loadpatents
name:-0.031568050384521
name:-0.025146007537842
name:-0.00063800811767578
HONG; Sung Eun Patent Filings

HONG; Sung Eun

Patent Applications and Registrations

Patent applications and USPTO patent grants for HONG; Sung Eun.The latest application filed is for "uv protection cosmetic composition".

Company Profile
0.22.31
  • HONG; Sung Eun - Seoul KR
  • Hong; Sung-Eun - Ogasa-gun JP
  • Hong; Sung-Eun - Shizuoka JP
  • Hong; Sung Eun - Kakegawa JP
  • Hong; Sung Eun - Basking Ridge NJ
  • Hong; Sung-Eun - Somerville NJ
  • Hong; Sung Eun - Sungnam-shi KR
  • Hong; Sung Eun - Kyoungki-do KR
  • Hong; Sung-eun - Seongnam-shi KR
  • Hong, Sung Eun - Ichon-shi KR
  • Hong; Sung-Eun - Gyunggi-do KR
  • Hong; Sung-eun - Scongnam-shi KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Uv Protection Cosmetic Composition
App 20210251876 - KIM; Jin Young ;   et al.
2021-08-19
Ultrafine porous graphitic carbon fiber and preparation method thereof
Grant 7,887,772 - Jo , et al. February 15, 2
2011-02-15
Process for Preventing Development Defect and Composition for Use in the Same
App 20100324330 - Akiyama; Yasushi ;   et al.
2010-12-23
Process for preventing development defect and composition for use in the same
Grant 7,799,513 - Akiyama , et al. September 21, 2
2010-09-21
Water soluble resin composition and method for pattern formation using the same
Grant 7,745,093 - Nishibe , et al. June 29, 2
2010-06-29
Composition for coating over a photoresist pattern
Grant 7,745,077 - Thiyagarajan , et al. June 29, 2
2010-06-29
Water-soluble Resin Composition For The Formation Of Micropatterns And Method For The Formation Of Micropatterns With The Same
App 20100119717 - Hong; Sung-Eun ;   et al.
2010-05-13
Composition for Coating over a Photoresist Pattern
App 20090317739 - Thiyagarajan; Muthiah ;   et al.
2009-12-24
Water Soluble Resin Composition and Method for Pattern Formation Using the Same
App 20080193880 - Nishibe; Takeshi ;   et al.
2008-08-14
Water soluble resin composition, method of pattern formation and method of inspecting resist pattern
Grant 7,335,464 - Takano , et al. February 26, 2
2008-02-26
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same
Grant 7,329,477 - Jung , et al. February 12, 2
2008-02-12
Ultrafine porous graphitic carbon fiber and preparation method thereof
App 20070134151 - Jo; Seong-Mu ;   et al.
2007-06-14
Additive for photoresist composition for resist flow process
Grant 7,150,961 - Jung , et al. December 19, 2
2006-12-19
Water soluble resin composition, method of pattern formation and method of inspecting resist pattern
App 20060160015 - Takano; Yusuke ;   et al.
2006-07-20
Top-coating composition for photoresist and process for forming fine pattern using the same
Grant 6,984,482 - Jung , et al. January 10, 2
2006-01-10
Organic anti-reflective polymer and preparation thereof
Grant 6,956,091 - Hong , et al. October 18, 2
2005-10-18
Process for preventing development defect and composition for use in the same
App 20050221236 - Akiyama, Yasushi ;   et al.
2005-10-06
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same
App 20050069816 - Jung, Jae Chang ;   et al.
2005-03-31
Reflection-inhibiting resin used in process for forming photoresist pattern
Grant 6,797,451 - Hong , et al. September 28, 2
2004-09-28
Additive for photoresist composition for resist flow process
App 20040166437 - Jung, Min Ho ;   et al.
2004-08-26
Organic polymer for anti-reflective coating layer and preparation thereof
Grant 6,780,953 - Jung , et al. August 24, 2
2004-08-24
Additive for photoresist composition for resist flow process
Grant 6,770,414 - Jung , et al. August 3, 2
2004-08-03
Organic polymer for organic anti-reflective coating layer and preparation thereof
