Horiguchi; Masato
Patent Applications and Registrations
Patent applications and USPTO patent grants for Horiguchi; Masato.The latest application filed is for "final reduction apparatus".
Company Profile
2.22.22
- Horiguchi; Masato - Tochigi JP
- Horiguchi; Masato - Suwon-si KR
- Horiguchi; Masato - Tochigi-shi JP
- Horiguchi; Masato - Tochigi City JP
- Horiguchi; Masato - Miyagi JP
- HORIGUCHI; MASATO - HWASEONG-SI KR
- Horiguchi; Masato - Tokyo JP
- HORIGUCHI; Masato - Kurokawa-gun Miyagi
- Horiguchi; Masato - Yamanashi JP
- Horiguchi; Masato - Nirasaki JP
- HORIGUCHI; Masato - Nirasaki City JP
- Horiguchi; Masato - Nirasaki-shi JP
Patent Activity
| Patent | Date |
|---|---|
| Differential device Grant 11,402,006 - Hirota , et al. August 2, 2 | 2022-08-02 |
| Plasma processing apparatus and method of manufacturing semiconductor device using the same Grant 11,348,760 - Koshiishi , et al. May 31, 2 | 2022-05-31 |
| Final Reduction Apparatus App 20220163103 - Horiguchi; Masato ; et al. | 2022-05-26 |
| Differential Device App 20210293316 - Hirota; Isao ; et al. | 2021-09-23 |
| Plasma Processing Apparatus And Method Of Manufacturing Semiconductor Device Using The Same App 20210142985 - KOSHIISHI; AKIRA ; et al. | 2021-05-13 |
| Pin control method and substrate processing apparatus Grant 10,910,251 - Matsuura , et al. February 2, 2 | 2021-02-02 |
| Pin control method Grant 10,438,834 - Matsuura , et al. O | 2019-10-08 |
| Plasma Processing Equipment App 20190304754 - SHIM; SEUNG BO ; et al. | 2019-10-03 |
| Pin Control Method And Substrate Processing Apparatus App 20190287844 - MATSUURA; Shin ; et al. | 2019-09-19 |
| Method for etching layer to be etched Grant 10,347,499 - Maruyama , et al. July 9, 2 | 2019-07-09 |
| Streaming system and method Grant 10,320,759 - Futagami , et al. | 2019-06-11 |
| Pin Control Method And Substrate Processing Apparatus App 20180301369 - MATSUURA; Shin ; et al. | 2018-10-18 |
| Method For Etching Layer To Be Etched App 20180144948 - MARUYAMA; Koji ; et al. | 2018-05-24 |
| Plasma processing apparatus and plasma processing method Grant 9,685,305 - Maruyama , et al. June 20, 2 | 2017-06-20 |
| Electrode assembly and plasma processing apparatus Grant 9,520,276 - Takahashi , et al. December 13, 2 | 2016-12-13 |
| Substrate processing apparatus Grant 9,455,125 - Yoshimura , et al. September 27, 2 | 2016-09-27 |
| Plasma Processing Apparatus And Plasma Processing Method App 20160163515 - Maruyama; Koji ; et al. | 2016-06-09 |
| Streaming System And Method App 20150312229 - FUTAGAMI; Motomasa ; et al. | 2015-10-29 |
| Streaming system and method Grant 9,088,548 - Futagami , et al. July 21, 2 | 2015-07-21 |
| Plasma processing apparatus Grant 8,858,754 - Horiguchi , et al. October 14, 2 | 2014-10-14 |
| Streaming System And Method App 20140040613 - Futagami; Motomasa ; et al. | 2014-02-06 |
| Streaming system and streaming method Grant 8,583,927 - Futagami , et al. November 12, 2 | 2013-11-12 |
| Streaming system and streaming method Grant 8,572,380 - Futagami , et al. October 29, 2 | 2013-10-29 |
| Electrode Assembly And Plasma Processing Apparatus App 20120247678 - TAKAHASHI; Chikako ; et al. | 2012-10-04 |
| Focus ring, plasma etching apparatus and plasma etching method Grant 8,192,577 - Satoh , et al. June 5, 2 | 2012-06-05 |
| Streaming System and Streaming Method App 20120016958 - Futagami; Motomasa ; et al. | 2012-01-19 |
| Plasma Processing Apparatus App 20110290419 - Horiguchi; Masato ; et al. | 2011-12-01 |
| Substrate Processing Apparatus App 20110240224 - YOSHIMURA; Akihiro ; et al. | 2011-10-06 |
| Focus ring, plasma etching apparatus and plasma etching method Grant 7,618,515 - Satoh , et al. November 17, 2 | 2009-11-17 |
| Focus Ring, Plasma Etching Apparatus And Plasma Etching Method App 20090255902 - Satoh; Daiki ; et al. | 2009-10-15 |
| Information processing apparatus and method for decoding encoded data Grant 7,461,161 - Horiguchi December 2, 2 | 2008-12-02 |
| Electrode assembly and plasma processing apparatus App 20060288934 - Takahashi; Chikako ; et al. | 2006-12-28 |
| Focus ring, plasma etching apparatus and plasma etching method App 20060102288 - Satoh; Daiki ; et al. | 2006-05-18 |
| Streaming system and streaming method App 20050108746 - Futagami, Motomasa ; et al. | 2005-05-19 |
| Information processing apparatus incorporated in a control unit storing an authentication information and transmitting a command to request an access right when a first mode is set Grant 6,883,043 - Horiguchi April 19, 2 | 2005-04-19 |
| Information processing method and apparatus App 20040013399 - Horiguchi, Masato ; et al. | 2004-01-22 |
| Information processing apparatus App 20030069979 - Horiguchi, Masato | 2003-04-10 |
| Information-processing apparatus, information-processing method, network system, and program App 20030005141 - Horiguchi, Masato | 2003-01-02 |
| Information processing apparatus and method, information processing system, and program storage medium App 20020078272 - Horiguchi, Masato | 2002-06-20 |
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