Hosoya; Morio

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hosoya; Morio.The latest application filed is for "photomask blank, photomask, and method for manufacturing photomask blank".

Company Profile

0.19.18

Hosoya; Morio - Shinjuku-ku JP
Hosoya; Morio - Tokyo JP
Hosoya; Morio - Musashino JP
Hosoya, Morio - Musashino-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Reflective mask blank and method of manufacturing a reflective mask Grant 9,229,315 - Hosoya January 5, 2	2016-01-05
Photomask blank, photomask, and method for manufacturing photomask blank Grant 9,075,314 - Iwashita , et al. July 7, 2	2015-07-07
Reflective mask blank and method of manufacturing a reflective mask Grant 8,709,685 - Hosoya April 29, 2	2014-04-29
Photomask Blank, Photomask, And Method For Manufacturing Photomask Blank App 20140057199 - IWASHITA; Hiroyuki ; et al.	2014-02-27
Reflective Mask Blank And Method Of Manufacturing A Reflective Mask App 20140011122 - Hosoya; Morio	2014-01-09
Reflective mask blank and method of manufacturing a reflective mask Grant 8,546,047 - Hosoya October 1, 2	2013-10-01
Photomask blank, photomask, and method for manufacturing photomask blank Grant 8,512,916 - Iwashita , et al. August 20, 2	2013-08-20
Reflective Mask Blank And Method Of Manufacturing A Reflective Mask App 20130071779 - HOSOYA; Morio	2013-03-21
Reflective mask blank and method of manufacturing a reflective mask Grant 8,389,184 - Hosoya March 5, 2	2013-03-05
Reflective mask blank, method of manufacturing a reflective mask blank and method of manufacturing a reflective mask Grant 8,329,361 - Hosoya December 11, 2	2012-12-11
Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask Grant 8,081,384 - Hosoya , et al. December 20, 2	2011-12-20
Photomask Blank, Photomask, And Method Of Manufacturing Photomask Blank App 20110305978 - Iwashita; Hiroyuki ; et al.	2011-12-15
Reflective Mask Blank And Method Of Manufacturing A Reflective Mask App 20110281207 - Hosoya; Morio	2011-11-17
Reflective mask blank and method of producing the same, and method of producing a reflective mask Grant 8,021,807 - Hosoya September 20, 2	2011-09-20
Reflective Mask Blank And Method Of Manufacturing A Reflective Mask App 20110217633 - Hosoya; Morio	2011-09-08
Reflective mask blank, reflective mask and methods of producing the mask blank and the mask Grant 7,981,573 - Ishibashi , et al. July 19, 2	2011-07-19
Reflective Mask Blank And Method Of Manufacturing A Reflective Mask App 20100266938 - HOSOYA; Morio	2010-10-21
Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask Grant 7,804,648 - Hosoya , et al. September 28, 2	2010-09-28
Reflective Mask Blank And Method Of Producing The Same, And Method Of Producing A Reflective Mask App 20100136464 - HOSOYA; Morio	2010-06-03
Reflective mask blank, reflective mask, and method of manufacturing semiconductor device Grant 7,700,245 - Hosoya , et al. April 20, 2	2010-04-20
Method Of Producing A Reflective Mask App 20100084375 - HOSOYA; Morio	2010-04-08
Reflection type mask blank and reflection type mask and production methods for them Grant 7,390,596 - Ishibashi , et al. June 24, 2	2008-06-24
Reflective mask blank, reflective mask, and method of manufacturing semiconductor device App 20070275308 - Hosoya; Morio ; et al.	2007-11-29
Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask App 20070091420 - Hosoya; Morio ; et al.	2007-04-26
Reflective mask blank, reflective mask, and method for manufacturing semiconductor device App 20060270226 - Hosoya; Morio	2006-11-30
Sputtering target, method of manufacturing a multilayer reflective film coated substrate, method of manufacturing a reflective mask blank, and method of manufacturing a reflective mask App 20060237303 - Hosoya; Morio ; et al.	2006-10-26
Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask Grant 7,056,627 - Shoki , et al. June 6, 2	2006-06-06
Substrate with a multilayer reflection film, reflection type mask blank for exposure, reflection type mask for exposure and methods of manufacturing them App 20050238922 - Kinoshita, Takeru ; et al.	2005-10-27
Reflection type mask blank and reflection type mask and production methods for them App 20050208389 - Ishibashi, Shinichi ; et al.	2005-09-22
Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask App 20050100797 - Shoki, Tsutomu ; et al.	2005-05-12
Reflection type mask blank for EUV exposure and reflection type mask for EUV exposure as well as method of producing the mask Grant 6,749,973 - Shoki , et al. June 15, 2	2004-06-15
Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device Grant 6,737,201 - Shoki , et al. May 18, 2	2004-05-18
Reflection type mask blank for EUV exposure and reflection type mask for EUV exposure as well as method of producing the mask App 20020110743 - Shoki, Tsutomu ; et al.	2002-08-15
Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device App 20020076625 - Shoki, Tsutomu ; et al.	2002-06-20

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