Patent | Date |
---|
System And Method For Detecting Debris In A Photolithography System App 20220299883 - TU; Shih-Yu ;   et al. | 2022-09-22 |
Lithography apparatus and method for using the same Grant 11,437,161 - Chang , et al. September 6, 2 | 2022-09-06 |
Light Source, Euv Lithography System, And Method For Performing Circuit Layout Patterning Process App 20220276574 - YANG; Chi ;   et al. | 2022-09-01 |
Apparatus And Method For Generating Extreme Ultraviolet Radiation App 20220260922 - HSIEH; Chieh ;   et al. | 2022-08-18 |
System and method for performing extreme ultraviolet photolithography processes Grant 11,392,040 - Chen , et al. July 19, 2 | 2022-07-19 |
Light source, EUV lithography system, and method for generating EUV radiation Grant 11,333,983 - Yang , et al. May 17, 2 | 2022-05-17 |
Apparatus and method for generating extreme ultraviolet radiation Grant 11,269,257 - Hsieh , et al. March 8, 2 | 2022-03-08 |
System and method for extreme ultraviolet source control Grant 11,224,115 - Hsu , et al. January 11, 2 | 2022-01-11 |
System And Method For Performing Extreme Ultraviolet Photolithography Processes App 20210349396 - CHEN; Tai-Yu ;   et al. | 2021-11-11 |
Apparatus and method for generating extreme ultraviolet radiation Grant 11,153,959 - Hsu , et al. October 19, 2 | 2021-10-19 |
Light Source For Lithography Exposure Process App 20210243875 - HSIEH; Chieh ;   et al. | 2021-08-05 |
Extreme Ultraviolet Control System App 20210223701 - CHUNG; Jen-Yang ;   et al. | 2021-07-22 |
Euv Lithography System And Method For Decreasing Debris In Euv Lithography System App 20210223708 - YANG; Chi ;   et al. | 2021-07-22 |
Light source for lithography exposure process Grant 10,993,308 - Hsieh , et al. April 27, 2 | 2021-04-27 |
Extreme ultraviolet control system for adjusting droplet illumination parameters Grant 10,969,690 - Chung , et al. April 6, 2 | 2021-04-06 |
Radiation source apparatus and method for decreasing debris in radiation source apparatus Grant 10,955,762 - Yang , et al. March 23, 2 | 2021-03-23 |
System and Method for Extreme Ultraviolet Source Control App 20210068241 - Hsu; Chun-Chia ;   et al. | 2021-03-04 |
Light Source, Euv Lithography System, And Method For Generating Euv Radiation App 20210055664 - YANG; Chi ;   et al. | 2021-02-25 |
Apparatus And Method For Generating Extreme Ultraviolet Radiation App 20210041787 - HSIEH; Chieh ;   et al. | 2021-02-11 |
Semiconductor apparatus and method of operating the same Grant 10,859,918 - Chen , et al. December 8, 2 | 2020-12-08 |
System and method for extreme ultraviolet source control Grant 10,842,009 - Hsu , et al. November 17, 2 | 2020-11-17 |
Radiation Source Apparatus And Method For Decreasing Debris In Radiation Source Apparatus App 20200348607 - YANG; Chi ;   et al. | 2020-11-05 |
Light source, EUV lithography system, and method for generating EUV radiation Grant 10,824,083 - Yang , et al. November 3, 2 | 2020-11-03 |
Radiation source for lithography exposure process Grant 10,802,405 - Hsieh , et al. October 13, 2 | 2020-10-13 |
Apparatus and method for generating extreme ultraviolet radiation Grant 10,802,406 - Hsieh , et al. October 13, 2 | 2020-10-13 |
Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system Grant 10,712,676 - Yang , et al. | 2020-07-14 |
Semiconductor Apparatus And Method Of Operating The Same App 20200133136 - CHEN; Kuan-Hung ;   et al. | 2020-04-30 |
Radiation Source Apparatus, Euv Lithography System, And Method For Decreasing Debris In Euv Lithography System App 20200073261 - YANG; Chi ;   et al. | 2020-03-05 |
Light Source For Lithography Exposure Process App 20200068696 - HSIEH; Chieh ;   et al. | 2020-02-27 |
Apparatus And Method For Generating Extreme Ultraviolet Radiation App 20200057382 - HSIEH; Chieh ;   et al. | 2020-02-20 |
Apparatus And Method For Generating Extreme Ultraviolet Radiation App 20200060015 - HSU; Chun-Chia ;   et al. | 2020-02-20 |
Radiation Source For Lithography Exposure Process App 20200033732 - HSIEH; Chieh ;   et al. | 2020-01-30 |
Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system Grant 10,495,987 - Yang , et al. De | 2019-12-03 |
Light source for lithography exposure process Grant 10,477,663 - Hsieh , et al. Nov | 2019-11-12 |
System and Method for Extreme Ultraviolet Source Control App 20190289706 - Hsu; Chun-Chia ;   et al. | 2019-09-19 |
System and method for extreme ultraviolet source control Grant 10,314,154 - Hsu , et al. | 2019-06-04 |
System and Method for Extreme Ultraviolet Source Control App 20190166680 - Hsu; Chun-Chia ;   et al. | 2019-05-30 |
Light Source For Lithography Exposure Process App 20190150265 - HSIEH; Chieh ;   et al. | 2019-05-16 |
Lithography apparatus and method for protecting a reticle Grant 10,274,844 - Chung , et al. | 2019-04-30 |
Extreme Ultraviolet Control System App 20190101831 - CHUNG; Jen-Yang ;   et al. | 2019-04-04 |
Light Source, Euv Lithography System, And Method For Generating Euv Radiation App 20190094717 - YANG; Chi ;   et al. | 2019-03-28 |
Radiation Source Apparatus, Euv Lithography System, And Method For Decreasing Debris In Euv Lithography System App 20190094718 - YANG; Chi ;   et al. | 2019-03-28 |
Semiconductor Device And Fabrication Method Thereof App 20130256650 - Yang; Chih-Chung ;   et al. | 2013-10-03 |
Method for forming light emitting device Grant 8,153,457 - Yang , et al. April 10, 2 | 2012-04-10 |
Method For Forming Light Emitting Device App 20120070922 - YANG; Chih-Chung ;   et al. | 2012-03-22 |