Holloway; Karen L.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Holloway; Karen L..The latest application filed is for "method for providing rotationally symmetric alignment marks for an alignment system that requires asymmetric geometric layout".

Company Profile

0.6.2

Holloway; Karen L. - Poughkeepsie NY
Holloway; Karen L. - Mount Kisco NY
Holloway; Karen L. - Bronx NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for providing rotationally symmetric alignment marks for an alignment system that requires asymmetric geometric layout Grant 8,039,366 - Holloway , et al. October 18, 2	2011-10-18
Method For Providing Rotationally Symmetric Alignment Marks For An Alignment System That Requires Asymmetric Geometric Layout App 20100207284 - Holloway; Karen L. ; et al.	2010-08-19
Process-robust alignment mark structure for semiconductor wafers Grant 6,803,668 - Holloway , et al. October 12, 2	2004-10-12
Process-robust alignment mark structure for semiconductor wafers App 20040099963 - Holloway, Karen L. ; et al.	2004-05-27
Variable data compensation for vias or contacts Grant 6,461,877 - Holloway , et al. October 8, 2	2002-10-08
Copper alloy metallurgies for VLSI interconnection structures Grant 5,243,222 - Harper , et al. September 7, 1	1993-09-07
Copper alloy metallurgies for VLSI interconnection structures Grant 5,130,274 - Harper , et al. July 14, 1	1992-07-14
Patterning of polyimide films with far ultraviolet light Grant 4,568,632 - Blum , et al. February 4, 1	1986-02-04

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