Homma; Tetsuya

Patent Applications and Registrations

Patent applications and USPTO patent grants for Homma; Tetsuya.The latest application filed is for "method of recycling useful metal".

Company Profile

0.18.1

Homma; Tetsuya - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of recycling useful metal Grant 8,317,896 - Homma , et al. November 27, 2	2012-11-27
Method Of Recycling Useful Metal App 20110017020 - Homma; Tetsuya ; et al.	2011-01-27
Semiconductor device having an organic resin layer and silicon oxide layer containing fluorine for preventing crosstalk between metal lines and a method of manufacturing the same Grant 5,939,771 - Usami , et al. August 17, 1	1999-08-17
Method of manufacturing semiconductor device Grant 5,840,631 - Kubo , et al. November 24, 1	1998-11-24
Method for forming multilevel interconnections in a semiconductor device Grant 5,776,829 - Homma , et al. July 7, 1	1998-07-07
Method for fabricating a semiconductor device having multilevel interconnections Grant 5,744,378 - Homma April 28, 1	1998-04-28
Method of fabricating multilevel interconnections in a semiconductor integrated circuit Grant 5,607,880 - Suzuki , et al. March 4, 1	1997-03-04
Semiconductor device having a silicon oxide film containing fluorine atoms Grant 5,521,424 - Ueno , et al. May 28, 1	1996-05-28
Fabrication process for multilevel interconnections in a semiconductor device Grant 5,506,177 - Kishimoto , et al. April 9, 1	1996-04-09
Method of producing semiconductor integrated circuit device having interplayer insulating film covering substrate Grant 5,491,108 - Suzuki , et al. February 13, 1	1996-02-13
Method of manufacturing semiconductor device using the abrasive Grant 5,468,682 - Homma November 21, 1	1995-11-21
Method of fabricating a semiconductor device having a multilayer wiring structure and using a fluorine compound-containing gas Grant 5,444,023 - Homma August 22, 1	1995-08-22
Forming multi-layered interconnections with fluorine compound treatment permitting selective deposition of insulator Grant 5,420,075 - Homma , et al. May 30, 1	1995-05-30
Method for manufacturing semiconductor device Grant 5,407,529 - Homma April 18, 1	1995-04-18
Method for forming interconnect structure, insulating films and surface protective films of semiconductor device Grant 5,405,805 - Homma April 11, 1	1995-04-11
Process for producing semiconductor devices Grant 5,399,529 - Homma March 21, 1	1995-03-21
Method for fabricating a semiconductor device having a multi-layered interconnection structure Grant 5,334,552 - Homma August 2, 1	1994-08-02
Chemical vapor deposition method for forming fluorine containing silicon oxide film Grant 5,288,518 - Homma February 22, 1	1994-02-22
Method of forming silicon oxide film containing fluorine Grant 5,215,787 - Homma June 1, 1	1993-06-01

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