Honma; Yoshio

Patent Applications and Registrations

Patent applications and USPTO patent grants for Honma; Yoshio.The latest application filed is for "abrasive liquid for metal and method for polishing".

Company Profile

0.13.7

Honma; Yoshio - Kokubunji N/A JP
Honma, Yoshio - Kokubun ji JP
Honma; Yoshio - Tokyo JP
Honma; Yoshio - Shobu JP
Honma; Yoshio - Nishitama JP
Honma; Yoshio - Yokosuka JA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same Grant 8,900,477 - Uchida , et al. December 2, 2	2014-12-02
Abrasive liquid for metal and method for polishing Grant 8,491,807 - Uchida , et al. July 23, 2	2013-07-23
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same Grant 8,226,849 - Uchida , et al. July 24, 2	2012-07-24
Abrasive Liquid For Metal and Method for Polishing App 20120048830 - Uchida; Takeshi ; et al.	2012-03-01
Abrasive liquid for metal and method for polishing Grant 8,038,898 - Uchida , et al. October 18, 2	2011-10-18
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same Grant 7,799,686 - Uchida , et al. September 21, 2	2010-09-21
Materials For Polishing Liquid For Metal, Polishing Liquid For Metal, Method For Preparation Thereof And Polishing Method Using The Same App 20080121840 - Uchida; Takeshi ; et al.	2008-05-29
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same Grant 7,250,369 - Uchida , et al. July 31, 2	2007-07-31
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same App 20070167017 - Uchida; Takeshi ; et al.	2007-07-19
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same App 20060216939 - Uchida; Takeshi ; et al.	2006-09-28
Abrasive liquid for metal and method for polishing Grant 6,899,821 - Uchida , et al. May 31, 2	2005-05-31
Abrasive liquid for metal and method for polishing App 20050095860 - Uchida, Takeshi ; et al.	2005-05-05
Cerium oxide abrasive for polishing insulating films formed on substrate and methods for using the same Grant 6,420,269 - Matsuzawa , et al. July 16, 2	2002-07-16
Abrasive liquid for metal and method for polishing App 20020017630 - Uchida, Takeshi ; et al.	2002-02-14
Cerium Oxide Abrasive For Polishing Insulating Films Formed On Substrate And Methods For Using The Same App 20020016060 - MATSUZAWA, JUN ; et al.	2002-02-07
New tetramethyl-cis-diaza-bicyclo{4.2.0}octane-3,5-dione derivatives having differentiation-inducing activity and antiviral activity Grant 4,939,156 - Hozumi , et al. July 3, 1	1990-07-03
Semiconductor device with wiring layer using bias sputtering Grant 4,792,842 - Honma , et al. December 20, 1	1988-12-20
Descaling system for the cooling tubes of a steam condenser Grant 3,872,920 - Honma , et al. March 25, 1	1975-03-25

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