Horita; Katsuyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Horita; Katsuyuki.The latest application filed is for "semiconductor device and method of manufacturing the same".

Company Profile

0.40.46

Horita; Katsuyuki - Kanagawa JP
Horita; Katsuyuki - Kawasaki JP
HORITA; Katsuyuki - Tokyo JP
HORITA; Katsuyuki - Kawasaki-shi JP
Horita; Katsuyuki - Chiyoda-ku JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor device and method of manufacturing the same Grant 9,484,271 - Horita , et al. November 1, 2	2016-11-01
Semiconductor Device And Method Of Manufacturing The Same App 20160181147 - YUGAMI; Jiro ; et al.	2016-06-23
Semiconductor device including an isolation film buried in a groove Grant 9,343,527 - Yugami , et al. May 17, 2	2016-05-17
Semiconductor integrated circuit device and method for manufacturing semiconductor integrated circuit device Grant 9,287,259 - Shinohara , et al. March 15, 2	2016-03-15
SOI SRAM having well regions with opposite conductivity Grant 9,142,567 - Horita , et al. September 22, 2	2015-09-22
Semiconductor Device With Shallow Trench Isolation App 20150221722 - SAWADA; Mahito ; et al.	2015-08-06
Semiconductor Device And Method Of Manufacturing The Same App 20150221560 - HORITA; Katsuyuki ; et al.	2015-08-06
Soi Sram Having Well Regions With Opposite Conductivity App 20150221668 - HORITA; Katsuyuki ; et al.	2015-08-06
Semiconductor device and method of manufacturing the same Grant 9,029,237 - Sawada , et al. May 12, 2	2015-05-12
Semiconductor device having well regions with opposite conductivity Grant 9,029,951 - Horita , et al. May 12, 2	2015-05-12
Semiconductor device and method of manufacturing the same Grant 9,024,386 - Horita , et al. May 5, 2	2015-05-05
Semiconductor device Grant 8,975,699 - Iwamatsu , et al. March 10, 2	2015-03-10
Semiconductor Device App 20150008522 - IWAMATSU; Toshiaki ; et al.	2015-01-08
Semiconductor device Grant 8,872,267 - Iwamatsu , et al. October 28, 2	2014-10-28
Semiconductor Integrated Circuit Device And Method For Manufacturing Semiconductor Integrated Circuit Device App 20140035055 - Shinohara; Hirofumi ; et al.	2014-02-06
Semiconductor device and manufacturing method thereof Grant 8,592,284 - Ishibashi , et al. November 26, 2	2013-11-26
Semiconductor device with trench isolation having a diffusion preventing film and manufacturing method thereof Grant 8,587,085 - Horita November 19, 2	2013-11-19
Method of manufacturing semiconductor device Grant 8,536,017 - Kadoshima , et al. September 17, 2	2013-09-17
Semiconductor Device And Method Of Manufacturing The Same App 20130149837 - SAWADA; Mahito ; et al.	2013-06-13
Semiconductor Device And Method Of Manufacturing The Same App 20130140669 - YUGAMI; Jiro ; et al.	2013-06-06
Semiconductor Device And Method Of Manufacturing The Same App 20130119470 - HORITA; Katsuyuki ; et al.	2013-05-16
Semiconductor Device App 20130119469 - IWAMATSU; Toshiaki ; et al.	2013-05-16
Semiconductor device with shallow trench isolation Grant 8,384,187 - Sawada , et al. February 26, 2	2013-02-26
Semiconductor Device App 20130020644 - HORITA; Katsuyuki ; et al.	2013-01-24
Method Of Manufacturing Semiconductor Device App 20120208346 - KADOSHIMA; Masaru ; et al.	2012-08-16
Semiconductor Device And A Manufacturing Method Thereof App 20120119309 - HORITA; Katsuyuki	2012-05-17
Semiconductor device and its manufacturing method Grant 8,043,918 - Kuroi , et al. October 25, 2	2011-10-25
Semiconductor Device And Its Manufacturing Method App 20100285651 - KUROI; Takashi ; et al.	2010-11-11
Semiconductor Device And Method Of Manufacturing The Same App 20100283108 - Sawada; Mahito ; et al.	2010-11-11
