Horiguchi; Katsumi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Horiguchi; Katsumi.The latest application filed is for "etching method and semiconductor device fabrication method".

Company Profile

0.4.7

Horiguchi; Katsumi - Amagasaki JP
Horiguchi; Katsumi - Nirasaki JP
Horiguchi; Katsumi - Amagasaki-shi JP
Horiguchi; Katsumi - Hyogo JP
Horiguchi, Katsumi - Nirasaki-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Capacitive coupling plasma processing apparatus Grant 7,767,055 - Himori , et al. August 3, 2	2010-08-03
Focus ring for semiconductor treatment and plasma treatment device Grant 7,678,225 - Nezu , et al. March 16, 2	2010-03-16
Etching Method And Semiconductor Device Fabrication Method App 20080261406 - IIJIMA; Etsuo ; et al.	2008-10-23
Plasma etching method and apparatus, control program for performing the etching method, and storage medium storing the control program Grant 7,416,676 - Fujihara , et al. August 26, 2	2008-08-26
Silicon etching method Grant 7,109,123 - Mimura , et al. September 19, 2	2006-09-19
Plasma etching method and apparatus, control program for performing the etching method, and storage medium storing the control program App 20060180571 - Fujihara; Jin ; et al.	2006-08-17
Capacitive coupling plasma processing apparatus App 20060118044 - Himori; Shinji ; et al.	2006-06-08
Etching method and plasma etching processing apparatus App 20050014372 - Shimonishi, Satoshi ; et al.	2005-01-20
Plasma processing method App 20040222190 - Horiguchi, Katsumi ; et al.	2004-11-11
Silicon etching method App 20040097090 - Mimura, Takanori ; et al.	2004-05-20
Focus ring for semiconductor treatment and plasma treatment device App 20040074605 - Nezu, Takaaki ; et al.	2004-04-22

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