loadpatents
name:-0.019748210906982
name:-0.0099351406097412
name:-0.0023338794708252
Horigome; Masahiro Patent Filings

Horigome; Masahiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Horigome; Masahiro.The latest application filed is for "doping method, doping apparatus and method of manufacturing semiconductor device".

Company Profile
1.8.14
  • Horigome; Masahiro - Hokuto JP
  • Horigome; Masahiro - Sendai JP
  • Horigome; Masahiro - Miyagi JP
  • Horigome; Masahiro - Yamanashi N/A JP
  • Horigome; Masahiro - Nirasaki JP
  • Horigome; Masahiro - Nirasaki-shi JP
  • Horigome; Masahiro - Kofu JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Doping method, doping apparatus and method of manufacturing semiconductor device
Grant 9,472,404 - Ueda , et al. October 18, 2
2016-10-18
Pulsed gas plasma doping method and apparatus
Grant 9,165,771 - Ventzek , et al. October 20, 2
2015-10-20
Doping Method, Doping Apparatus And Method Of Manufacturing Semiconductor Device
App 20150187582 - UEDA; Hirokazu ;   et al.
2015-07-02
Method For Injecting Dopant Into Substrate To Be Processed, And Plasma Doping Apparatus
App 20150132929 - Horigome; Masahiro ;   et al.
2015-05-14
Plasma doping apparatus and plasma doping method
Grant 9,029,249 - Ueda , et al. May 12, 2
2015-05-12
Plasma Doping Apparatus, Plasma Doping Method, Semiconductor Device Manufacturing Method And Semiconductor Device
App 20140357068 - Horigome; Masahiro ;   et al.
2014-12-04
Pulsed Gas Plasma Doping Method And Apparatus
App 20140302666 - VENTZEK; Peter ;   et al.
2014-10-09
Surface treatment for a fluorocarbon film
Grant 8,765,605 - Horigome , et al. July 1, 2
2014-07-01
Plasma Doping Apparatus And Plasma Doping Method
App 20140179028 - UEDA; Hirokazu ;   et al.
2014-06-26
Plasma Doping Apparatus, Plasma Doping Method, And Method For Manufacturing Semiconductor Device
App 20140094024 - OKA; Masahiro ;   et al.
2014-04-03
Film Forming Method, Semiconductor Device Manufacturing Method, Insulating Film And Semiconductor Device
App 20120190211 - Ueda; Hirokazu ;   et al.
2012-07-26
Surface Treatment For A Fluorocarbon Film
App 20110318919 - Horigome; Masahiro ;   et al.
2011-12-29
Film Forming Method, Film Forming Apparatus, Storage Medium And Semiconductor Device
App 20100244204 - Matsuoka; Takaaki ;   et al.
2010-09-30
Plasma Doping Apparatus And Plasma Doping Method
App 20100167507 - Horigome; Masahiro ;   et al.
2010-07-01
Film Forming Method, Film Forming Apparatus, Storage Medium And Semiconductor Device
App 20100090315 - Horigome; Masahiro
2010-04-15
Plasma Film Forming Apparatus And Plasma Film Forming Method
App 20100075066 - Ueda; Hirokazu ;   et al.
2010-03-25
Semiconductor Device And Manufacturing Method Of Semiconductor Device
App 20090134518 - Horigome; Masahiro
2009-05-28
Deposition Method, Deposition Apparatus, Computer Readable Medium, and Semiconductor Device
App 20090085172 - Horigome; Masahiro ;   et al.
2009-04-02
Electrophotographic photoreceptor having silicate with perfluoroalkyl groups in protective layer
Grant 4,997,738 - Kumakura , et al. March 5, 1
1991-03-05
Electrophotographic photoreceptor
Grant 4,912,000 - Kumakura , et al. March 27, 1
1990-03-27
Electrophotographic photoreceptor
Grant 4,839,252 - Murata , et al. June 13, 1
1989-06-13

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