Semiconductor device and its manufacturing method Grant 7,791,163 - Kuroi , et al. September 7, 2	2010-09-07
Method Of Manufacturing Semiconductor Device Capable Of Suppressing Impurity Concentration Reduction In Doped Channel Region Arising From Formation Of Gate Insulating Film App 20100190306 - Tanaka; Yoshinori ; et al.	2010-07-29
Method of manufacturing semiconductor device capable of suppressing impurity concentration reduction in doped channel region arising from formation of gate insulating film Grant 7,691,713 - Tanaka , et al. April 6, 2	2010-04-06
Semiconductor Device And Manufacturing Method Thereof App 20100044802 - Ishibashi; Masato ; et al.	2010-02-25
Method Of Manufacturing Semiconductor Device App 20080113480 - NISHIDA; Yukio ; et al.	2008-05-15
Method Of Manufacturing Semiconductor Device Capable Of Suppressing Impurity Concentration Reduction In Doped Channel Region Arising From Formation Of Gate Insulting Film App 20070243687 - Tanaka; Yoshinori ; et al.	2007-10-18
Semiconductor Device and Its Manufacturing Method App 20070241373 - Kuroi; Takashi ; et al.	2007-10-18
Method of manufacturing semiconductor device capable of suppressing impurity concentration reduction in doped channel region arising from formation of gate insulating film Grant 7,244,655 - Tanaka , et al. July 17, 2	2007-07-17
Semiconductor Device And Manufacturing Method Therefor App 20070138574 - EIKYU; Katsumi ; et al.	2007-06-21
Manufacturing Method Of Semiconductor Device App 20060270121 - Ipposhi; Takashi ; et al.	2006-11-30
Semiconductor Device And Method Of Manufacturing Semiconductor Device App 20060214212 - HORITA; Katsuyuki ; et al.	2006-09-28
Method of manufacturing semiconductor device capable of suppressing impurity concentration reduction in doped channel region arising from formation of gate insulating film App 20060079061 - Tanaka; Yoshinori ; et al.	2006-04-13
Method of manufacturing semiconductor device capable of suppressing impurity concentration reduction in doped channel region arising from formation of gate insulating film Grant 6,998,319 - Tanaka , et al. February 14, 2	2006-02-14
Semiconductor device and manufacturing method thereof App 20060027883 - Kuroi; Takashi ; et al.	2006-02-09
Method of manufacturing semiconductor device including steps of forming both insulating film and epitaxial semiconductor on substrate Grant 6,890,837 - Kuroi , et al. May 10, 2	2005-05-10
Semiconductor device including impurity layer having continuous portions formed at different depths and method of manufacturing the same Grant 6,841,440 - Kuroi , et al. January 11, 2	2005-01-11
Method of manufacturing semiconductor device capable of suppressing impurity concentration reduction in doped channel region arising from formation of gate insulating film App 20040235255 - Tanaka, Yoshinori ; et al.	2004-11-25
Semiconductor device having vertical transistor App 20040159857 - Horita, Katsuyuki ; et al.	2004-08-19
Semiconductor device Grant 6,777,758 - Yamashita , et al. August 17, 2	2004-08-17
Semiconductor device having high impurity concentration region and low impurity concentration region in side surface of active region App 20040124491 - Yamashita, Tomohiro ; et al.	2004-07-01
Semiconductor device with element isolation using impurity-doped insulator and oxynitride film Grant 6,744,113 - Kuroi , et al. June 1, 2	2004-06-01
Method of manufacturing semiconductor device including steps of forming both insulating film and epitaxial semiconductor on substrate Grant 6,737,315 - Kuroi , et al. May 18, 2	2004-05-18
