Hokazono; Akira

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hokazono; Akira.The latest application filed is for "storage device".

Company Profile

1.35.55

Hokazono; Akira - Kawasaki Kanagawa JP
Hokazono; Akira - Kanagawa JP
HOKAZONO; Akira - Kawasaki JP
Hokazono; Akira - Kawasaki-Shi JP
Hokazono; Akira - Clifton Park NY
Hokazono; Akira - US
Hokazono; Akira - Tokyo JP
Hokazono; Akira - Kanagawa-ken JP
Hokazono; Akira - Sagamihara JP
Hokazono; Akira - Sagamihara-shi JP
Hokazono; Akira - Sagamihira JP
Hokazono, Akira - Sagamihira-Shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Storage device Grant 10,734,449 - Arayashiki , et al.	2020-08-04
Storage Device App 20200098829 - ARAYASHIKI; Yusuke ; et al.	2020-03-26
Semiconductor Memory Device App 20200091236 - HOKAZONO; Akira ; et al.	2020-03-19
Memory device Grant 10,079,268 - Okamoto , et al. September 18, 2	2018-09-18
Memory Device App 20180083068 - OKAMOTO; Hiroki ; et al.	2018-03-22
Semiconductor Device App 20170077105 - HOKAZONO; Akira ; et al.	2017-03-16
Stressed channel bulk fin field effect transistor Grant 9,484,262 - Basker , et al. November 1, 2	2016-11-01
Tunnel FET Grant 9,437,735 - Hokazono , et al. September 6, 2	2016-09-06
Semiconductor Device App 20160247917 - KONDO; Yoshiyuki ; et al.	2016-08-25
Semiconductor device and method for manufacturing the same Grant 9,324,798 - Kondo , et al. April 26, 2	2016-04-26
Semiconductor device Grant 9,324,714 - Hokazono , et al. April 26, 2	2016-04-26
Stressed Channel Bulk Fin Field Effect Transistor App 20160035626 - Basker; Veeraraghavan S. ; et al.	2016-02-04
Stressed channel bulk fin field effect transistor Grant 9,246,005 - Basker , et al. January 26, 2	2016-01-26
Semiconductor device and method of manufacturing the same Grant 9,224,850 - Goto , et al. December 29, 2	2015-12-29
Semiconductor Device And Method Of Manufacturing The Same App 20150371992 - HOKAZONO; Akira	2015-12-24
Semiconductor Device And Manufacturing Method Thereof App 20150243769 - GOTO; Masakazu ; et al.	2015-08-27
Stressed Channel Bulk Fin Field Effect Transistor App 20150228789 - Basker; Veeraraghavan S. ; et al.	2015-08-13
Semiconductor Device App 20150129960 - HOKAZONO; Akira ; et al.	2015-05-14
Pass gate, semiconductor memory, and semiconductor device Grant 8,872,271 - Hokazono October 28, 2	2014-10-28
Semiconductor Device And Method Of Manufacturing The Same App 20140291736 - GOTO; Masakazu ; et al.	2014-10-02
Semiconductor device and method of manufacturing the same Grant 8,841,728 - Kondo , et al. September 23, 2	2014-09-23
Semiconductor device and method of manufacturing same Grant 8,841,191 - Hokazono , et al. September 23, 2	2014-09-23
Semiconductor Device And Method Of Manufacturing The Same App 20140225170 - KONDO; Yoshiyuki ; et al.	2014-08-14
Semiconductor Device And Method For Manufacturing The Same App 20140209863 - KONDO; Yoshiyuki ; et al.	2014-07-31
Mos Semiconductor Device And Method Of Manufacturing The Same App 20140175553 - MIYATA; Toshitaka ; et al.	2014-06-26
Needle-shaped profile finFET device Grant 8,729,607 - Itokawa , et al. May 20, 2	2014-05-20
Pass Gate, Semiconductor Memory, And Semiconductor Device App 20140091396 - HOKAZONO; Akira	2014-04-03
Semiconductor Device And Method Of Fabricating The Same App 20140070328 - Goto; Masakazu ; et al.	2014-03-13
Needle-shaped Profile Finfet Device App 20140054648 - Itokawa; Hiroshi ; et al.	2014-02-27
