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name:-0.00079798698425293
name:-0.00086212158203125
name:-0.0015091896057129
Hsiao; Chien-Wen Patent Filings

Hsiao; Chien-Wen

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hsiao; Chien-Wen.The latest application filed is for "apparatus and method of removing photoresist layer".

Company Profile
3.4.4
  • Hsiao; Chien-Wen - Hsinchu TW
  • HSIAO; Chien-Wen - Hsinchu City TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Apparatus and method of removing photoresist layer
Grant 11,090,696 - Chang , et al. August 17, 2
2021-08-17
Apparatus And Method Of Removing Photoresist Layer
App 20200094298 - CHANG; Jui-Chuan ;   et al.
2020-03-26
Single wafer cleaning tool with H.sub.2SO.sub.4 recycling
Grant 10,510,527 - Hsiao , et al. Dec
2019-12-17
Semiconductor apparatus and method of removing photoresist layer on substrate
Grant 10,486,204 - Chang , et al. Nov
2019-11-26
Mechanisms for wafer cleaning
Grant 9,349,617 - Yu , et al. May 24, 2
2016-05-24
Semiconductor Apparatus And Method Of Removing Photoresist Layer On Substrate
App 20160129484 - CHANG; Jui-Chuan ;   et al.
2016-05-12
Mechanisms For Wafer Cleaning
App 20150144159 - YU; Shang-Yuan ;   et al.
2015-05-28
Single Wafer Cleaning Tool with H2SO4 Recycling
App 20140216500 - Hsiao; Chien-Wen ;   et al.
2014-08-07

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