Hong; Hyesook

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hong; Hyesook.The latest application filed is for "method and device employing polysilicon scaling".

Company Profile

0.9.10

Hong; Hyesook - Allen TX
Hong; Hyesook - Richardson TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and device employing polysilicon scaling Grant 8,637,918 - Fang , et al. January 28, 2	2014-01-28
Monitor for variation of critical dimensions (CDs) of reticles Grant 8,198,105 - Hong , et al. June 12, 2	2012-06-12
Method And Device Employing Polysilicon Scaling App 20120056260 - Fang; Shenqing ; et al.	2012-03-08
Method and device employing polysilicon scaling Grant 8,076,199 - Fang , et al. December 13, 2	2011-12-13
Method And Device Employing Polysilicon Scaling App 20100207191 - FANG; Shenqing ; et al.	2010-08-19
Integration Method For Dual Doped Polysilicon Gate Profile And Cd Control App 20090104745 - Hong; Hyesook ; et al.	2009-04-23
Plasma Dry Etch Process For Metal-containing Gates App 20080242072 - Choi; Jinhan ; et al.	2008-10-02
Plasma treatment for silicon-based dielectrics Grant 7,282,436 - Jiang , et al. October 16, 2	2007-10-16
Method to obtain fully silicided gate electrodes Grant 7,244,642 - Vitale , et al. July 17, 2	2007-07-17
Method to obtain fully silicided gate electrodes App 20070066007 - Vitale; Steven A. ; et al.	2007-03-22
Dual cap layer in damascene interconnection processes Grant 7,129,162 - Hong , et al. October 31, 2	2006-10-31
Plasma treatment for silicon-based dielectrics App 20050255687 - Jiang, Ping ; et al.	2005-11-17
Monitor for variation of critical dimensions (CDs) of reticles App 20050164096 - Hong, Hyesook ; et al.	2005-07-28
Plasma treatment of low-k dielectric films to improve patterning Grant 6,620,560 - Jiang , et al. September 16, 2	2003-09-16
Treatment of low-k dielectric films to enable patterning of deep submicron features Grant 6,605,536 - Eissa , et al. August 12, 2	2003-08-12
Treatment of low-k dielectric films to enable patterning of deep submicron features App 20020127876 - Eissa, Mona ; et al.	2002-09-12
Plasma treatment of low-k dielectric films to improve patterning App 20020090822 - Jiang, Ping ; et al.	2002-07-11
Treatment of low-k dielectric films to enable patterning of deep submicron features App 20020064951 - Eissa, Mona M. ; et al.	2002-05-30

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