loadpatents
name:-0.026813983917236
name:-0.010594129562378
name:-0.0070350170135498
HORIIKE; Ryota Patent Filings

HORIIKE; Ryota

Patent Applications and Registrations

Patent applications and USPTO patent grants for HORIIKE; Ryota.The latest application filed is for "method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium".

Company Profile
6.6.8
  • HORIIKE; Ryota - Toyama JP
  • HORIIKE; Ryota - Toyama-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method Of Manufacturing Semiconductor Device, Substrate Processing Method, Substrate Processing Apparatus, And Recording Medium
App 20210332477 - SONE; Shin ;   et al.
2021-10-28
Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus, And Recording Medium
App 20210125828 - HORITA; Hideki ;   et al.
2021-04-29
Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium
Grant 10,497,561 - Nakamura , et al. De
2019-12-03
Method For Manufacturing Semiconductor Device, Substrate-processing Apparatus, And Recording Medium
App 20190189422 - NAKAMURA; Yoshinobu ;   et al.
2019-06-20
Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium
Grant 10,229,829 - Nakamura , et al.
2019-03-12
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
Grant 10,199,219 - Shimamoto , et al. Fe
2019-02-05
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
Grant 10,176,988 - Horiike , et al. J
2019-01-08
Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium
Grant 10,163,625 - Nakamura , et al. Dec
2018-12-25
Method of manufacturing semiconductor device, substrate processing apparatus comprising exhaust port and multiple nozzles, and recording medium
Grant 10,096,463 - Hashimoto , et al. October 9, 2
2018-10-09
Method For Manufacturing Semiconductor Device, Substrate-processing Apparatus, And Recording Medium
App 20180233351 - NAKAMURA; Yoshinobu ;   et al.
2018-08-16
Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus, And Recording Medium
App 20180076017 - HASHIMOTO; Yoshitomo ;   et al.
2018-03-15
Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus, And Recording Medium
App 20170372890 - HORIIKE; Ryota ;   et al.
2017-12-28
Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus, And Recording Medium
App 20170365467 - SHIMAMOTO; Satoshi ;   et al.
2017-12-21
Method For Manufacturing Semiconductor Device, Substrate-processing Apparatus, And Recording Medium
App 20170103885 - NAKAMURA; Yoshinobu ;   et al.
2017-04-13

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