| Patent | Date |
|---|
Intermediate semiconductor device structures
Grant 7,821,142 - Holscher , et al. October 26, 2 | 2010-10-26 |
Methods of forming openings, and methods of forming container capacitors
Grant 7,538,036 - Busch , et al. May 26, 2 | 2009-05-26 |
Use Of A Dual Tone Resist To Form Photomasks And Intermediate Semiconductor Device Structures
App 20080251951 - Holscher; Richard D. ; et al. | 2008-10-16 |
Method, apparatus and system providing imaging device with color filter array
App 20080204580 - Holscher; Richard D. | 2008-08-28 |
Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates
Grant 7,408,265 - Holscher , et al. August 5, 2 | 2008-08-05 |
Capacitor structures, and DRAM arrays
Grant 7,321,149 - Busch , et al. January 22, 2 | 2008-01-22 |
Method and apparatus defining a color filter array for an image sensor
App 20070238035 - Holscher; Richard D. ; et al. | 2007-10-11 |
Methods of forming openings, and methods of forming container capacitors
Grant 7,153,778 - Busch , et al. December 26, 2 | 2006-12-26 |
Methods of forming openings, and methods of forming container capacitors
App 20060009042 - Busch; Brett W. ; et al. | 2006-01-12 |
Capacitor structures, and DRAM arrays
App 20050269620 - Busch, Brett W. ; et al. | 2005-12-08 |
Methods of Forming Openings, And Methods of Forming Container Capacitors
App 20050186802 - Busch, Brett W. ; et al. | 2005-08-25 |
Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates
App 20040259320 - Holscher, Richard D. ; et al. | 2004-12-23 |
Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates
Grant 6,815,308 - Holscher , et al. November 9, 2 | 2004-11-09 |
Reticle for creating resist-filled vias in a dual damascene process
Grant 6,812,129 - Holscher November 2, 2 | 2004-11-02 |
Automated combi deposition apparatus and method
Grant 6,768,213 - Holscher , et al. July 27, 2 | 2004-07-27 |
Overlay target design method to minimize impact of lens aberrations
Grant 6,756,167 - Baluswamy , et al. June 29, 2 | 2004-06-29 |
Reticle for creating resist-filled vias in a dual damascene process
App 20040038539 - Holscher, Richard D. | 2004-02-26 |
Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates
App 20040032031 - Holscher, Richard D. ; et al. | 2004-02-19 |
Reticle for creating resist-filled vias in a dual damascene process
Grant 6,639,320 - Holscher October 28, 2 | 2003-10-28 |
Overlay target design method minimize impact of lens aberrations
App 20030091916 - Baluswamy, Pary ; et al. | 2003-05-15 |
Overlay target design method to minimize impact of lens aberrations
App 20020160284 - Baluswamy, Pary ; et al. | 2002-10-31 |
Overlay target design method with pitch determination to minimize impact of lens aberrations
Grant 6,432,591 - Baluswamy , et al. August 13, 2 | 2002-08-13 |
Use of DARC and BARC in flash memory processing
Grant 6,423,474 - Holscher July 23, 2 | 2002-07-23 |
In-line method of measuring effective three-leaf aberration coefficient of lithography projection systems
App 20020072131 - Holscher, Richard D. | 2002-06-13 |
Automated combi deposition apparatus and method
App 20020052091 - Holscher, Richard D. ; et al. | 2002-05-02 |
Reticle for creating resist-filled vias in a dual damascene process
App 20020045107 - Holscher, Richard D. | 2002-04-18 |
Reducing resist shrinkage during device fabrication
Grant 6,107,002 - Holscher , et al. August 22, 2 | 2000-08-22 |
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