| Patent | Date |
|---|
Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators
Grant 11,195,706 - Marakhtanov , et al. December 7, 2 | 2021-12-07 |
Electrostatic Chuck Design For Cooling-gas Light-up Prevention
App 20210296099 - Matyushkin; Alexander ; et al. | 2021-09-23 |
Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity
Grant 11,069,553 - Matyushkin , et al. July 20, 2 | 2021-07-20 |
Electrostatic chuck design for cooling-gas light-up prevention
Grant 11,024,532 - Matyushkin , et al. June 1, 2 | 2021-06-01 |
Electrostatic Chucks With Coolant Gas Zones And Corresponding Groove And Monopolar Electrostatic Clamping Electrode Patterns
App 20210005494 - MATYUSHKIN; Alexander ; et al. | 2021-01-07 |
Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
Grant 10,825,656 - Kellogg , et al. November 3, 2 | 2020-11-03 |
Ion energy control by RF pulse shape
Grant 10,755,895 - Marakhtanov , et al. A | 2020-08-25 |
Systems And Methods For Controlling Directionality Of Ions In An Edge Region By Using An Electrode Within A Coupling Ring
App 20200227238 - Kellogg; Michael C. ; et al. | 2020-07-16 |
Chamber with vertical support stem for symmetric conductance and RF delivery
Grant 10,665,435 - Brown , et al. | 2020-05-26 |
Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
Grant 10,615,003 - Kellogg , et al. | 2020-04-07 |
Methods and Systems for Managing Byproduct Material Accumulation During Plasma-Based Semiconductor Wafer Fabrication Process
App 20200105508 - Belau; Leonid ; et al. | 2020-04-02 |
Chamber With Vertical Support Stem For Symmetric Conductance And Rf Delivery
App 20190371579 - Brown; Daniel Arthur ; et al. | 2019-12-05 |
Chamber with vertical support stem for symmetric conductance and RF delivery
Grant 10,395,902 - Brown , et al. A | 2019-08-27 |
Systems And Methods For Achieving A Pre-determined Factor Associated With An Edge Region Within A Plasma Chamber By Synchronizin
App 20190244788 - Marakhtanov; Alexei ; et al. | 2019-08-08 |
Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
Grant 10,340,122 - Chen , et al. | 2019-07-02 |
Multi regime plasma wafer processing to increase directionality of ions
Grant 10,304,662 - Marakhtanov , et al. | 2019-05-28 |
Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators
Grant 10,283,330 - Marakhtanov , et al. | 2019-05-07 |
Multi Regime Plasma Wafer Processing to Increase Directionality of Ions
App 20190080885 - Marakhtanov; Alexei ; et al. | 2019-03-14 |
Systems And Methods For Controlling Directionality Of Ions In An Edge Region By Using An Electrode Within A Coupling Ring
App 20190057839 - Kellogg; Michael C. ; et al. | 2019-02-21 |
Electrostatic Chuck Design For Cooling-gas Light-up Prevention
App 20190006225 - Matyushkin; Alexander ; et al. | 2019-01-03 |
Chamber With Vertical Support Stem For Symmetric Conductance And Rf Delivery
App 20180323044 - Brown; Daniel Arthur ; et al. | 2018-11-08 |
Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
Grant 10,115,568 - Kellogg , et al. October 30, 2 | 2018-10-30 |
Uniformity control circuit for use within an impedance matching circuit
Grant 10,115,564 - Marakhtanov , et al. October 30, 2 | 2018-10-30 |
Systems And Methods For Tailoring Ion Energy Distribution Function By Odd Harmonic Mixing
App 20180301320 - Chen; Zhigang ; et al. | 2018-10-18 |
Electrostatic Chuck With Flexible Wafer Temperature Control
App 20180286642 - MATYUSHKIN; Alexander ; et al. | 2018-10-04 |
Electrostatic chuck design for cooling-gas light-up prevention
Grant 10,083,853 - Matyushkin , et al. September 25, 2 | 2018-09-25 |
Semiconductor Processing System Having Multiple Decoupled Plasma Sources
App 20180240686 - Holland; John Patrick ; et al. | 2018-08-23 |
Chamber with vertical support stem for symmetric conductance and RF delivery
Grant 10,049,862 - Brown , et al. August 14, 2 | 2018-08-14 |
Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
Grant 10,026,592 - Chen , et al. July 17, 2 | 2018-07-17 |
Multi regime plasma wafer processing to increase directionality of ions
Grant 10,002,746 - Marakhtanov , et al. June 19, 2 | 2018-06-19 |
Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes
Grant 9,984,859 - Marakhtanov , et al. May 29, 2 | 2018-05-29 |
Semiconductor processing system having multiple decoupled plasma sources
Grant 9,947,557 - Holland , et al. April 17, 2 | 2018-04-17 |
Systems And Methods For Controlling Directionality Of Ions In An Edge Region By Using An Electrode Within A Coupling Ring
App 20180082822 - Kellogg; Michael C. ; et al. | 2018-03-22 |
Systems And Methods For Achieving A Pre-determined Factor Associated With An Edge Region Within A Plasma Chamber By Synchronizing Main And Edge Rf Generators
App 20180025891 - Marakhtanov; Alexei ; et al. | 2018-01-25 |
Electrostatic Chuck With Features For Preventing Electrical Arcing And Light-up And Improving Process Uniformity
