HONG; Youn Gi

Patent Applications and Registrations

Patent applications and USPTO patent grants for HONG; Youn Gi.The latest application filed is for "rf power compensation to reduce deposition or etch rate changes in response to substrate bulk resistivity variations".

Company Profile

0.5.6

HONG; Youn Gi - Pleasanton CA
Hong; Youn Gi - Fremont CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Rf Power Compensation To Reduce Deposition Or Etch Rate Changes In Response To Substrate Bulk Resistivity Variations App 20210313152 - LUO; Wei Yi ; et al.	2021-10-07
Back side deposition apparatus and applications Grant 9,881,788 - Kim , et al. January 30, 2	2018-01-30
Conformal Doping Using Dopant Gas On Hydrogen Plasma Treated Surface App 20170170018 - Kim; Yunsang ; et al.	2017-06-15
Line width roughness improvement with noble gas plasma Grant 9,466,502 - Cheng , et al. October 11, 2	2016-10-11
Line Width Roughness Improvement With Noble Gas Plasma App 20160155643 - CHENG; Shih-Yuan ; et al.	2016-06-02
Line width roughness improvement with noble gas plasma Grant 9,263,284 - Cheng , et al. February 16, 2	2016-02-16
Back Side Deposition Apparatus And Applications App 20150340225 - Kim; Yunsang ; et al.	2015-11-26
Line Width Roughness Improvement With Noble Gas Plasma App 20140248779 - CHENG; Shih-Yuan ; et al.	2014-09-04
Line width roughness improvement with noble gas plasma Grant 8,753,804 - Cheng , et al. June 17, 2	2014-06-17
Line Width Roughness Improvement With Noble Gas Plasma App 20110104616 - Cheng; Shih-Yuan ; et al.	2011-05-05

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