loadpatents
name:-0.026899099349976
name:-0.035508155822754
name:-0.054898023605347
HSIEH; Chieh Patent Filings

HSIEH; Chieh

Patent Applications and Registrations

Patent applications and USPTO patent grants for HSIEH; Chieh.The latest application filed is for "system and method for detecting debris in a photolithography system".

Company Profile
29.20.26
  • HSIEH; Chieh - Hsinchu TW
  • Hsieh; Chieh - Taoyuan TW
  • HSIEH; Chieh - Taoyuan City TW
  • Hsieh; Chieh - Taipei TW
  • HSIEH; Chieh - Taipei City TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
System And Method For Detecting Debris In A Photolithography System
App 20220299883 - TU; Shih-Yu ;   et al.
2022-09-22
Lithography apparatus and method for using the same
Grant 11,437,161 - Chang , et al. September 6, 2
2022-09-06
Light Source, Euv Lithography System, And Method For Performing Circuit Layout Patterning Process
App 20220276574 - YANG; Chi ;   et al.
2022-09-01
Apparatus And Method For Generating Extreme Ultraviolet Radiation
App 20220260922 - HSIEH; Chieh ;   et al.
2022-08-18
System and method for performing extreme ultraviolet photolithography processes
Grant 11,392,040 - Chen , et al. July 19, 2
2022-07-19
Light source, EUV lithography system, and method for generating EUV radiation
Grant 11,333,983 - Yang , et al. May 17, 2
2022-05-17
Apparatus and method for generating extreme ultraviolet radiation
Grant 11,269,257 - Hsieh , et al. March 8, 2
2022-03-08
System and method for extreme ultraviolet source control
Grant 11,224,115 - Hsu , et al. January 11, 2
2022-01-11
System And Method For Performing Extreme Ultraviolet Photolithography Processes
App 20210349396 - CHEN; Tai-Yu ;   et al.
2021-11-11
Apparatus and method for generating extreme ultraviolet radiation
Grant 11,153,959 - Hsu , et al. October 19, 2
2021-10-19
Light Source For Lithography Exposure Process
App 20210243875 - HSIEH; Chieh ;   et al.
2021-08-05
Extreme Ultraviolet Control System
App 20210223701 - CHUNG; Jen-Yang ;   et al.
2021-07-22
Euv Lithography System And Method For Decreasing Debris In Euv Lithography System
App 20210223708 - YANG; Chi ;   et al.
2021-07-22
Light source for lithography exposure process
Grant 10,993,308 - Hsieh , et al. April 27, 2
2021-04-27
Extreme ultraviolet control system for adjusting droplet illumination parameters
Grant 10,969,690 - Chung , et al. April 6, 2
2021-04-06
Radiation source apparatus and method for decreasing debris in radiation source apparatus
Grant 10,955,762 - Yang , et al. March 23, 2
2021-03-23
System and Method for Extreme Ultraviolet Source Control
App 20210068241 - Hsu; Chun-Chia ;   et al.
2021-03-04
Light Source, Euv Lithography System, And Method For Generating Euv Radiation
App 20210055664 - YANG; Chi ;   et al.
2021-02-25
Apparatus And Method For Generating Extreme Ultraviolet Radiation
App 20210041787 - HSIEH; Chieh ;   et al.
2021-02-11
Semiconductor apparatus and method of operating the same
Grant 10,859,918 - Chen , et al. December 8, 2
2020-12-08
System and method for extreme ultraviolet source control
Grant 10,842,009 - Hsu , et al. November 17, 2
2020-11-17
Radiation Source Apparatus And Method For Decreasing Debris In Radiation Source Apparatus
App 20200348607 - YANG; Chi ;   et al.
2020-11-05
Light source, EUV lithography system, and method for generating EUV radiation
Grant 10,824,083 - Yang , et al. November 3, 2
2020-11-03
Radiation source for lithography exposure process
Grant 10,802,405 - Hsieh , et al. October 13, 2
2020-10-13
Apparatus and method for generating extreme ultraviolet radiation
Grant 10,802,406 - Hsieh , et al. October 13, 2
2020-10-13
Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system
Grant 10,712,676 - Yang , et al.
2020-07-14
Semiconductor Apparatus And Method Of Operating The Same
App 20200133136 - CHEN; Kuan-Hung ;   et al.
2020-04-30
Radiation Source Apparatus, Euv Lithography System, And Method For Decreasing Debris In Euv Lithography System
App 20200073261 - YANG; Chi ;   et al.
2020-03-05
Light Source For Lithography Exposure Process
App 20200068696 - HSIEH; Chieh ;   et al.
2020-02-27
Apparatus And Method For Generating Extreme Ultraviolet Radiation
App 20200057382 - HSIEH; Chieh ;   et al.
2020-02-20
Apparatus And Method For Generating Extreme Ultraviolet Radiation
App 20200060015 - HSU; Chun-Chia ;   et al.
2020-02-20
Radiation Source For Lithography Exposure Process
App 20200033732 - HSIEH; Chieh ;   et al.
2020-01-30
Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system
Grant 10,495,987 - Yang , et al. De
2019-12-03
Light source for lithography exposure process
Grant 10,477,663 - Hsieh , et al. Nov
2019-11-12
System and Method for Extreme Ultraviolet Source Control
App 20190289706 - Hsu; Chun-Chia ;   et al.
2019-09-19
System and method for extreme ultraviolet source control
Grant 10,314,154 - Hsu , et al.
2019-06-04
System and Method for Extreme Ultraviolet Source Control
App 20190166680 - Hsu; Chun-Chia ;   et al.
2019-05-30
Light Source For Lithography Exposure Process
App 20190150265 - HSIEH; Chieh ;   et al.
2019-05-16
Lithography apparatus and method for protecting a reticle
Grant 10,274,844 - Chung , et al.
2019-04-30
Extreme Ultraviolet Control System
App 20190101831 - CHUNG; Jen-Yang ;   et al.
2019-04-04
Light Source, Euv Lithography System, And Method For Generating Euv Radiation
App 20190094717 - YANG; Chi ;   et al.
2019-03-28
Radiation Source Apparatus, Euv Lithography System, And Method For Decreasing Debris In Euv Lithography System
App 20190094718 - YANG; Chi ;   et al.
2019-03-28
Semiconductor Device And Fabrication Method Thereof
App 20130256650 - Yang; Chih-Chung ;   et al.
2013-10-03
Method for forming light emitting device
Grant 8,153,457 - Yang , et al. April 10, 2
2012-04-10
Method For Forming Light Emitting Device
App 20120070922 - YANG; Chih-Chung ;   et al.
2012-03-22

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