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name:-0.005424976348877
name:-0.0056049823760986
name:-0.00058102607727051
Hofsass; Markus Patent Filings

Hofsass; Markus

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hofsass; Markus.The latest application filed is for "method for searching for potential faults in a layout of an integrated circuit".

Company Profile
0.4.4
  • Hofsass; Markus - Munchen DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method for searching for potential faults in a layout of an integrated circuit
Grant 7,484,189 - Hofsass , et al. January 27, 2
2009-01-27
Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer
Grant 7,393,614 - Kohle , et al. July 1, 2
2008-07-01
Method for searching for potential faults in a layout of an integrated circuit
App 20070044050 - Hofsass; Markus ;   et al.
2007-02-22
Set of masks for the projection of structure patterns onto a semiconductor wafer
App 20040197677 - Kohle, Roderick ;   et al.
2004-10-07
Method for determining and removing phase conflicts on alternating phase masks
Grant 6,730,463 - Heissmeier , et al. May 4, 2
2004-05-04
Alternating phase mask
Grant 6,680,151 - Heissmeier , et al. January 20, 2
2004-01-20
Alternating phase mask
App 20020192574 - Heissmeier, Michael ;   et al.
2002-12-19
Method for determining and removing phase conflicts on alternating phase masks
App 20020155362 - Heissmeier, Michael ;   et al.
2002-10-24

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