Semiconductor Device And Method Of Manufacturing Same App 20140054657 - HOKAZONO; Akira ; et al.	2014-02-27
FinFET comprising a punch-through stopper Grant 8,610,201 - Hokazono December 17, 2	2013-12-17
Semiconductor Device With Lateral And Vertical Channel Confinement And Method Of Fabricating The Same App 20130193517 - Hokazono; Akira	2013-08-01
Formation Of Sti Trenches For Limiting Pn-junction Leakage App 20130119506 - Hokazono; Akira	2013-05-16
Semiconductor device including a p-type transistor having extension regions in sours and drain regions and method of fabricating the same Grant 8,134,159 - Hokazono March 13, 2	2012-03-13
Semiconductor device and method of fabricating the same Grant 8,049,280 - Hokazono November 1, 2	2011-11-01
Semiconductor device comprising gate electrode having arsenic and phosphorous Grant 8,004,050 - Hokazono August 23, 2	2011-08-23
Semiconductor device and method of fabricating the same Grant 7,985,985 - Hokazono July 26, 2	2011-07-26
Semiconductor Device And Method Of Fabricating The Same App 20110127542 - Hokazono; Akira	2011-06-02
Semiconductor device and method of fabricating the same Grant 7,888,747 - Hokazono February 15, 2	2011-02-15
Semiconductor Device And Method Of Fabricating The Same App 20100252869 - HOKAZONO; Akira	2010-10-07
Semiconductor Device And Method Of Fabricating The Same App 20100224936 - Hokazono; Akira	2010-09-09
Semiconductor Device Comprising Gate Electrode Having Arsenic And Phosphorus App 20100200935 - HOKAZONO; Akira	2010-08-12
Semiconductor Device And Method Of Fabricating The Same App 20100181625 - HOKAZONO; Akira	2010-07-22
Semiconductor device and method of manufacturing semiconductor device Grant 7,750,381 - Hokazono , et al. July 6, 2	2010-07-06
Semiconductor device comprising gate electrode having arsenic and phosphorus Grant 7,714,364 - Hokazono May 11, 2	2010-05-11
Semiconductor Device And Method Of Fabricating The Same App 20090283842 - HOKAZONO; Akira	2009-11-19
Semiconductor Device And Method Of Fabricating The Same App 20090243002 - SONEHARA; Takeshi ; et al.	2009-10-01
Semiconductor Device And Method Of Fabricating The Same App 20090166685 - HOKAZONO; Akira	2009-07-02
Semiconductor device Grant 7,554,165 - Hokazono June 30, 2	2009-06-30
Semiconductor Device And Method Of Fabricating The Same App 20090039440 - HOKAZONO; Akira	2009-02-12
Semiconductor Device App 20080277742 - HOKAZONO; Akira	2008-11-13
Semiconductor Device And Method Of Manufacturing Semiconductor Device App 20080230805 - Hokazono; Akira ; et al.	2008-09-25
Semiconductor device and method of manufacturing a semiconductor device Grant 7,427,796 - Hokazono September 23, 2	2008-09-23
Semiconductor Device Having Cmos Device App 20080054364 - HOKAZONO; Akira	2008-03-06
Semiconductor device having metal silicide films formed on source and drain regions and method for manufacturing the same Grant 7,141,467 - Hokazono , et al. November 28, 2	2006-11-28
Fin-shaped semiconductor device Grant 7,129,550 - Fujiwara , et al. October 31, 2	2006-10-31
Semiconductor device and manufacturing method thereof App 20060166456 - Fujiwara; Makoto ; et al.	2006-07-27
Semiconductor device and method of manufacturing the same App 20060163675 - Hokazono; Akira	2006-07-27
Semiconductor device and semiconductor device manufacturing method Grant 7,061,054 - Tomiye , et al. June 13, 2	2006-06-13
Semiconductor device having active regions connected together by interconnect layer and method of manufacture thereof Grant 7,045,409 - Hokazono May 16, 2	2006-05-16
