Howlader; Rana
Patent Applications and Registrations
Patent applications and USPTO patent grants for Howlader; Rana.The latest application filed is for "method of reducing defects in a multi-layer pecvd teos oxide film".
- Howlader; Rana - San Jose CA
- Howlader; Rana - Sivasagar IN
- Howlader; Rana - Santa Clara CA
| Patent | Date |
|---|---|
| Methods for selective deposition of dielectric on silicon oxide Grant 11,371,136 - Bhuyan , et al. June 28, 2 | 2022-06-28 |
| Method Of Reducing Defects In A Multi-layer Pecvd Teos Oxide Film App 20220119952 - Howlader; Rana ; et al. | 2022-04-21 |
| Power Supply Signal Conditioning For An Electrostatic Chuck App 20220102179 - Ye; Zheng John ; et al. | 2022-03-31 |
| Methods For Selective Deposition Of Dielectric On Silicon Oxide App 20200216949 - Bhuyan; Bhaskar Jyoti ; et al. | 2020-07-09 |
| Methods For Depositing Phosphorus-doped Silicon Nitride Films App 20200190664 - HU; Kesong ; et al. | 2020-06-18 |
| Selective Silicon Dioxide Deposition Using Phosphonic Acid Self Assembled Monolayers As Nucleation Inhibitor App 20170092533 - Chakraborty; Tapash ; et al. | 2017-03-30 |
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