Grant 6,770,720 - Jung , et al. August 3, 2
2004-08-03
Process for forming a photoresist pattern comprising alkaline treatment
Grant 6,699,644 - Lee , et al. March 2, 2
2004-03-02
Process for forming photoresist pattern by using gas phase amine treatment
Grant 6,664,031 - Jung , et al. December 16, 2
2003-12-16
Organic anti-reflective polymer and preparation thereof
App 20030208018 - Hong, Sung-eun ;   et al.
2003-11-06
Method for forming micro-pattern of semiconductor device
Grant 6,610,616 - Koh , et al. August 26, 2
2003-08-26
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof
Grant 6,602,650 - Hong , et al. August 5, 2
2003-08-05
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof
Grant 6,599,678 - Hong , et al. July 29, 2
2003-07-29
Organic polymer for anti-reflective coating layer and preparation thereof
App 20030118736 - Jung, Min-Ho ;   et al.
2003-06-26
Top-coating composition for photoresist and process for forming fine pattern using the same
App 20030108815 - Jung, Jae Chang ;   et al.
2003-06-12
Organic polymer for organic anti-reflective coating layer and preparation thereof
App 20030100695 - Jung, Jae-chang ;   et al.
2003-05-29
Reflection-inhibiting resinn used in process for forming photoresist pattern
App 20030018150 - Hong, Sung Eun ;   et al.
2003-01-23
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof
App 20030003397 - Hong, Sung-eun ;   et al.
2003-01-02
Anti reflective coating polymers and the preparation method thereof
Grant 6,492,441 - Hong , et al. December 10, 2
2002-12-10
Organic anti-reflective coating polymer and preparation thereof
Grant 6,489,432 - Jung , et al. December 3, 2
2002-12-03
Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof
Grant 6,486,283 - Hong , et al. November 26, 2
2002-11-26
Organic anti-reflective polymer and method for manufacturing therof
App 20020136834 - Jung, Min-Ho ;   et al.
2002-09-26
Organic anti-reflective polymer and method for manufacturing thereof
App 20020137826 - Jung, Min-ho ;   et al.
2002-09-26
Organic anti-reflective coating material and its preparation
App 20020132183 - Jung, Min-Ho ;   et al.
2002-09-19
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof
App 20020127789 - Hong, Sung-Eun ;   et al.
2002-09-12
Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof
App 20020123586 - Hong, Sung-Eun ;   et al.
2002-09-05
Anti reflective coating polymers and the preparation method thereof
App 20020120070 - Hong, Sung-Eun ;   et al.
2002-08-29
Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof
App 20020093069 - Hong, Sung-Eun ;   et al.
2002-07-18
Method for forming micro-pattern of semiconductor device
App 20020090832 - Koh, Cha-Won ;   et al.
2002-07-11
Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof
App 20020090452 - Hong, Sung-Eun ;   et al.
2002-07-11
Additive for photoresist composition for resist flow process
App 20020022197 - Jung, Min Ho ;   et al.
2002-02-21
Organic anti-reflective coating polymer and preparation thereof
App 20020009595 - Hong, Sung-Eun ;   et al.
2002-01-24
Process for forming photoresist pattern by using gas phase amine treatment
App 20010053590 - Jung, Jae Chang ;   et al.
2001-12-20
Organic anti-reflective coating polymer and preparation thereof
App 20010049429 - Jung, Min-ho ;   et al.
2001-12-06
Organic polymer for anti-reflective coating layer and preparation thereof
App 20010043992 - Jung, Min-ho ;   et al.
2001-11-22
Organic anti-reflective coating material and its preparation
Grant 6,309,790 - Jung , et al. October 30, 2
2001-10-30
Organic anti-reflective coating polymer and preparation thereof
App 20010034427 - Jung, Min-Ho ;   et al.
2001-10-25

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