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name:-0.0032339096069336
name:-0.0031931400299072
Hosaka; Hayato Patent Filings

Hosaka; Hayato

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hosaka; Hayato.The latest application filed is for "dressing apparatus and dressing method for substrate rear surface polishing member".

Company Profile
3.2.5
  • Hosaka; Hayato - Koshi City JP
  • Hosaka; Hayato - Koshi JP
  • Hosaka; Hayato - Kumamoto JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Dressing Apparatus And Dressing Method For Substrate Rear Surface Polishing Member
App 20210308828 - Okamoto; Yoshiki ;   et al.
2021-10-07
Dressing apparatus and dressing method for substrate rear surface polishing member
Grant 11,059,145 - Okamoto , et al. July 13, 2
2021-07-13
Substrate Warpage Correction Method, Computer Storage Medium, And Substrate Warpage Correction Apparatus
App 20210039221 - KANETAKE; Nozomu ;   et al.
2021-02-11
Substrate Processing Apparatus And Substrate Processing Method
App 20200365417 - Kubo; Akihiro ;   et al.
2020-11-19
Substrate processing apparatus, substrate processing method and storage medium
Grant 10,840,079 - Takiguchi , et al. November 17, 2
2020-11-17
Dressing Apparatus And Dressing Method For Substrate Rear Surface Polishing Member
App 20190047118 - Okamoto; Yoshiki ;   et al.
2019-02-14
Substrate Processing Apparatus, Substrate Processing Method and Storage Medium
App 20180151343 - TAKIGUCHI; Yasushi ;   et al.
2018-05-31

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