loadpatents
Patent applications and USPTO patent grants for Horiike; Yasuhiro.The latest application filed is for "chip using method and test chip".
Patent | Date |
---|---|
Chip using method and test chip Grant 7,972,577 - Horiike , et al. July 5, 2 | 2011-07-05 |
Chip Using Method And Test Chip App 20100158757 - Horiike; Yasuhiro ;   et al. | 2010-06-24 |
Chip using method and test chip Grant 7,691,328 - Horiike , et al. April 6, 2 | 2010-04-06 |
Cultured cell construct which contains spheroids of cultured animal cells and the use thereof Grant 7,691,369 - Kataoka , et al. April 6, 2 | 2010-04-06 |
Blood analysis apparatus and blood analysis method Grant 7,678,577 - Horiike , et al. March 16, 2 | 2010-03-16 |
Blood analysis device and blood analysis method Grant 7,582,259 - Ogawa , et al. September 1, 2 | 2009-09-01 |
Cultured cell construct which contains spheroids of cultured animal cells and the use thereof App 20090011504 - Kataoka; Kazunori ;   et al. | 2009-01-08 |
Cultured cell construct containing spheroids of cultured animal cells and utilization thereof Grant 7,470,424 - Kataoka , et al. December 30, 2 | 2008-12-30 |
Blood Analysis Apparatus App 20080138890 - Horiike; Yasuhiro ;   et al. | 2008-06-12 |
Blood Analysis Apparatus and Blood Analysis Method App 20080028821 - Horiike; Yasuhiro ;   et al. | 2008-02-07 |
Blood analyzer and method of separating plasma App 20060084174 - Ogawa; Hiroki ;   et al. | 2006-04-20 |
Blood analysis device and blood analysis method App 20060078873 - Ogawa; Hiroki ;   et al. | 2006-04-13 |
Cultured cell construct containing spheroids of cultured animal cells and utilization thereof App 20040197907 - Kataoka, Kazunori ;   et al. | 2004-10-07 |
Multi-step local dry etching method for SOI wafer App 20040063329 - Yanagisawa, Michihiko ;   et al. | 2004-04-01 |
Blood analyzing method and apparatus App 20030114785 - Kikuchi, Jun ;   et al. | 2003-06-19 |
Local etching apparatus and local etching method App 20020008082 - Tanaka, Chikai ;   et al. | 2002-01-24 |
Local Etching Apparatus And Local Etching Method App 20010032705 - SADOHARA, TAKESHI ;   et al. | 2001-10-25 |
Wafer flattening process and system Grant 6,280,645 - Yanagisawa , et al. August 28, 2 | 2001-08-28 |
Wafer flattening process and system App 20010007275 - Yanagisawa, Michihiko ;   et al. | 2001-07-12 |
Plasma etching method and plasma etching system for carrying out the same Grant 6,159,388 - Yanagisawa , et al. December 12, 2 | 2000-12-12 |
Plasma process method and apparatus Grant 5,851,600 - Horiike , et al. December 22, 1 | 1998-12-22 |
Plasma treatment apparatus Grant 5,487,785 - Horiike , et al. January 30, 1 | 1996-01-30 |
Method for etching an SiO.sub.2 film Grant 5,328,558 - Kawamura July 12, 1 | 1994-07-12 |
Method and apparatus for processing surface of semiconductor layer Grant 5,308,791 - Horiike , et al. May 3, 1 | 1994-05-03 |
Method of forming dielectric film for semiconductor devices Grant 5,290,609 - Horiike , et al. March 1, 1 | 1994-03-01 |
Atomspheric plasma reaction method and apparatus therefor Grant 5,185,132 - Horiike , et al. February 9, 1 | 1993-02-09 |
Phototreating method and apparatus therefor Grant 5,112,645 - Sekine , et al. May 12, 1 | 1992-05-12 |
Method of dry etching and apparatus for use in such method Grant 4,878,995 - Arikado , et al. November 7, 1 | 1989-11-07 |
Dry etching apparatus Grant 4,838,978 - Sekine , et al. June 13, 1 | 1989-06-13 |
Dry etching process Grant 4,786,361 - Sekine , et al. November 22, 1 | 1988-11-22 |
Pattern-forming method Grant 4,698,238 - Hayasaka , et al. October 6, 1 | 1987-10-06 |
Dry-etching method and apparatus therefor Grant 4,668,337 - Sekine , et al. * May 26, 1 | 1987-05-26 |
Phototreating apparatus Grant 4,642,171 - Sekine , et al. February 10, 1 | 1987-02-10 |
Dry etching apparatus and method using reactive gases Grant 4,529,475 - Okano , et al. July 16, 1 | 1985-07-16 |
Dry etching apparatus using reactive ions Grant 4,526,643 - Okano , et al. July 2, 1 | 1985-07-02 |
Dry Etching method and device therefor Grant 4,492,610 - Okano , et al. January 8, 1 | 1985-01-08 |
RIE Apparatus utilizing a shielded magnetron to enhance etching Grant 4,431,473 - Okano , et al. February 14, 1 | 1984-02-14 |
Plasma etching method for aluminum-based films Grant 4,341,593 - Kurisaki , et al. July 27, 1 | 1982-07-27 |
Ion source and ion etching process Grant 4,277,304 - Horiike , et al. July 7, 1 | 1981-07-07 |
Etching apparatus using a plasma Grant 4,252,595 - Yamamoto , et al. * February 24, 1 | 1981-02-24 |
Gas-etching device Grant 4,192,706 - Horiike March 11, 1 | 1980-03-11 |
Apparatus for the plasma treatment of semiconductors Grant 4,175,235 - Niwa , et al. November 20, 1 | 1979-11-20 |
Gas etching method and apparatus Grant 4,160,690 - Shibagaki , et al. July 10, 1 | 1979-07-10 |
Continuous gas plasma etching apparatus Grant 4,151,034 - Yamamoto , et al. April 24, 1 | 1979-04-24 |
Gas-etching device Grant 4,123,663 - Horiike October 31, 1 | 1978-10-31 |
Etching apparatus using a plasma Grant 4,094,722 - Yamamoto , et al. June 13, 1 | 1978-06-13 |
Activated gas reaction apparatus & method Grant 4,065,369 - Ogawa , et al. December 27, 1 | 1977-12-27 |
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