Pecvd Deposited Carbon Films App 20100151691 - Henri; Jon ; et al. | 2010-06-17 |
| Method For Purifying Acetylene Gas For Use In Semiconductor Processes App 20090305516 - Hsu; Gishun ; et al. | 2009-12-10 |
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