HOHN; Geoffrey

Patent Applications and Registrations

Patent applications and USPTO patent grants for HOHN; Geoffrey.The latest application filed is for "ex situ coating of chamber components for semiconductor processing".

Company Profile

3.5.9

HOHN; Geoffrey - Portland OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Ex Situ Coating Of Chamber Components For Semiconductor Processing App 20220275504 - SHANBHAG; Damodar Rajaram ; et al.	2022-09-01
Ex situ coating of chamber components for semiconductor processing Grant 11,365,479 - Shanbhag , et al. June 21, 2	2022-06-21
Minimizing Radical Recombination Using Ald Silicon Oxide Surface Coating With Intermittent Restoration Plasma App 20220145459 - VARADARAJAN; Bhadri N. ; et al.	2022-05-12
Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Plasma Film Deposition App 20210371982 - BATZER; Rachel ; et al.	2021-12-02
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition Grant 11,101,164 - Batzer , et al. August 24, 2	2021-08-24
Ex Situ Coating Of Chamber Components For Semiconductor Processing App 20200347497 - Shanbhag; Damodar ; et al.	2020-11-05
Ex situ coating of chamber components for semiconductor processing Grant 10,760,158 - Shanbhag , et al. Sep	2020-09-01
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition Grant 10,604,841 - Batzer , et al.	2020-03-31
Ex Situ Coating Of Chamber Components For Semiconductor Processing App 20190185999 - Shanbhag; Damodar ; et al.	2019-06-20
Wafer Level Uniformity Control In Remote Plasma Film Deposition App 20180251893 - Hohn; Geoffrey ; et al.	2018-09-06
Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Plasma Film Deposition App 20180163305 - Batzer; Rachel ; et al.	2018-06-14
Minimizing Radical Recombination Using Ald Silicon Oxide Surface Coating With Intermittent Restoration Plasma App 20180044791 - Varadarajan; Bhadri N. ; et al.	2018-02-15
Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma Grant 9,828,672 - Varadarajan , et al. November 28, 2	2017-11-28
Minimizing Radical Recombination Using Ald Silicon Oxide Surface Coating With Intermittent Restoration Plasma App 20160281230 - Varadarajan; Bhadri N. ; et al.	2016-09-29

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