App 20180012785 - Matyushkin; Alexander ; et al. | 2018-01-11 |
Systems And Methods For Tailoring Ion Energy Distribution Function By Odd Harmonic Mixing
App 20180005802 - Chen; Zhigang ; et al. | 2018-01-04 |
Uniformity Control Circuit For Use Within An Impedance Matching Circuit
App 20170372872 - Marakhtanov; Alexei ; et al. | 2017-12-28 |
Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
Grant 9,852,889 - Kellogg , et al. December 26, 2 | 2017-12-26 |
Uniformity control circuit for use within an impedance matching circuit
Grant 9,761,414 - Marakhtanov , et al. September 12, 2 | 2017-09-12 |
Impedance Matching Circuit For Operation With A Kilohertz Rf Generator And A Megahertz Rf Generator To Control Plasma Processes
App 20170162368 - Marakhtanov; Alexei ; et al. | 2017-06-08 |
Electrostatic Chuck Design For Cooling-gas Light-up Prevention
App 20170110356 - Matyushkin; Alexander ; et al. | 2017-04-20 |
Uniformity Control Circuit For Use Within An Impedance Matching Circuit
App 20170103870 - Marakhtanov; Alexei ; et al. | 2017-04-13 |
Ion Energy Control By RF Pulse Shape
App 20170084429 - Marakhtanov; Alexei ; et al. | 2017-03-23 |
Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes
Grant 9,595,424 - Marakhtanov , et al. March 14, 2 | 2017-03-14 |
Ion energy control by RF pulse shape
Grant 9,536,749 - Marakhtanov , et al. January 3, 2 | 2017-01-03 |
Chamber With Vertical Support Stem For Symmetric Conductance And Rf Delivery
App 20160307743 - Brown; Daniel Arthur ; et al. | 2016-10-20 |
Impedance Matching Circuit For Operation With A Kilohertz Rf Generator And A Megahertz Rf Generator To Control Plasma Processes
App 20160260584 - Marakhtanov; Alexei ; et al. | 2016-09-08 |
Ion Energy Control By RF Pulse Shape
App 20160172216 - Marakhtanov; Alexei ; et al. | 2016-06-16 |
E-beam enhanced decoupled source for semiconductor processing
Grant 9,177,756 - Holland , et al. November 3, 2 | 2015-11-03 |
E-beam enhanced decoupled source for semiconductor processing
Grant 9,111,728 - Holland , et al. August 18, 2 | 2015-08-18 |
Semiconductor processing system with source for decoupled ion and radical control
Grant 8,980,046 - Koshiishi , et al. March 17, 2 | 2015-03-17 |
Semiconductor Processing System Having Multiple Decoupled Plasma Sources
App 20150044878 - Holland; John Patrick ; et al. | 2015-02-12 |
Semiconductor processing system having multiple decoupled plasma sources
Grant 8,900,402 - Holland , et al. December 2, 2 | 2014-12-02 |
Semiconductor processing system having multiple decoupled plasma sources
Grant 8,900,403 - Holland , et al. December 2, 2 | 2014-12-02 |
Semiconductor Processing System with Source for Decoupled Ion and Radical Control
App 20130157469 - Koshiishi; Akira ; et al. | 2013-06-20 |
Semiconductor Processing System Having Multiple Decoupled Plasma Sources
App 20120289053 - Holland; John Patrick ; et al. | 2012-11-15 |
Semiconductor Processing System Having Multiple Decoupled Plasma Sources
App 20120289054 - Holland; John Patrick ; et al. | 2012-11-15 |
E-Beam Enhanced Decoupled Source for Semiconductor Processing
App 20120258601 - Holland; John Patrick ; et al. | 2012-10-11 |
E-Beam Enhanced Decoupled Source for Semiconductor Processing
App 20120258607 - Holland; John Patrick ; et al. | 2012-10-11 |
E-Beam Enhanced Decoupled Source for Semiconductor Processing
App 20120258606 - Holland; John Patrick ; et al. | 2012-10-11 |
Multi-Frequency Hollow Cathode System for Substrate Plasma Processing
App 20120255678 - Holland; John Patrick ; et al. | 2012-10-11 |
Multi-Frequency Hollow Cathode and Systems Implementing the Same
App 20120258555 - Holland; John Patrick ; et al. | 2012-10-11 |
Plasma processor with coil responsive to variable amplitude rf envelope
Grant 6,319,355 - Holland November 20, 2 | 2001-11-20 |
Inductively coupled planar source for substantially uniform plasma flux
Grant 6,027,603 - Holland , et al. February 22, 2 | 2000-02-22 |
Vacuum plasma processor having coil with added conducting segments to its peripheral part
Grant 6,028,395 - Holland , et al. February 22, 2 | 2000-02-22 |
Method of and apparatus for igniting a plasma in an r.f. plasma processor
Grant 5,982,099 - Barnes , et al. November 9, 1 | 1999-11-09 |
Method of and apparatus for electronically controlling r.f. energy supplied to a vacuum plasma processor and memory for same
Grant 5,892,198 - Barnes , et al. April 6, 1 | 1999-04-06 |
Vacuum plasma processor having coil with minimum magnetic field in its center
Grant 5,800,619 - Holland , et al. September 1, 1 | 1998-09-01 |
Apparatus for controlling matching network of a vacuum plasma processor and memory for same
Grant 5,793,162 - Barnes , et al. August 11, 1 | 1998-08-11 |
Inductively coupled source for deriving substantially uniform plasma flux
Grant 5,759,280 - Holland , et al. June 2, 1 | 1998-06-02 |
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