loadpatents
Patent applications and USPTO patent grants for Hou; Cheng-Hao.The latest application filed is for "triple layer high-k gate dielectric stack for workfunction engineering".
Patent | Date |
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Triple Layer High-K Gate Dielectric Stack for Workfunction Engineering App 20210399104 - Chang; Chia-Yuan ;   et al. | 2021-12-23 |
Methods of forming semiconductor devices and FinFET devices having shielding layers Grant 11,107,897 - Chang , et al. August 31, 2 | 2021-08-31 |
Semiconductor Device and Method of Manufacture App 20210126105 - Hsu; Chia-Wei ;   et al. | 2021-04-29 |
Gate Structures In Semiconductor Devices App 20210098303 - Lai; Pei Ying ;   et al. | 2021-04-01 |
Passivator for gate dielectric Grant 10,964,543 - Lin , et al. March 30, 2 | 2021-03-30 |
Methods Of Forming Semiconductor Devices And Finfet Devices App 20210028285 - Chang; Che-Hao ;   et al. | 2021-01-28 |
Passivator for Gate Dielectric App 20200066535 - Lin; Tsung-Da ;   et al. | 2020-02-27 |
Passivator for gate dielectric Grant 10,468,258 - Lin , et al. No | 2019-11-05 |
Buffer layer on semiconductor devices Grant 10,374,055 - Hou , et al. | 2019-08-06 |
Semiconductor devices and FinFET devices having shielding layers Grant 10,367,078 - Chang , et al. July 30, 2 | 2019-07-30 |
Semiconductor Devices, Finfet Devices And Methods Of Forming The Same App 20190140082 - Chang; Chia-Yuan ;   et al. | 2019-05-09 |
FinFET doping methods and structures thereof Grant 10,276,399 - Hou , et al. | 2019-04-30 |
Finfet Doping Methods And Structures Thereof App 20180247829 - HOU; Cheng-Hao ;   et al. | 2018-08-30 |
Method of forming a semiconductor device comprising titanium silicon oxynitride Grant 10,032,625 - Hou , et al. July 24, 2 | 2018-07-24 |
FinFET doping methods and structures thereof Grant 9,960,053 - Hou , et al. May 1, 2 | 2018-05-01 |
Method of fabricating a gate dielectric for high-k metal gate devices Grant 9,711,373 - Chang , et al. July 18, 2 | 2017-07-18 |
Finfet Doping Methods And Structures Thereof App 20170170027 - Hou; Cheng-Hao ;   et al. | 2017-06-15 |
Method of forming metal gate electrode Grant 9,449,828 - Hou , et al. September 20, 2 | 2016-09-20 |
Method Of Forming Metal Gate Electrode App 20160064223 - HOU; Cheng-Hao ;   et al. | 2016-03-03 |
Method Of Forming A Semiconductor Device Comprising Titanium Silicon Oxynitride App 20160027639 - HOU; Cheng-Hao ;   et al. | 2016-01-28 |
Metal gate electrode of a field effect transistor Grant 9,196,691 - Hou , et al. November 24, 2 | 2015-11-24 |
Method of forming a semiconductor device comprising titanium silicon oxynitride Grant 9,165,826 - Hou , et al. October 20, 2 | 2015-10-20 |
Method Of Forming A Semiconductor Device App 20140363962 - HOU; Cheng-Hao ;   et al. | 2014-12-11 |
Buffer Layer On Semiconductor Devices App 20140291777 - HOU; Cheng-Hao ;   et al. | 2014-10-02 |
Method of forming a buffer layer Grant 8,765,603 - Hou , et al. July 1, 2 | 2014-07-01 |
Metal Gate Electrode Of A Field Effect Transistor App 20140004694 - HOU; Cheng-Hao ;   et al. | 2014-01-02 |
Method for fabricating a gate dielectric layer Grant 8,580,698 - Lee , et al. November 12, 2 | 2013-11-12 |
Metal gate electrode of a field effect transistor Grant 8,546,885 - Hou , et al. October 1, 2 | 2013-10-01 |
Buffer Layer And Method Of Forming Buffer Layer App 20130032900 - HOU; Cheng-Hao ;   et al. | 2013-02-07 |
Metal Gate Electrode Of A Field Effect Transistor App 20130026637 - HOU; Cheng-Hao ;   et al. | 2013-01-31 |
Method For Fabricating A Gate Dielectric Layer App 20110256731 - LEE; Wei-Yang ;   et al. | 2011-10-20 |
Method for making a metal oxide layer App 20100093184 - Wu; Tai-Bor ;   et al. | 2010-04-15 |
Method of Fabricating a Gate Dielectric for High-K Metal Gate Devices App 20100075507 - Chang; Che-Hao ;   et al. | 2010-03-25 |
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