Field effect transistor and method of manufacturing the same App 20060063314 - Hokazono; Akira	2006-03-23
Semiconductor device and method of manufacturing a semiconductor device App 20060063362 - Hokazono; Akira	2006-03-23
Semiconductor device with an L-shaped/reversed L-shaped gate side-wall insulating film Grant 6,956,276 - Hokazono October 18, 2	2005-10-18
Semiconductor device having gate sidewall structure in silicide process and producing method of the semiconductor device App 20050212040 - Hokazono, Akira ; et al.	2005-09-29
Semiconductor device having a gate electrode with a sidewall insulating film and manufacturing method thereof Grant 6,927,459 - Hokazono , et al. August 9, 2	2005-08-09
Semiconductor device with an L-shaped/reversed L-shaped gate side-wall insulating film and method of manufacturing same App 20050167765 - Hokazono, Akira	2005-08-04
Semiconductor device having active regions connected together by interconnect layer and method of manufacture thereof App 20050087806 - Hokazono, Akira	2005-04-28
Method of manufacturing a semiconductor device with an L-shaped/reversed L-shaped gate side-wall insulating film Grant 6,881,633 - Hokazono April 19, 2	2005-04-19
Method of manufacturing a semiconductor device Grant 6,875,665 - Hokazono , et al. April 5, 2	2005-04-05
Semiconductor device and manufacturing method thereof App 20050051825 - Fujiwara, Makoto ; et al.	2005-03-10
Semiconductor device having active regions connected together by interconnect layer and method of manufacture thereof Grant 6,864,544 - Hokazono March 8, 2	2005-03-08
Semiconductor device and semiconductor device manufacturing method App 20040259295 - Tomiye, Kanna ; et al.	2004-12-23
Method of manufacturing a semiconductor device with an L-shape/reversed L-shaped gate side-wall insulating film App 20040235229 - Hokazono, Akira	2004-11-25
Semiconductor device having metal silicide films formed on source and drain regions and method for manufacturing the same App 20040183146 - Hokazono, Akira ; et al.	2004-09-23
Semiconductor device and method of manufacturing the same App 20040094805 - Hokazono, Akira ; et al.	2004-05-20
Semiconductor device with an L-shaped/reversed L-shaped gate side-wall insulating film App 20030205774 - Hokazono, Akira	2003-11-06
Semiconductor device and method of manufacturing the same Grant 6,608,354 - Hokazono , et al. August 19, 2	2003-08-19
Semiconductor device having a gate electrode with a sidewall insulating film and manufacturing method thereof App 20030141551 - Hokazono, Akira ; et al.	2003-07-31
Semiconductor device having active regions connected together by interconnect layer and method of manufacture thereof App 20030116819 - Hokazono, Akira	2003-06-26
Semiconductor Device And Method Of Manufacturing The Same App 20030111688 - Hokazono, Akira ; et al.	2003-06-19
Semiconductor device having a gate electrode with a sidewall insulating film and manufacturing method thereof Grant 6,545,317 - Hokazono , et al. April 8, 2	2003-04-08
Semiconductor device and method of manufacturing the same App 20020079551 - Hokazono, Akira	2002-06-27
Semiconductor device having a gate electrode with a sidewall insulating film and manufacturing method thereof App 20020000611 - Hokazono, Akira ; et al.	2002-01-03
Method of manufacturing a semiconductor and semiconductor device App 20010034085 - Nakayama, Takeo ; et al.	2001-10-25

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