Semiconductor device and manufacturing method thereof App 20040092057 - Kuroi, Takashi ; et al.	2004-05-13
Method of manufacturing semiconductor device including steps of forming both insulating film and epitaxial semiconductor on substrate App 20040082165 - Kuroi, Takashi ; et al.	2004-04-29
Semiconductor device with element isolation using impurity-doped insulator and oxynitride film App 20040053458 - Kuroi, Takashi ; et al.	2004-03-18
Semiconductor device and manufacturing method thereof Grant 6,707,099 - Shiozawa , et al. March 16, 2	2004-03-16
Semiconductor device including inversely tapered gate electrode and manufacturing method thereof Grant 6,661,066 - Kuroi , et al. December 9, 2	2003-12-09
Semiconductor device having dual-gate structure and method of manufacturing the same App 20030151098 - Nishida, Yukio ; et al.	2003-08-14
Semiconductor device including impurity layer having continuous portions formed at different depths and method of manufacturing the same App 20030143810 - Kuroi, Takashi ; et al.	2003-07-31
Semiconductor device and manufacturing method thereof App 20030127685 - Shiozawa, Katsuomi ; et al.	2003-07-10
Semiconductor Device Achieving Reduced Wiring Length And Reduced Wiring Delay By Forming First Layer Wiring And Gate Upper Electrode In Same Wire Layer App 20030075744 - Horita, Katsuyuki ; et al.	2003-04-24
Semiconductor device including impurity layer having continuous portions formed at different depths and method of manufacturing the same Grant 6,541,825 - Kuroi , et al. April 1, 2	2003-04-01
Method of manufacturing semiconductor device including steps of forming both insulating film and epitaxial semiconductor on substrate App 20030054597 - Kuroi, Takashi ; et al.	2003-03-20
Method of manufacturing semiconductor device Grant 6,503,799 - Horita , et al. January 7, 2	2003-01-07
Method Of Manufacturing Semiconductor Device App 20020151143 - Shiozawa, Katsuomi ; et al.	2002-10-17
Method of manufacturing semiconductor device App 20020127841 - Horita, Katsuyuki ; et al.	2002-09-12
Semiconductor device and method of manufacturing the same App 20020038901 - Kuroi, Takashi ; et al.	2002-04-04
Semiconductor device and method of manufacturing same App 20020028568 - Ueno, Shuuichi ; et al.	2002-03-07
Semiconductor device and method of manufacturing same App 20020020867 - Shiozawa, Katsuomi ; et al.	2002-02-21
Semiconductor device App 20020008224 - Yamashita, Tomohiro ; et al.	2002-01-24
Semiconductor Device Including Inversely Tapered Gate Electrode And Manufacturing Method Thereof App 20020008293 - KUROI, TAKASHI ; et al.	2002-01-24
Semiconductor device and method for manufacturing same App 20020005529 - Horita, Katsuyuki ; et al.	2002-01-17
Method of manufacturing a semiconductor device Grant 6,323,102 - Horita , et al. November 27, 2	2001-11-27
Method for manufacturing an isolation trench having plural profile angles Grant 6,274,457 - Sakai , et al. August 14, 2	2001-08-14
Method of forming a trench type element isolation in semiconductor substrate Grant 6,268,263 - Sakai , et al. July 31, 2	2001-07-31
Semiconductor device and method of manufacturing the same Grant 6,218,262 - Kuroi , et al. April 17, 2	2001-04-17
Semiconductor device and manufacturing method thereof Grant 6,127,737 - Kuroi , et al. October 3, 2	2000-10-03
Semiconductor device and method of fabricating thereof Grant 6,017,800 - Sayama , et al. January 25, 2	2000-01-25
Semiconductor device and method of manufacturing the same Grant 5,889,335 - Kuroi , et al. March 30, 1	1999-03-30

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