Holst; Mark

Patent Applications and Registrations

Patent applications and USPTO patent grants for Holst; Mark.The latest application filed is for "effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases".

Company Profile

0.13.10

Holst; Mark - Concord CA
Holst; Mark - Sunnyvale CA
Holst; Mark - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases Grant 7,695,700 - Holst , et al. April 13, 2	2010-04-13
Effluent Gas Stream Treatment System Having Utility For Oxidation Treatment Of Semiconductor Manufacturing Effluent Gases App 20090010814 - Holst; Mark ; et al.	2009-01-08
Effluent Gas Stream Treatment System Having Utility For Oxidation Treatment Of Semiconductor Manufacturing Effluent Gases App 20070212288 - Holst; Mark ; et al.	2007-09-13
Effluent Gas Stream Treatment System Having Utility For Oxidation Treatment Of Semiconductor Manufacturing Effluent Gases App 20070166205 - Holst; Mark ; et al.	2007-07-19
Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases Grant 7,214,349 - Holst , et al. May 8, 2	2007-05-08
Methods and apparatus for process abatement App 20070086931 - Raoux; Sebastien ; et al.	2007-04-19
Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions Grant 6,833,024 - Holst , et al. December 21, 2	2004-12-21
Apparatus and method for point-of-use treatment of effluent gas streams App 20040213721 - Arno, Jose I. ; et al.	2004-10-28
Low pressure drop canister for fixed bed scrubber applications and method of using same App 20040159235 - Marganski, Paul J. ; et al.	2004-08-19
Method for point-of-use treatment of effluent gas streams Grant 6,759,018 - Arno , et al. July 6, 2	2004-07-06
Abatement of effluents from chemical vapor deposition processes using organometallic source reagents Grant 6,749,671 - Holst , et al. June 15, 2	2004-06-15
Abatement of effluents from chemical vapor deposition processes using organometallic source reagents App 20030136265 - Holst, Mark ; et al.	2003-07-24
Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions App 20030056726 - Holst, Mark ; et al.	2003-03-27
Abatement of effluents from chemical vapor deposition processes using organometallic source reagents Grant 6,537,353 - Holst , et al. March 25, 2	2003-03-25
Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions Grant 6,500,487 - Holst , et al. December 31, 2	2002-12-31
In-situ air oxidation treatment of MOCVD process effluent Grant 6,491,884 - Faller , et al. December 10, 2	2002-12-10
Abatement of effluents from chemical vapor deposition processes using organometallicsource reagents App 20020094380 - Holst, Mark ; et al.	2002-07-18
Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases App 20020018737 - Holst, Mark ; et al.	2002-02-14
Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases Grant 5,955,037 - Holst , et al. September 21, 1	1999-09-21
Clog-resistant entry structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system Grant 5,935,283 - Sweeney , et al. August 10, 1	1999-08-10
Alternating wash/dry water scrubber entry Grant 5,882,366 - Holst , et al. March 16, 1	1999-03-16
Weeping weir gas/liquid interface structure Grant 5,833,888 - Arya , et al. November 10, 1	1998-11-10
Method for destruction of volatile organic compound flows of varying concentration Grant 5,650,128 - Holst , et al. July 22, 1	1997-07-22

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