HOLLAND; John P.

Patent Applications and Registrations

Patent applications and USPTO patent grants for HOLLAND; John P..The latest application filed is for "method and apparatus for stable plasma processing".

Company Profile

0.29.41

HOLLAND; John P. - San Jose CA
Holland; John P. - US
Holland; John P. - Santa Clara CA
Holland; John P. - Milwaukee WI
Holland; John P. - Sterling IL

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method And Apparatus For Stable Plasma Processing App 20140345803 - TODOROW; Valentin N. ; et al.	2014-11-27
Method and apparatus for stable plasma processing Grant 8,801,896 - Todorow , et al. August 12, 2	2014-08-12
Apparatus for etching high aspect ratio features Grant 8,475,625 - Pamarthy , et al. July 2, 2	2013-07-02
Method And Apparatus For Stable Plasma Processing App 20130118687 - TODOROW; VALENTIN N. ; et al.	2013-05-16
Method and apparatus for stable plasma processing Grant 8,349,128 - Todorow , et al. January 8, 2	2013-01-08
Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus Grant 7,837,838 - Chua , et al. November 23, 2	2010-11-23
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution Grant 7,780,864 - Paterson , et al. August 24, 2	2010-08-24
High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck Grant 7,777,152 - Todorov , et al. August 17, 2	2010-08-17
Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density Grant 7,727,413 - Paterson , et al. June 1, 2	2010-06-01
Independent control of ion density, ion energy distribution and ion dissociation in a plasma reactor Grant 7,695,633 - Holland April 13, 2	2010-04-13
Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system Grant 7,678,710 - Chua , et al. March 16, 2	2010-03-16
Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution Grant 7,674,394 - Paterson , et al. March 9, 2	2010-03-09
Method for etching having a controlled distribution of process results Grant 7,648,914 - Kropewnicki , et al. January 19, 2	2010-01-19
Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency Grant 7,645,357 - Paterson , et al. January 12, 2	2010-01-12
Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system Grant 7,645,710 - Olsen , et al. January 12, 2	2010-01-12
Method And Apparatus For Controlling Gas Injection In Process Chamber App 20090236447 - PANAGOPOULOS; THEODOROS ; et al.	2009-09-24
Plasma generation and control using dual frequency RF signals Grant 7,510,665 - Shannon , et al. March 31, 2	2009-03-31
Trajectory Based Control Of Plasma Processing App 20090061544 - HOLLAND; JOHN P. ; et al.	2009-03-05
Plasma generation and control using a dual frequency RF source Grant 7,431,857 - Shannon , et al. October 7, 2	2008-10-07
Plasma Reactor With An Overhead Inductive Antenna And An Overhead Gas Distribution Showerhead App 20080236490 - PATERSON; ALEXANDER ; et al.	2008-10-02
Plasma Species And Uniformity Control Through Pulsed Vhf Operation App 20080230008 - Paterson; Alexander ; et al.	2008-09-25
Plasma Process For Inductively Coupling Power Through A Gas Distribution Plate While Adjusting Plasma Distribution App 20080206483 - PATERSON; ALEXANDER ; et al.	2008-08-28
Method of processing a workpiece using a mid-chamber gas distribution plate, tuned plasma flow control grid and electrode App 20080193673 - Paterson; Alexander M. ; et al.	2008-08-14
Mid-chamber gas distribution plate, tuned plasma flow control grid and electrode App 20080178805 - Paterson; Alexander M. ; et al.	2008-07-31
Alternating Asymmetrical Plasma Generation In A Process Chamber App 20080023443 - Paterson; Alexander ; et al.	2008-01-31
High Ac Current High Rf Power Ac-rf Decoupling Filter For Plasma Reactor Heated Electrostatic Chuck App 20070284344 - Todorov; Valentin N. ; et al.	2007-12-13
Apparatus For Etching High Aspect Ratio Features App 20070256785 - Pamarthy; Sharma ; et al.	2007-11-08
Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency App 20070247073 - Paterson; Alexander ; et al.	2007-10-25
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution App 20070247074 - Paterson; Alexander ; et al.	2007-10-25
Plasma reactor apparatus with a toroidal plasma source and a VHF capacitively coupled plasma source with variable frequency App 20070246161 - Paterson; Alexander ; et al.	2007-10-25
Dual plasma source process using a variable frequency capacitively coupled source for controlling ion radial distribution App 20070245958 - Paterson; Alexander ; et al.	2007-10-25
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion density App 20070245960 - Paterson; Alexander ; et al.	2007-10-25
Dual plasma source process using a variable frequency capacitively coupled source for controlling plasma ion dissociation App 20070245961 - Paterson; Alexander ; et al.	2007-10-25
Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density App 20070245959 - Paterson; Alexander ; et al.	2007-10-25
Process using combined capacitively and inductively coupled plasma process for controlling plasma ion dissociation App 20070246443 - Paterson; Alexander ; et al.	2007-10-25
Plasma reactor apparatus with independent capacitive and inductive plasma sources App 20070246163 - Paterson; Alexander ; et al.	2007-10-25
Plasma reactor apparatus with an inductive plasma source and a VHF capacitively coupled plasma source with variable frequency App 20070246162 - Paterson; Alexander ; et al.	2007-10-25
Method Of Fabricating A High Dielectric Constant Transistor Gate Using A Low Energy Plasma Apparatus App 20070218623 - Chua; Thai Cheng ; et al.	2007-09-20
Method And Apparatus For Fabricating A High Dielectric Constant Transistor Gate Using A Low Energy Plasma System App 20070212896 - Olsen; Christopher Sean ; et al.	2007-09-13
Apparatus For Fabricating A High Dielectric Constant Transistor Gate Using A Low Energy Plasma System App 20070209930 - Chua; Thai Cheng ; et al.	2007-09-13
Method And Apparatus For Fabricating A High Dielectric Constant Transistor Gate Using A Low Energy Plasma System App 20070212895 - CHUA; Thai Cheng ; et al.	2007-09-13
Plasma reactor apparatus with independent capacitive and toroidal plasma sources Grant 7,264,688 - Paterson , et al. September 4, 2	2007-09-04
Independent control of ion density, ion energy distribution and ion dissociation in a plasma reactor App 20070084563 - Holland; John P.	2007-04-19
Bonded multi-layer RF window App 20070079936 - Li; Maocheng ; et al.	2007-04-12
Dechucking method and apparatus for workpieces in vacuum processors Grant 7,196,896 - Howald , et al. March 27, 2	2007-03-27
Method for etching having a controlled distribution of process results App 20070042603 - Kropewnicki; Thomas J. ; et al.	2007-02-22
Multi-frequency Plasma Enhanced Process Chamber Having A Toroidal Plasma Source App 20070017897 - Sinha; Ashok K. ; et al.	2007-01-25
Plasma Generation And Control Using A Dual Frequency Rf Source App 20070006971 - Shannon; Steven C. ; et al.	2007-01-11
Plasma generation and control using dual frequency RF signals App 20060266735 - Shannon; Steven C. ; et al.	2006-11-30
Multi-frequency plasma enhanced process chamber having a torroidal plasma source App 20060027329 - Sinha; Ashok K. ; et al.	2006-02-09
Method and apparatus for stable plasma processing App 20060000805 - Todorow; Valentin N. ; et al.	2006-01-05
Tandem etch chamber plasma processing system Grant 6,962,644 - Paterson , et al. November 8, 2	2005-11-08
Alternating asymmetrical plasma generation in a process chamber App 20050241762 - Paterson, Alexander ; et al.	2005-11-03
Plasma generation and control using a dual frequency RF source App 20050034816 - Shannon, Steven C. ; et al.	2005-02-17
Dechucking method and apparatus for workpieces in vacuum processors App 20050036268 - Howald, Arthur M. ; et al.	2005-02-17
Monitoring substrate processing by detecting reflectively diffracted light Grant 6,849,151 - Barnes , et al. February 1, 2	2005-02-01
Dechucking method and apparatus for workpieces in vacuum processors Grant 6,790,375 - Howald , et al. September 14, 2	2004-09-14
Monitoring substrate processing by detecting reflectively diffracted light App 20040026368 - Barnes, Michael S. ; et al.	2004-02-12
Method For Enhancing Critical Dimension Uniformity After Etch App 20040018741 - Deshmukh, Shashank C. ; et al.	2004-01-29
Tandem etch chamber plasma processing system App 20030176074 - Paterson, Alexander ; et al.	2003-09-18
Pulsed RF power delivery for plasma processing Grant 6,472,822 - Chen , et al. October 29, 2	2002-10-29
Plasma device including a powered non-magnetic metal member between a plasma AC excitation source and the plasma Grant 6,280,563 - Baldwin, Jr. , et al. August 28, 2	2001-08-28
Plasma processing method and apparatus with control of rf bias Grant 6,265,831 - Howald , et al. July 24, 2	2001-07-24
Plasma processor with coil having variable rf coupling Grant 6,229,264 - Ni , et al. May 8, 2	2001-05-08
Electrostatic dechucking method and apparatus for dielectric workpieces in vacuum processors Grant 6,125,025 - Howald , et al. September 26, 2	2000-09-26
Dry etching of transparent electrodes in a low pressure plasma reactor Grant 5,667,631 - Holland , et al. September 16, 1	1997-09-16
Planar contact array switch having improved ground path for dissipating electrostatic discharges Grant 4,456,800 - Holland June 26, 1	1984-06-26
Method Of Joining Sheets Of Rigid Deformable Material Grant 3,579,809 - Wolf , et al. May 25, 1	1971-05-25

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