Hojo; Takuma

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hojo; Takuma.The latest application filed is for "vinylozy group-containing vinyl polymer".

Company Profile

0.6.8

Hojo; Takuma - Namerikawa N/A JP
Hojo; Takuma - Namerikawa-shi JP
Hojo; Takuma - Kawasaki JP
Hojo; Takuma - Kanagawa JP
Hojo; Takuma - Kawasaki-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Vinylozy group-containing vinyl polymer Grant 8,785,582 - Hojo , et al. July 22, 2	2014-07-22
Vinylozy Group-containing Vinyl Polymer App 20130245189 - Hojo; Takuma ; et al.	2013-09-19
Positive resist composition and method of forming resist pattern Grant 7,727,701 - Hojo , et al. June 1, 2	2010-06-01
Positive resist composition and resist pattern forming method Grant 7,687,221 - Hirosaki , et al. March 30, 2	2010-03-30
Film-forming Composition, Method For Pattern Formation, And Three-dimensional Mold App 20090155546 - Yamashita; Naoki ; et al.	2009-06-18
Positive resist composition and method of formation of resist patterns Grant 7,524,604 - Hojo , et al. April 28, 2	2009-04-28
Positive Resist Composition And Resist Pattern Forming Method App 20090047600 - Hirosaki; Takako ; et al.	2009-02-19
Positive photoresist composition and method for forming resist pattern Grant 7,449,276 - Hojo , et al. November 11, 2	2008-11-11
Positive Resist Composition and Method of Forming Resist Pattern App 20080241747 - Hojo; Takuma ; et al.	2008-10-02
Photoresist composition and method of forming resist pattern App 20070190447 - Ogata; Toshiyuki ; et al.	2007-08-16
Positive photoresist composition and method for forming resist pattern App 20070042288 - Hojo; Takuma ; et al.	2007-02-22
Positive resist composition and method of formation of resist patterns App 20060247346 - Hojo; Takuma ; et al.	2006-11-02

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