HOSOKAWA; Masaru
Patent Applications and Registrations
Patent applications and USPTO patent grants for HOSOKAWA; Masaru.The latest application filed is for "method for producing a material for chemical vapor deposition".
- HOSOKAWA; Masaru - Ibaraki JP
- Hosokawa; Masaru - Tokyo JP
| Patent | Date |
|---|---|
| Method For Producing A Material For Chemical Vapor Deposition App 20100126351 - HOSOKAWA; Masaru ; et al. | 2010-05-27 |
| Material for chemical vapor deposition and thin film forming method App 20070190249 - Hosokawa; Masaru ; et al. | 2007-08-16 |
| Percutaneous administration preparations Grant 6,827,944 - Hosokawa , et al. December 7, 2 | 2004-12-07 |
| Percutaneous administration preparations App 20030035826 - Hosokawa, Masaru ; et al. | 2003-02-20 |
| Titanium dioxide reduced in volatile water content, process for producing the same, and masterbatch containing the same Grant 6,126,915 - Tunashima , et al. October 3, 2 | 2000-10-03 |
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