Hori; Tetsuji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hori; Tetsuji.The latest application filed is for "thin film magnetic head and manufacturing method thereof".

Company Profile

0.14.17

Hori; Tetsuji - Tokyo JP
HORI; Tetsuji - Iwakura-shi JP
Hori; Tetsuji - Kiyosu JP
Hori; Tetsuji - Saku-shi JP
Hori; Tetsuji - Kiyosu-shi JP
Hori; Tetsuji - Yokohama JP
Hori, Tetsuji - Aichi-ken JP
Hori; Tetsuji - Kanagawa JP
Hori, Tetsuji - Yokohama-shi JP
Hori; Tetsuji - Iwakura JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of making a mask, method of patterning by using this mask and method of manufacturing a micro-device Grant 8,529,777 - Watanabe , et al. September 10, 2	2013-09-10
Thin Film Magnetic Head And Manufacturing Method Thereof App 20130070364 - Matsuura; Yuji ; et al.	2013-03-21
Method Of Making A Mask, Method Of Patterning By Using This Mask And Method Of Manufacturing A Micro-device App 20130062307 - WATANABE; Hisayoshi ; et al.	2013-03-14
Method of forming metal to a concave portion of a substrate, method of manufacturing a magnetic head and a magnetic head Grant 8,379,346 - Watanabe , et al. February 19, 2	2013-02-19
Method Of Forming Metal To A Concave Portion Of A Substrate, Method Of Manufacturing A Magnetic Head And A Magnetic Head App 20130027810 - WATANABE; Hisayoshi ; et al.	2013-01-31
Polishing composition for polishing silver and alumina, and polishing method using the same App 20110132868 - Hori; Tetsuji	2011-06-09
Retainer ring used for polishing a structure for manufacturing magnetic head, and polishing method using the same Grant 7,867,060 - Aritomo , et al. January 11, 2	2011-01-11
Alumina-film-polishing composition and chemical mechanical polishing method using the same Grant 7,699,901 - Hori April 20, 2	2010-04-20
Retainer ring used for polishing a structure for manufacturing magnetic head, and polishing method using the same App 20090247060 - Aritomo; Hiroki ; et al.	2009-10-01
Alumina-film-polishing composition and chemical mechanical polishing method using the same App 20080293330 - Hori; Tetsuji	2008-11-27
Polishing Composition And Polishing Method Using The Same App 20080214000 - ASANO; Hiroshi ; et al.	2008-09-04
Composition for selectively polishing silicon nitride layer and polishing method employing it Grant 7,217,989 - Hiramitsu , et al. May 15, 2	2007-05-15
Polishing composition and polishing method using same App 20060258267 - Ito; Takashi ; et al.	2006-11-16
Composition for selectively polishing silicon nitride layer and polishing method employing it App 20060084270 - Hiramitsu; Ai ; et al.	2006-04-20
Mounting material, semiconductor device and method of manufacturing semiconductor device Grant 6,949,814 - Thai , et al. September 27, 2	2005-09-27
Polishing composition and polishing method using same App 20040161937 - Asano, Hiroshi ; et al.	2004-08-19
Solder material, device using the same and manufacturing process thereof Grant 6,673,310 - Tadauchi , et al. January 6, 2	2004-01-06
Mounting material, semiconductor device and method of manufacturing semiconductor device App 20030111728 - Thai, Cao Minh ; et al.	2003-06-19
Semiconductor device Grant D475,982 - Hori , et al. June 17, 2	2003-06-17
Semiconductor device Grant D475,355 - Hori , et al. June 3, 2	2003-06-03
Semiconductor device Grant D475,028 - Hori , et al. May 27, 2	2003-05-27
Semiconductor device App 20030057573 - Sekine, Toshitaka ; et al.	2003-03-27
Semiconductor Package And Manufacturing Method Thereof App 20020140067 - Hori, Tetsuji	2002-10-03
Polishing composition Grant 6,355,075 - Ina , et al. March 12, 2	2002-03-12
Solder material, device using the same and manufacturing process thereof App 20010029095 - Tadauchi, Masahiro ; et al.	2001-10-11
Semiconductor device provided with heat-sink and method of manufacturing the same Grant 6,225,701 - Hori , et al. May 1, 2	2001-05-01

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